Patents by Inventor Gerhard Focht

Gerhard Focht has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Optical element and method
    Patent number: 8891172
    Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
    Type: Grant
    Filed: March 11, 2009
    Date of Patent: November 18, 2014
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner
  • Optical element and method
    Patent number: 8508854
    Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
    Type: Grant
    Filed: December 13, 2010
    Date of Patent: August 13, 2013
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner
  • Optical correction device
    Patent number: 8325322
    Abstract: The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.
    Type: Grant
    Filed: February 4, 2010
    Date of Patent: December 4, 2012
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Markus Hauf, Ulrich Schoenhoff, Payam Tayebati, Michael Thier, Tilmann Heil, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner, Aksel Goehnermeier, Dirk Hellweg
  • OPTICAL ELEMENT AND METHOD
    Publication number: 20110080569
    Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
    Type: Application
    Filed: December 13, 2010
    Publication date: April 7, 2011
    Applicant: Carl Zeiss SMT GmbH
    Inventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner
  • OPTICAL CORRECTION DEVICE
    Publication number: 20100201958
    Abstract: The disclosure relates to an optical correction device with thermal actuators for influencing the temperature distribution in the optical correction device. The optical correction device is constructed from at least two partial elements which differ with regard to their ability to transport heat. Furthermore, the disclosure relates to methods for influencing the temperature distribution in an optical element.
    Type: Application
    Filed: February 4, 2010
    Publication date: August 12, 2010
    Applicant: Carl Zeiss SMT AG
    Inventors: Markus Hauf, Ulrich Schoenhoff, Payam Tayebati, Michael Thier, Tilmann Heil, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner, Aksel Goehnermeier, Dirk Hellweg
  • OPTICAL ELEMENT AND METHOD
    Publication number: 20090257032
    Abstract: The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.
    Type: Application
    Filed: March 11, 2009
    Publication date: October 15, 2009
    Applicant: CARL ZEISS SMT AG
    Inventors: Eric Eva, Payam Tayebati, Michael Thier, Markus Hauf, Ulrich Schoenhoff, Ole Fluegge, Arif Kazi, Alexander Sauerhoefer, Gerhard Focht, Jochen Weber, Toralf Gruner