Abstract: A method and system for controlling the eccentricity of a near-circular orbit are embodied in a burn controller for an orbiting object (such as a satellite) that is configured to control burns to occur at either an apogee or a perigee of the orbit to effect a desired change in the eccentricity of the orbit. These burns occur at either an apogee or a perigee of the orbit depending upon the satellite's location in the long-period motion of the argument of perigee.

Abstract: A method and system for controlling the eccentricity of a near-circular orbit are embodied in a burn controller for an orbiting object (such as a satellite) that is configured to control burns to occur at either an apogee or a perigee of the orbit to effect a desired change in the eccentricity of the orbit. These burns occur at either an apogee or a perigee of the orbit depending upon the satellite's location in the long-period motion of the argument of perigee.

Abstract: Apparatus and process for cleaning the surface of a work piece include a first cleaning station for scrubbing a work piece and a second cleaning station for cleaning the pad used to scrub the surface of the work piece. The pad is cleaned during the “dead time” during which a first clean work pieces is unloaded and a subsequent dirty work piece is loaded into the first cleaning station. During the dead time the cleaning pad, mounted on a support stand that controls the cleaning pad, pivots from the first work piece cleaning station to the second pad cleaning station. The cleaning pad is lowered into the pad cleaning station and is brought into contact with a beater bar against which the pad surface is rotated. During the rotation the pad surface is washed with a cleaning fluid of the same composition as used to clean the work piece surface.

Abstract: The present invention relates to a wafer cleaning machine having an input station, a water track, a cleaning station, a rinsing station, a spin-dry station, and a load station. The input station includes two or more wafer supply areas for a continuous supply of wafers to the water track. After the wafers enter the water track from the input station, the wafers are transported down the track into the wafer cleaning station. The wafer cleaning station comprises a plurality of pairs of rollers which pull the wafers through the cleaning station and thereby clean the top and bottom flat surfaces of the wafers. A cleaning fluid manifold formed within the upper panel of the cleaning station facilitates effective distribution of the cleaning fluid to the rollers. From the cleaning station, the wafers are transported to a rinse station. From the rinsing station, the workpieces are transferred to a dual spin-dry station.

Abstract: A novel inking method and apparatus particularly well suited for the re-inking of used fabric ribbons such as of the chain-printer type. The apparatus preferably contains means for moving a fabric ribbon through an inking station onto a take-up roll, means in advance of the inking station for adjusting the edge-alignment of the ribbon, embossed or gravure inking means for supplying ink directly to the ribbon without compression of the ribbon, illumination means to facilitate the inspection of the ribbon for flaws and for uniformity of ink, and shut-off means for stopping the movement of the ribbon at any desired position.

Abstract: Apparatus for checking the edge alignment of a moving web and for making lateral adjustments in the position of the moving web to correct for deviations.

Abstract: A novel inking method and apparatus particularly well suited for the re-inking of used fabric ribbons such as of the chain-printer type. The apparatus preferably contains means for moving a fabric ribbon through an inking station onto a take-up roll, means in advance of the inking station for adjusting the edge-alignment of the ribbon, embossed or gravure inking means for supplying ink directly to the ribbon without compression of the ribbon, illumination means to facilitate the inspection of the ribbon for flaws and for uniformity of ink, and shut-off means for stopping the movement of the ribbon at any desired position.