Patents by Inventor Gerrit Van Donk

Gerrit Van Donk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Heat pipe, lithographic apparatus and device manufacturing method
    Patent number: 8705009
    Abstract: A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber.
    Type: Grant
    Filed: September 27, 2010
    Date of Patent: April 22, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Joost Jeroen Ottens, Gerrit Van Donk, Johannes Van Es
  • Thermal conditioning system for thermal conditioning a part of a lithographic apparatus and a thermal conditioning method
    Patent number: 8610089
    Abstract: A conditioning system for conditioning a part of a lithographic apparatus, includes an evaporator positioned in thermal contact with the part for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser for removing heat from the fluid inside the condenser; fluid lines arranged between the evaporator and the condenser to form a fluid circuit; a pump arranged in the circuit to circulate the fluid in the circuit; an accumulator to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger to transfer heat from or to fluid inside the accumulator; a temperature sensor to provide a signal representative of the fluid temperature; and a controller to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger based on the signal.
    Type: Grant
    Filed: April 17, 2012
    Date of Patent: December 17, 2013
    Assignees: ASML Netherlands B.V., Stichting Nationaal Lucht—en Ruimtevaartlaboratorium
    Inventors: Sjoerd Nicolaas Lambertus Donders, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Gerrit Van Donk, Henk Jan Van Gerner
  • THERMAL CONDITIONING SYSTEM FOR THERMAL CONDITIONING A PART OF A LITHOGRAPHIC APPARATUS AND A THERMAL CONDITIONING METHOD
    Publication number: 20120267550
    Abstract: A conditioning system for conditioning a part of a lithographic apparatus, includes an evaporator positioned in thermal contact with the part for extracting heat from the part by evaporation of a fluid inside the evaporator; a condenser for removing heat from the fluid inside the condenser; fluid lines arranged between the evaporator and the condenser to form a fluid circuit; a pump arranged in the circuit to circulate the fluid in the circuit; an accumulator to hold fluid, wherein the accumulator is in fluid communication with the circuit and comprises a heat exchanger to transfer heat from or to fluid inside the accumulator; a temperature sensor to provide a signal representative of the fluid temperature; and a controller to maintain a substantially constant temperature of the fluid inside the circuit by regulating the amount of heat transferred by the heat exchanger based on the signal.
    Type: Application
    Filed: April 17, 2012
    Publication date: October 25, 2012
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Sjoerd Nicolaas Lambertus DONDERS, Vadim Yevgenyevich Banine, Johannes Hubertus Josephina Moors, Martinus Cornelis Maria Verhagen, Olav Waldemar Vladimir Frijns, Gerrit Van Donk, Henk Jan Van Gerner
  • HEAT PIPE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110232878
    Abstract: A heat pipe to maintain an object at a substantially uniform temperature is disclosed. The heat pipe includes a chamber containing a liquid reservoir and a vapor space, part of the chamber being defined by a condensing surface, and a liquid transporter to apply a force additional to gravity to liquid to transport liquid away from the condensing surface towards the reservoir, wherein the condensing surface is shaped such that condensed liquid moves along it towards the liquid transporter.
    Type: Application
    Filed: September 27, 2010
    Publication date: September 29, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Joost Jeroen Ottens, Hrishikesh Patel, Gerrit Van Donk, Johannes Van Es
  • HEAT PIPE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110075118
    Abstract: A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber.
    Type: Application
    Filed: September 27, 2010
    Publication date: March 31, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Johannes Henricus Wilhelmus JACOBS, Nicolaas Ten Kate, Joost Jeroen Ottens, Gerrit Van Donk, Johannes Ven Es