Abstract: A spectrometer for sampling interferograms in two dimensions offering a large spectral band and high spectral resolution with a relative compactness. The spectrometer includes a refracting surface, an array of detecting elements and an array of diffusion elements capturing means at the refracting surface of an interferogram delivered from two interference beams (F1, F2) and forming interference lines parallel to each other along the transverse axis (Ox) of the interferogram within the plane (xOy) of the refracting surface, the array of detection elements being parallel to the plane of the refracting surface and arranged to detect the spatial distribution of the interferogram, wherein the array is a two-dimensional array over an entirety of which the detections elements are disposed equidistantly, and wherein interference lines exhibit an angular shift with the capturing means.

Abstract: The present invention relates to a spectrometer including a diopter (11); capturing means (15, 18) at said diopter (11) of an interferogram (12) originating from two interference beams (F1, F2) and forming interference lines (13) along the transverse axis (Ox) of the interferogram (12) within the plane (xOy) of the diopter (11), said capturing means (15, 18) including a network (18) of detection elements (19) so arranged to detect the spatial distribution of said interferogram (12), characterized in that said network (18) of detection elements (19) is two-dimensional and in that at least a portion of said capturing means (15, 18) and said interferogram (12) are tilted with regard to each other along the transverse axis (Ox) of the interferogram (12). The present invention also relates to a spectroscopic imaging device, including means for emitting two interference beams (F1, F2), and to such a spectrometer.

Abstract: The general field of the invention is that of devices for focusing light to subwavelength dimensions including at least one focusing structure having a metal film provided with a first aperture that penetrates the film, the aperture having dimensions an order of magnitude smaller than the working wavelength of the focusing device. In the devices according to the invention, the focusing structure has at least one optical cavity placed around the aperture so that, when the structure is illuminated with a radiant flux at the working wavelength of the device, a large part of this flux is concentrated on the aperture by said cavity. Several embodiments are described using various cavities that may comprise plasmon reflectors.

Abstract: A method for nanostructuring a film (2) of material includes a step of immersing the film (2) of material in an aqueous solution (3), during which an interference FIG. 6) including illuminated areas (6b) and dark areas (6a) is applied to at least one of the faces of the film (2). The material is a semiconductor inorganic material or oxide, which is able to be solubilised in aqueous solution under the effect of the absorption of light. The nanostructuring of the film (2) is effected, at its surface in contact with the aqueous solution (3), by photodissolution in the illuminated areas (6a) and/or by growth in the dark areas (6b) of the interference FIG. 6). Also described is a nanostructured coating film (5) obtained according to such a preparation method, as well as a nanostructured 3D film.

Abstract: The invention relates to a spectrograph (11) comprising a waveguide (10) provided with accesses (10; 10b, 12), a means for injecting two guided contra-propagative waves by each accesses in such a way that a spatial interference is formed in the waveguide, means (19, 20, 14, 16) for detecting the energy of the evanescent wave of the guided field produced by the interference of said contra-propagative waves.

Abstract: The general field of the invention is that of devices for focusing light to subwavelength dimensions including at least one focusing structure having a metal film provided with a first aperture that penetrates the film, the aperture having dimensions an order of magnitude smaller than the working wavelength of the focusing device. In the devices according to the invention, the focusing structure has at least one optical cavity placed around the aperture so that, when the structure is illuminated with a radiant flux at the working wavelength of the device, a large part of this flux is concentrated on the aperture by said cavity. Several embodiments are described using various cavities that may comprise plasmon reflectors.

Abstract: The invention relates to a spectrograph (11) comprising a waveguide (10) provided with accesses (10; 10b, 12), a means for injecting two guided contra-propagative waves by each accesses in such a way that a spatial interference is formed in the waveguide, means (19, 20, 14, 16) for detecting the energy of the evanescent wave of the guided field produced by the interference of said contra-propagative waves.

Abstract: A process for producing a structured area of porous silicon on a substrate, in which silicon is etched and structured by means of illumination, includes selectively aiming the illumination during or after the formation of the porous silicon directly at a selected area of a p-doped substrate in order to effect etching and structuring of the porous silicon in another area. A device for carrying out the process includes an illuminating system for supporting the etching process and for structuring the porous silicon, in which the illuminating system is selectively aimed during or after the formation of the porous silicon directly at a selected area of p-doped substrate in order to effect etching and structuring of the porous silicon in another area.