Abstract: A method for producing a large quartz-glass pipe is provided. In a first forming step, an intermediate cylinder made of quartz glass and having an intermediate-cylinder wall thickness and outside diameter is formed by using a forming tool and is then cooled. In a second shaping step, at least one length segment of the cooled intermediate cylinder is fed to a heating zone, heated to a softening temperature zone by zone therein, and, while rotating about the longitudinal axis of the intermediate cylinder, shaped into the large quartz-glass pipe having a final wall thickness and outside diameter. The quartz glass is synthetically produced and has an average hydroxyl group content of 10 ppm by weight or less. If the intermediate cylinder is divided into length segments of 1 cm, adjacent length segments have a difference of less than 2 ppm by weight in the average hydroxyl group content thereof.

Abstract: The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties: a glass structure essentially free of oxygen defect sites, an H2-content in the range of 0.1×1016 molecules/cm3 to 4.0×1016 molecules/cm3, an OH-content in the range of 125 wt-ppm to 450 wt-ppm, an SiH group-content of less than 5×1016 molecules/cm3, a refractive index inhomogeneity, ?n, of less than 2 ppm, and a stress birefringence of less than 2 nm/cm.

Abstract: The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction.