Abstract: An objective comprising axial symmetry, at least one curved mirror and at least one lens and two intermediate images. The objective includes two refractive partial objectives and one catadioptric partial objective. The objective includes a first partial objective, a first intermediate a image, a second partial objective, a second intermediate image, and a third partial objective. At least one of the partial objectives is purely refractive. One of the partial objectives is purely refractive and one is purely catoptric.

Abstract: A projection exposure system for microlithography includes an illuminating system (2), a reflective reticle (5) and reduction objectives (71, 72). In the reduction objective (71, 72), a first beam splitter cube (3) is provided which superposes the illuminating beam path (100) and the imaging beam path (200). In order to obtain an almost telecentric entry at the reticle, optical elements (71) are provided between beam splitter cube (3) and the reflective reticle (5). Advantageously, the reduction objective is a catadioptric objective having a beam splitter cube (3) whose fourth unused side can be used for coupling in light. The illuminating beam path (100) can also be coupled in with a non-parallel beam splitter plate. The illuminating beam path is refractively corrected in passthrough to compensate for aberrations via the special configuration of the rear side of the beam splitter plate.

Abstract: The invention is directed to a projection exposure apparatus for the flat panel display manufacture having an objective array and magnifying objectives (O1 to O5).

Abstract: The invention is directed to a projection exposure apparatus for the flat panel display manufacture having an objective array and magnifying objectives (O1 to O5).

Abstract: A projection exposure system for microlithography includes an illuminating system (2), a reflective reticle (5) and reduction objectives (71, 72). In the reduction objective (71, 72), a first beam splitter cube (3) is provided which superposes the illuminating beam path (100) and the imaging beam path (200). In order to obtain an almost telecentric entry at the reticle, optical elements (71) are provided between beam splitter cube (3) and the reflective reticle (5). Advantageously, the reduction objective is a catadioptric objective having a beam splitter cube (3) whose fourth unused side can be used for coupling in light. The illuminating beam path (100) can also be coupled in with a non-parallel beam splitter plate. The illuminating beam path is refractively corrected in passthrough to compensate for aberrations via the special configuration of the rear side of the beam splitter plate.

Abstract: A REMA objective 123 images an object plane 1 onto the reticle plane 33 and has a lens group 300 disposed in the half of the objective close to the reticle. The object plane 1 lies at a finite spacing. In the lens group 300, the principal ray elevations are greater in magnitude than the elevations of the peripheral rays. A scattering surface 28 is arranged in the lens group 300 having a largest magnitude of sine of the angle of incidence of the principal ray in air with respect to the surface normal (.vertline.sin (i.sub.princ).vertline.) greater than 0.35 and preferably greater than 0.5.

Abstract: The invention is directed to a high-resolution high-apertured objective which includes an object plane (1); a first lens group (LG1); a second lens group (LG2) downstream of the first lens group; a beamsplitter (17, 18, 22, P) downstream of the second lens group; a concave mirror (21); a system diaphragm (A) interposed between the beamsplitter and the concave mirror; a third lens group (LG3); the objective defining an image plane and being configured to provide a reduction scale (.beta.) in the range of -0.4 to -0.15 and an image side numerical aperture greater than 0.5. The first and second lens groups (LG1, LG2) are configured to conjointly reduce the sine of the marginal ray angle. The reduction can be up to 40%. Preferably, the second lens group (LG2) can be configured to alone reduce the sine of the marginal ray angle. It is preferable that the sine of the marginal ray angle (sin R.sub.LG1) after the first lens group (LG1) is not less than the sine of the marginal ray angle (sin R.sub.

Abstract: A catadioptric reduction objective has a concave mirror 19', a beam splitter 150' and several lens groups (100', 200'; 300', 400'). The system diaphragm 40' is mounted between beam splitter surface 15' and image plane 36' and especially within the last lens group 400'. NA=0.7; for UV, DUV; image side or both sides telecentric; also achromatized.

Abstract: The invention is directed to a catadioptric reduction objective having a concave mirror, a beam splitter and several lens groups but without an additional lens group disposed between the concave mirror and the beam splitter. Catadioptric reduction objectives are disclosed having an image-side aperture of 0.52 and 0.58 for an imaging scale of 1:4 and are corrected for an unrestricted excimer laser for use in submicronlithography.

Abstract: The invention is directed to a measuring objective having a large free operating space and having very small imaging errors with respect to coma, astigmatism and distortion. The main rays are, at least at one objective side, inclined to each other in one directional component and are parallel to each other in the directional component perpendicular thereto.