Patents by Inventor Gerard Verschoore

Gerard Verschoore has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5745537
    Abstract: A sealed neutron tube with magnetic confinement of the electrons by permanent magnets. The sealed tube contains a D-T gas mixture under low pressure, fitted with a target, an extraction-acceleration electrode (EAE) and an ion source with 2n Penning cells having anodes in a single cathode cavity and one permanent magnetization system (PMS) per cell. The ions, formed in the ion source, by means of the simultaneous presence of an electric and magnetic field, are accelerated by the EAE and projected onto the target in order to cause emission of neutrons therefrom. In this tube, half (n) of the PMS is magnetized to a nominal value and the other half is weakly magnetized or unmagnetized.
    Type: Grant
    Filed: April 8, 1997
    Date of Patent: April 28, 1998
    Assignee: U.S. Philips Corporation
    Inventor: Gerard Verschoore
  • Patent number: 5053184
    Abstract: A device for improving the service life and the reliability of a sealed high-flux neutron tube, comprising a first part and a second part which are separated by an accelerator electrode (13). The accelerator electrode forms a shield between said parts and which is integral with the external envelope (15) which is connected to ground. The first and second parts of the tube contain the ion source (9), connected to an adjustable positive potential, and the target (28), respectively, which is connected to a negative potential which can be adjusted with respect to the zero value of ground.
    Type: Grant
    Filed: April 25, 1989
    Date of Patent: October 1, 1991
    Assignee: U.S. Philips Corporation
    Inventors: Serge Cluzeau, Gerard Verschoore
  • Patent number: 4935194
    Abstract: A neutron generator comprising a target (16) which is struck by a hydrogen isotope ion beam and which is formed by a structure comprising a thin absorbing active layer (19) deposited on a carrier layer (18). In accordance with the invention, on the two above layers there is deposited a stack of active layers (21, 23, 25, 27) which are identical to the layer (19) and which are separated from one another by diffusion barriers (20, 22, 24, 26, respectively). The thickness of each of said active layers is in the order of the penetration depth of the deuterium ions striking the target.
    Type: Grant
    Filed: April 17, 1989
    Date of Patent: June 19, 1990
    Assignee: U.S. Philips Corporation
    Inventor: Gerard Verschoore