Abstract: A lithographic apparatus is provided. The apparatus includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a high voltage conductor in a part of the apparatus that is evacuated or at a low pressure during normal use of the apparatus. The conductor is coated by an isolation layer having a conductivity that is high enough to prevent charge build-up on the outside thereof during use of the apparatus, and low enough to limit peak current flow during a breakdown.

Abstract: A lithographic apparatus equipped with a patterning device safety mechanism, is presented herein. In one embodiment, the apparatus comprises an illumination system for providing a beam of radiation, a support structure for supporting a patterning device that serves to impart the beam of radiation with a pattern in its cross-section, a substrate holder for holding a substrate having a plurality of target portions, a projection system for projecting the patterned beam onto the substrate target portions, a connector for securing the patterning device relative to the support structure; and a safety mechanism configured to reduce uncontrolled displacement of the patterning device in case of failure of the connector.

Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate is disclosed. The apparatus includes an optics compartment that contains a patterned surface of the patterning device and an optical element, and a substrate compartment connected to the optics compartment by a connection that is arranged to pass a patterned beam of radiation from the optical element to the substrate. The apparatus also includes a first flush gas inlet arranged to supply a first flush gas into the connection, a second flush gas inlet adjacent to the patterned surface and arranged to supply a second flush gas into the optics compartment and to create a region adjacent the patterned surface in which the second flush gas flows in a direction with a component normal to and away from the patterned surface, and a gas pump arranged to pump the flush gases from the optics compartment.

Abstract: A device manufacturing method includes projecting a patterned beam of radiation through an optics compartment and a channel that provides an open connection between the optics compartment and a substrate compartment onto a substrate, maintaining an ionized flush gas at a higher pressure in the channel than in the substrate compartment and in the optics compartment during the projecting, intercepting particles that emanate from the substrate with the ionized flush gas, pumping the flush gas carrying the intercepted particles from the substrate compartment using a pump coupled to a gas outlet coupled to at least one of the compartments, and establishing an electrical potential difference between a wall of the channel and the outlet and/or a rotor of the pump so that the outlet and/or the rotor of the pump attracts positively charged ions that stem from the flush gas in the channel.

Abstract: A lithographic apparatus equipped with an alignment system is presented herein. In one embodiment, the lithographic apparatus includes an illumination system that provides a beam of radiation, a patterning device that imparts the beam of radiation with a desired pattern in its cross-section and is supported by a support structure, a substrate holder that holds a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a conditioned chamber. The apparatus also includes an actuator that introduces either the patterning device or the substrate into the conditioned chamber and an alignment system, which is disposed outside the conditioned chamber, that positions the patterning device or the substrate in alignment with the projected patterned beam of radiation.

Abstract: An apparatus includes a first support structure configured to support an element that has an alignment marker provided with at least one height difference. The apparatus also includes an alignment sensor comprising a light source that is configured to provide a light beam that illuminates the alignment marker; and at least one detector configured to detect the at least one height difference of the alignment marker by analyzing the light beam reflected by the alignment marker. Such an apparatus may be used to align of the element with respect to the first support structure.

Abstract: The invention relates to a box for transporting lithographic patterning device, the box being arranged to cooperate with a lithographic apparatus. The transport box is provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. The box also comprises a closure part for closing the opening, and a channel system for evacuating and/or feeding gasses from/to the inner space the box. The invention also relates to a lithographic apparatus configured to cooperate with the transport box.

Abstract: According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. Prior to transfer of the patterning device from the inner space to the apparatus, the inner space is pressurized. The box may also comprise a closure part for closing the opening, and/or a channel system for evacuating and/or feeding gasses from/to the inner space of the box. Other embodiments include a lithographic apparatus comprising and/or configured to cooperate with such a box.

Abstract: An apparatus includes a first support structure configured to support an element that has an alignment marker provided with at least one height difference. The apparatus also includes an alignment sensor comprising a light source that is configured to provide a light beam that illuminates the alignment marker; and at least one detector configured to detect the at least one height difference of the alignment marker by analyzing the light beam reflected by the alignment marker. Such an apparatus may be used to align of the element with respect to the first support structure.

Abstract: A lithographic apparatus equipped with an alignment system is presented herein. In one embodiment, the lithographic apparatus includes an illumination system that provides a beam of radiation, a patterning device that imparts the beam of radiation with a desired pattern in its cross-section and is supported by a support structure, a substrate holder that holds a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a conditioned chamber. The apparatus also includes an actuator that introduces either the patterning device or the substrate into the conditioned chamber and an alignment system, which is disposed outside the conditioned chamber, that positions the patterning device or the substrate in alignment with the projected patterned beam of radiation.

Abstract: A lithographic apparatus is provided. The apparatus includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and a high voltage conductor in a part of the apparatus that is evacuated or at a low pressure during normal use of the apparatus. The conductor is coated by an isolation layer having a conductivity that is high enough to prevent charge build-up on the outside thereof during use of the apparatus, and low enough to limit peak current flow during a breakdown.

Abstract: A lithographic apparatus equipped with a patterning device safety mechanism, is presented herein. In one embodiment, the apparatus comprises an illumination system for providing a beam of radiation, a support structure for supporting a patterning device that serves to impart the beam of radiation with a pattern in its cross-section, a substrate holder for holding a substrate having a plurality of target portions, a projection system for projecting the patterned beam onto the substrate target portions, a connector for securing the patterning device relative to the support structure; and a safety mechanism configured to reduce uncontrolled displacement of the patterning device in case of failure of the connector.

Abstract: An assembly for use in a lithographic apparatus is disclosed. The assembly includes a reticle, and a reticle holder. The reticle holder is adjustable between a form closed reticle blocking state and a reticle releasing state. The reticle holder is arranged to (1) prevent movement of the reticle with respect to the reticle holder in at least one direction without friction when the reticle holder is in the form closed reticle blocking state, and (2) release the reticle when the reticle holder is in the reticle releasing state.

Abstract: A lithographic apparatus equipped with a patterning device safety mechanism, is presented herein. In one embodiment, the apparatus comprises an illumination system for providing a beam of radiation, a support structure for supporting a patterning device that serves to impart the beam of radiation with a pattern in its cross-section, a substrate holder for holding a substrate having a plurality of target portions, a projection system for projecting the patterned beam onto the substrate target portions, a connector for securing the patterning device relative to the support structure, and a safety mechanism configured to reduce uncontrolled displacement of the patterning device in case of failure of the connector.

Abstract: In a low-pressure environment, a voltage is applied between a tool tip in close proximity to a surface and that surface. Contaminants on the surface are attracted and adhere to the tool. A laser may also be used for in situ cleaning of components of a lithographic projection apparatus.

Abstract: A container for enclosing a mask for a lithographic device is disclosed. The container is at least partially translucent for radiation of at least a predetermined wavelength and is formed in such a way that an image can be obtained from outside the container using light of that wavelength.

Abstract: A method for transferring one or more substrates or masks in a storage box to an apparatus for handling, processing or using the substrates or masks or vice versa, the storage box including a cover having an openable cover part. The method includes providing the storage box onto an openable wall part of a wall of an enclosed protective environment of the apparatus such that the openable cover part overlaps the openable wall part, the protective environment being adapted to be filled with an inert gas or to be evacuated; opening the openable cover part and the openable wall part, whereby the cover of the storage box forms part of the wall of the protective environment and an inside of the storage box becomes part of the protective environment; and transferring at least one of the substrates or masks from an inside space of the storage box to an inside space of the protective environment, or vice versa.

Abstract: A lithographic mask is placed in a chamber which is then sealed. The gas pressure in the chamber is reduced to dislodge contaminant particles on the mask surface.

Abstract: A method for transferring one or more substrates or masks in a storage box to an apparatus for handling, processing or using the substrates or masks or vice versa, the storage box including a cover having an openable cover part. The method includes providing the storage box onto an openable wall part of a wall of an enclosed protective environment of the apparatus such that the openable cover part overlaps the openable wall part, the protective environment being adapted to be filled with an inert gas or to be evacuated; opening the openable cover part and the openable wall part, whereby the cover of the storage box forms part of the wall of the protective environment and an inside of the storage box becomes part of the protective environment; and transferring at least one of the substrates or masks from an inside space of the storage box to an inside space of the protective environment, or vice versa.

Abstract: In a low-pressure environment, a voltage is applied between a tool tip in close proximity to a surface and that surface. Contaminants on the surface are attracted and adhere to the tool. A laser may also be used for in situ cleaning of components of a lithographic projection apparatus.