Patents by Inventor Glenn P. Florczak

Glenn P. Florczak has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6268019
    Abstract: The present invention concerns the deposition of fluorine modified, titanium dioxide films (TiO2) onto hot glass by atmospheric pressure chemical vapor deposition (APCVD) using TiCl4 vapor. The invention is also suitable for depositing other metallic oxide films from their metallic halides such as SnCl4, GeCl4, and VCl4. The present invention provides a process that deposits a novel, fluorine modified, titanium dioxide film (TiO2) onto hot glass by atmospheric pressure chemical vapor deposition using TiCl4 vapor. The process uses injection of TiCl4 into a hot, nonoxygen containing carrier gas and blends the carrier gas and TiCl4 vapor with an oxygen containing gas stream containing a haze reducing quantity of a fluorine containing compound before contacting a surface of hot glass with the blended mixture. The process is capable of depositing a fluorine modified, TiO2 film at deposition rates exceeding 900 Å per second. The crystalline phase of the fluorine modified film is essentially anatase.
    Type: Grant
    Filed: May 19, 1999
    Date of Patent: July 31, 2001
    Assignee: ATOFINA Chemicals, Inc.
    Inventor: Glenn P. Florczak
  • Patent number: 5401305
    Abstract: A composition for coating glass by chemical-vapor deposition comprises a mixture of a tin oxide precursor monobutyltin trichloride, a silicon dioxide precursor tetraethylorthosilicate, and an accelerant such as triethyl phosphite; the composition is gaseous below 200.degree. C., and permits coating glass having a temperature from 450.degree. to 650.degree. C. at deposition rates higher than 350 .ANG./sec. The layer of material deposited can be combined with other layers to produce an article with specific properties such as controlled emissivity, refractive index, abrasion resistance, or appearance.
    Type: Grant
    Filed: December 13, 1993
    Date of Patent: March 28, 1995
    Assignee: Elf Atochem North America, Inc.
    Inventors: David A. Russo, Ryan R. Dirkx, Glenn P. Florczak
  • Patent number: RE41799
    Abstract: A composition for coating glass by chemical-vapor deposition comprises a mixture of a tin oxide precursor monobutyltin trichloride, a silicon dioxide precursor tetraethylorthosilicate, and an accelerant such as triethyl phosphite; the composition is gaseous below 200° C., and permits coating glass having a temperature from 450° to 650° C. at deposition rates higher than 350 ?/sec. The layer of material deposited can be combined with other layers to produce an article with specific properties such as controlled emissivity, refractive index, abrasion resistance, or appearance.
    Type: Grant
    Filed: April 7, 1999
    Date of Patent: October 5, 2010
    Assignee: Arkema Inc.
    Inventors: David A. Russo, Ryan R. Dirkx, Glenn P. Florczak