Patents by Inventor Glenn H. McGall

Glenn H. McGall has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8034912
    Abstract: The present invention provides massively parallel oligonucleotide synthesis and purification for applications that utilize large collections of defined high-fidelity oligonucleotides (e.g., from about 101 to about 105 different sequences, generally between 25-160 bases in length).
    Type: Grant
    Filed: August 12, 2010
    Date of Patent: October 11, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Glenn H. McGall, Robert G. Kuimelis
  • Publication number: 20110245110
    Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.
    Type: Application
    Filed: May 9, 2011
    Publication date: October 6, 2011
    Applicant: AFFYMETRIX, INC.
    Inventors: Glenn H. McGall, Andrea Cupoletti
  • Publication number: 20110183869
    Abstract: Methods of performing confocal laser microscopy on a polymer array disposed on a silicon wafer substrate, the method comprising the steps of providing a silicon wafer substrate having a top side and a bottom side, coating the top side of the silicon wafer with an oxide coating to provide an oxide coated wafer, covalently coupling a plurality of probes to the top side of the coated wafer to provide a fixed polymer array, hybridizing the fixed polymer array with a plurality of labeled ligands, and assaying for one or more hybridized ligands using confocal laser fluorescence microscopy to detect hybridization are provided.
    Type: Application
    Filed: January 27, 2011
    Publication date: July 28, 2011
    Applicant: Affymetrix, INC.
    Inventors: Robert G. Kuimelis, Zihui Chen, Glenn H. McGall
  • Patent number: 7964654
    Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.
    Type: Grant
    Filed: September 14, 2010
    Date of Patent: June 21, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Glenn H. McGall, Andrea Cuppoletti
  • Publication number: 20110143967
    Abstract: Novel processes are disclosed for forming an array of polymers by functionalizing the surface of particles by methods that include covalently attaching a functionalized silicon compound. Substrates such as microparticles having functionalized silicon compounds attached thereto are produced by introducing at least one carboxyl group directly by silanating a carboxylated silane compound to the surface of a microparticle. In a further aspect of the invention, the silane compound is a dipodal carboxylated silane.
    Type: Application
    Filed: December 14, 2010
    Publication date: June 16, 2011
    Inventors: Glenn H. McGALL, Anthony D. BARONE, Randall J. TRUE
  • Publication number: 20110143966
    Abstract: Novel processes are disclosed for forming an array of polymers by functionalizing the surface of particles by methods that include covalently attaching a functionalized silicon compound. Substrates such as microparticles having functionalized silicon compounds attached thereto are produced by introducing at least one carboxyl group directly by silanating a carboxylated silane compound to the surface of a microparticle. In a further aspect of the invention, the silane compound is a dipodal carboxylated silane.
    Type: Application
    Filed: August 2, 2010
    Publication date: June 16, 2011
    Applicant: Affymetrix, INC.
    Inventors: Glenn H. McGall, Anthony D. Barone
  • Patent number: 7951601
    Abstract: Methods of performing confocal laser microscopy on a polymer array disposed on a silicon wafer substrate, the method comprising the steps of providing a silicon wafer substrate having a top side and a bottom side, coating the top side of the silicon wafer with an oxide coating to provide an oxide coated wafer, covalently coupling a plurality of probes to the top side of the coated wafer to provide a fixed polymer array, hybridizing the fixed polymer array with a plurality of labeled ligands, and assaying for one or more hybridized ligands using confocal laser fluorescence microscopy to detect hybridization are provided.
    Type: Grant
    Filed: December 21, 2006
    Date of Patent: May 31, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Robert G. Kuimelis, Zihui Chen, Glenn H. McGall
  • Publication number: 20110124526
    Abstract: Protective groups which may be cleaved with an activatable deprotecting reagents are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
    Type: Application
    Filed: January 21, 2011
    Publication date: May 26, 2011
    Applicant: Affymetrix, INC.
    Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
  • Patent number: 7910312
    Abstract: Protective groups which may be cleaved with an activatable deprotecting reagents are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
    Type: Grant
    Filed: July 16, 2010
    Date of Patent: March 22, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
  • Publication number: 20110046343
    Abstract: Methods are presented for generating large sets for polymers. The methods employ high density oligonucleotide array.
    Type: Application
    Filed: November 2, 2010
    Publication date: February 24, 2011
    Applicant: Affymetrix, INC.
    Inventors: Robert G. Kuimelis, Glenn H. McGall
  • Publication number: 20110046344
    Abstract: The present invention provides massively parallel oligonucleotide synthesis and purification for applications that utilize large collections of defined high-fidelity oligonucleotides (e.g., from about 101 to about 105 different sequences, generally between 25-160 bases in length).
    Type: Application
    Filed: November 2, 2010
    Publication date: February 24, 2011
    Applicant: Affymetrix, INC.
    Inventors: Robert G. Kuimelis, Glenn H. McGall
  • Publication number: 20110028350
    Abstract: Novel compounds are provided, which are useful as linking groups in chemical synthesis, preferably in the solid phase synthesis of oligonucleotides and polypeptides. These compounds are generally photolabile and comprise protecting groups which can be removed by photolysis to unmask a reactive group. The protecting group has the general formula Y, wherein Y is a chemical structure as shown in FIG. 5. Also provided is a method of forming, from component molecules, a plurality of compounds on a support, each compound occupying a separate predefined region of the support, using the protected compounds described above.
    Type: Application
    Filed: July 28, 2009
    Publication date: February 3, 2011
    Applicant: Affymetrix, INC.
    Inventors: Glenn H. McGall, Anthony D. Barone
  • Publication number: 20110015098
    Abstract: Protective groups which may be cleaved with an activatable deprotecting reagents are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
    Type: Application
    Filed: July 16, 2010
    Publication date: January 20, 2011
    Applicant: Affymetrix, INC.
    Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
  • Publication number: 20110003716
    Abstract: The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
    Type: Application
    Filed: July 8, 2010
    Publication date: January 6, 2011
    Applicant: Affymetrix, INC.
    Inventors: Mark O. Trulson, Glenn H. McGall, Bei-Shen Sywe, Lisa T. Kajisa, Dana Truong, Richard P. Rava, Martin J. Goldberg
  • Patent number: 7863344
    Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.
    Type: Grant
    Filed: November 3, 2008
    Date of Patent: January 4, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Glenn H. McGall, Andrea Cuppoletti
  • Patent number: 7862996
    Abstract: Protective groups which may be cleaved with an activatable deprotecting reagent are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
    Type: Grant
    Filed: December 28, 2006
    Date of Patent: January 4, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
  • Publication number: 20100331218
    Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.
    Type: Application
    Filed: September 14, 2010
    Publication date: December 30, 2010
    Applicant: Affymetrix, INC.
    Inventors: Glenn H. McGall, Andrea Cupoletti
  • Publication number: 20100324266
    Abstract: Novel compounds are provided, which are useful as linking groups in chemical synthesis, preferably in the solid phase synthesis of oligonucleotides and polypeptides. These compounds are generally photolabile and comprise protecting groups which can be removed by photolysis to unmask a reactive group. The protecting group has the general formula Y, wherein Y is a chemical structure as shown in FIG. 1. Also provided is a method of forming, from component molecules, a plurality of compounds on a support, each compound occupying a separate predefined region of the support, using the protected compounds described above.
    Type: Application
    Filed: June 9, 2010
    Publication date: December 23, 2010
    Applicant: Affymetrix, INC.
    Inventors: Anthony D. Barone, Glenn H. McGall
  • Publication number: 20100305006
    Abstract: The present invention provides massively parallel oligonucleotide synthesis and purification for applications that utilize large collections of defined high-fidelity oligonucleotides (e.g., from about 101 to about 105 different sequences, generally between 25-160 bases in length).
    Type: Application
    Filed: August 12, 2010
    Publication date: December 2, 2010
    Applicant: Affymetrix, INC.
    Inventors: Robert G. Kuimelis, Glenn H. McGall
  • Publication number: 20100298171
    Abstract: Novel processes are disclosed for the large scale preparation of arrays of polymer sequences wherein each array includes a plurality of different, positionally distinct polymer sequences having known monomer sequences. In one embodiment, two substrates are processed simultaneously in a reaction chamber, wherein the substrates are facing each other and in contact with a monomer solution. In a further embodiment, multiple rotating flow cells are used in combination with a photolysis equipment to synthesize wafers.
    Type: Application
    Filed: May 24, 2010
    Publication date: November 25, 2010
    Applicant: Affymetrix, INC.
    Inventors: Mohsen Shirazi, Adam Pawloski, Peter Meijles, Glenn H. McGall