Abstract: The invention relates to a tube cathode with a target carrier and a target. The target can herein be a single- or a multi-part target. Between target carrier and target are placed several annular elements of a thermally conductive material along the longitudinal axis of the target carrier. The annular elements are separated from one another by narrow rings. The target has on at least one end face a chamfer, which permits sliding the target readily over the discrete annular elements.

Abstract: A system 1 for coating a substrate 3, in particular a transparent substrate, comprises at least one coating chamber 2, at least one pump means 5 for producing a vacuum within the coating chamber 2, and at least one sputtering cathode 9. One or more cathodes 9 are integrated within an insert 8 together with system components which undergo process-induced dirt pick-up, for example shields, covers or transport rollers 6 for conveying a substrate 3 through the process chamber 2. The insert 8 can slide, like a drawer, through a lateral opening 10 within the chamber wall 2a, into the interior of the chamber. For maintenance purposes, any components of the coating system 1 which require thorough maintenance and cleaning can be removed easily from the interior of the coating chamber 2 by means of the insert 8. The removed insert 8 can be replaced directly by an insert that has just been serviced.

Abstract: A holding device 12 for mounting at least one screen 9 in a coating chamber 2 of an installation for coating a substrate, especially a glass substrate, is configured such that a screen 9 held by the holding device 12 can be moved at least from a first position within the coating chamber 2 to a second position by movement of the holding device 12. The holding device 12 has means 13 of such kind as to enable the screen 9 to avoid obstructions on the way from the first position to the second position. In particular, during its movement from the first to the second position, the screen 9 is mounted slewably on the holding device 12.

Abstract: A gate valve (1) is constructed for the simultaneous blocking or clearing of two rectangular passage openings (8,9) of two chamber walls (4,5) that are provided between two vacuum chambers (1,3) and aligned with one another. To this end, it has two valve plates (20, 21), which are a component of a slider (15), which is situated so that it can move with play from a position clearing the passage openings (8,9) to a position which closes the passage openings (8,9). To move the valve plates (20,21) to the closing setting against the passage openings (8,9) on the slider (15), at least one lifting element (24), which is acted on by pressure, is provided.

Abstract: Cathode sputtering apparatus includes a target, a cooling channel, and a flexible diaphragm therebetween. The target is fixed to a base independently of the diaphragm, so that the target can be replaced with disturbing the cooling channel. In a preferred embodiment, the diaphragm and the target are fixed by respective sets of cleats retained by screws received from respective opposite directions.