Abstract: A waveguide plate and a process for making the waveguide plate with a plate-like glass substrate (1), carrying a waveguiding layer (2), with at least one coupling grating on the surface carrying said waveguiding layer (2), which coupling grating is formed as a grating of lines with a period between 150 nm and 1000 nm, the extension of said grating being at least 5 cm with lines parallel to one another, wherein the coupling angle (?) varies by not more than 0.1°/cm along a line of said grating and wherein the absolute value of the deviation of the coupling angle (?) on said waveguide plate, from a predefined desired value, does not exceed 0.5°. The deviation from the average value of the coupling angle does not exceed 0.3°, preferably not 0.15° on the whole waveguide plate.

Abstract: The invention relates to a method for the ultrasensitive simultaneous measurement of nonlinear optical emission signals in one or two local dimensions. Said method comprises the following steps: the excitation light is irradiated in a power-modulated or pulse-modulated form from at least one light source into an interactive volume or onto an interactive area or layer (hereafter called interactive spaces) in which one or several emissions that are nonlinearly correlated with the excitement light can be excited; the light emanating from said interactive spaces is measured by means of a one-dimensional or two-dimensional detector array; the measured data is transmitted from said detector array to a computer, and said data is formatted in a one-dimensional or two-dimensional data matrix.

Abstract: A waveguide plate and a process for making the waveguide plate with a plate-like glass substrate (1), carrying a waveguiding layer (2), with at least one coupling grating on the surface carrying said waveguiding layer (2), which coupling grating is formed as a grating of lines with a period between 150 nm and 1000 nm, the extension of said grating being at least 5 cm with lines parallel to one another, wherein the coupling angle (?) varies by not more than 0.1°/cm along a line of said grating and wherein the absolute value of the deviation of the coupling angle (?) on said waveguide plate, from a predefined desired value, does not exceed 0.5°. The deviation from the average value of the coupling angle does not exceed 0.3°, preferably not 0.15° on the whole waveguide plate.

Abstract: A waveguide plate and a process for making the waveguide plate with a plate-like glass substrate (1), carrying a waveguiding layer (2), with at least one coupling grating on the surface carrying said waveguiding layer (2), which coupling grating is formed as a grating of lines with a period between 150 nm and 1000 nm, the extension of said grating being at least 5 cm with lines parallel to one another, wherein the coupling angle () varies by not more than 0.1_/cm along a line of said grating and wherein the absolute value of the deviation of the coupling angle () on said waveguide plate, from a predefined desired value, does not exceed 0.5_. The deviation from the average value of the coupling angle does not exceed 0.3_, preferably not 0.15_ on the whole waveguide plate.

Abstract: The invention relates to a kit for assay development and for carrying out a plurality of analyses, comprising a carrier substrate and a placement body jointly forming an arrangement of a plurality of sample compartments comprising said carrier substrate as a base plate, in addition to a plurality of immobilized binding partners for the detection of one or more analytes in one or more samples in a bioaffinity assay, said binding partners being arranged and immobilized on the carrier substrate inside the sample containers always in two-dimensional arrays of discrete measuring areas, wherein always at least one measuring area of an array or a partial surface inside an array or sample compartment, respectively, is provided on the carrier substrate for referencing purposes, and the surface density of the immobilized binding partners, in relation to the surface of the measurement areas, is less than the surface density of a full, i.e. extensive, monolayer of said binding partners.

Abstract: A coupling grating formed as a line grating with a grating period between 100 nm and 2500 nm, a substrate (1) is covered with a photoresist layer (10) and exposed for instance at the Lithrow angle (?L) or at 0° to a mercury-vapour lamp (11) via a folding mirror (13, 13?) through a phase mask (14) in the near field of which the photoresist layer is arranged, then structured by reactive ion etching and provided with a transparent layer by reactive DC magnetron sputtering, particularly pulsed DC sputtering or AC-superimposed DC sputtering. The phase mask (14) is structured in advance with the laser two-beam interference method. The process is particularly suited for the production of optical elements, particularly evane-scent field sensor plates and optical couplers for communications technology which can be employed in particular as filters for wavelength multiplexing in fibre-optic networks.

Abstract: For producing a coupling grating formed as a line grating with a grating period between 100 nm and 2500 nm, a substrate (1) is covered with a photoresist layer (10) and exposed for instance at the Lithrow angle (&THgr;L) or at 0° to a mercury-vapour lamp (11) via a folding mirror (13, 13′) through a phase mask (14) in the near field of which the photoresist layer is arranged, then structured by reactive ion etching and provided with a transparent layer by reactive DC magnetron sputtering, particularly pulsed DC sputtering or AC-superimposed DC sputtering. The phase mask (14) is structured in advance with the laser two-beam interference method. Since highly precise gratings can be produced even in large dimensions, the process is particularly suited for the production of optical elements, particularly evanescent field sensor plates and optical couplers for communications technology which can be employed in particular as filters for wavelength multiplexing in fibre-optic networks.

Abstract: A waveguide plate and a process for making the waveguide plate with a plate-like glass substrate (1), carrying a waveguiding layer (2), with at least one coupling grating on the surface carrying said waveguiding layer (2), which coupling grating is formed as a grating of lines with a period between 150 nm and 1000 nm, the extension of said grating being at least 5 cm with lines parallel to one another, wherein the coupling angle () varies by not more than 0.1_/cm along a line of said grating and wherein the absolute value of the deviation of the coupling angle () on said waveguide plate, from a predefined desired value, does not exceed 0.5_. The deviation from the average value of the coupling angle does not exceed 0.3_, preferably not 0.15_ on the whole waveguide plate.