Abstract: The invention relates to a semiconductor device (10) with a substrate (11) and a semiconductor body (12) comprising a vertical bipolar transistor with an emitter region, a base region and a collector region (1, 2, 3) of, respectively, a first conductivity type, a second conductivity type opposite to the first conductivity type and the first conductivity type, wherein the collector region (3) comprises a first sub-region (3A) bordering the base region (2) and a second sub-region (3B) bordering the first sub-region (3A) which has a lower doping concentration than the second sub-region (3B), and the transistor is provided with a gate electrode (5) which laterally borders the first sub-region (3A) and by means of which the first sub-region (3A) may be depleted.

Abstract: An electronic component (100), a first electrode (101), a second electrode (102), and a convertible structure (103) electrically coupled between the first electrode (101) and the second electrode (102), being convertible between at least two states by heating and having different electrical properties in different ones of the at least two states, wherein the convertible structure (103) comprises terminal portions (104, 105) connected to the first electrode (101) and to the second electrode (102), respectively, and comprises a line portion (106) between the terminal portions (104, 105), the line portion (106) having a smaller width or thickness than the terminal portions (104, 105), and wherein the convertible structure (103) is arranged with respect to the first electrode (101) and the second electrode (102) so that, in one of the at least two states, the line portion (106) has an amorphous ‘Spot (107) extending along only a part of the line portion (106).

Abstract: The invention relates to a method of manufacturing a semiconductor device (10) with a substrate (11) and a semiconductor body (1), whereby in the semiconductor body (1) a semiconductor element is formed by means of a mesa-shaped protrusion of the semiconductor body (1), which is formed on the surface of the semiconductor device (10) as a nano wire (2), whereupon a layer (3) of a material is deposited over the semiconductor body (1) and the resulting structure is subsequently planarized in a chemical-mechanical polishing process such that an upper side of the nano wire (3) becomes exposed.

Abstract: The invention relates to a semiconductor device (10) with a semiconductor body (12) comprising a bipolar transistor with an emitter region, a base region and a collector region (1, 2, 3) of, respectively, a first conductivity type, a second conductivity type opposite to the first conductivity type, and the first conductivity type. One of the emitter or collector regions (1, 3) comprises a nanowire (30). The base region (2) has been formed from a layer (20) at the surface of the semiconductor body (12); the other one (3, 1) of the emitter or collector regions (1, 3) has been formed in the semiconductor body (12) below the base region (2). The emitter or collector region (1, 3) comprising the nanowire (30) has been provided on the surface of the semiconductor body (12) such that its longitudinal axis extends perpendicularly to the surface.

Abstract: The invention suggests a transistor (21) comprising a source (24) and a drain (29) as well as a barrier region (27) located between the source and the drain. The barrier region is separated from the source and the drain by intrinsic or lowly doped regions (26, 28) of a semiconductor material. Potential barriers are formed at the interfaces of the barrier region and the intrinsic or lowly doped regions. A gate electrode (32) is provided in the vicinity of the potential barriers such that the effective height and/or width of the potential barriers can be modulated by applying an appropriate voltage to the gate electrode.

Abstract: The invention relates to a semiconductor device (10) with a substrate (11) and a semiconductor body (12) comprising a vertical bipolar transistor with an emitter region, a base region and a collector region (1, 2, 3) of, respectively, a first conductivity type, a second conductivity type opposite to the first conductivity type and the first conductivity type, wherein the collector region (3) comprises a first sub-region (3A) bordering the base region (2) and a second sub-region (3B) bordering the first sub-region (3A) which has a lower doping concentration than the second sub-region (3B), and the transistor is provided with a gate electrode (5) which laterally borders the first sub-region (3A) and by means of which the first sub-region (3A) may be depleted.

Abstract: The present invention relates to Current mirror for generating a constant mirror ratio, comprising an output transistor (Tout) having a base, an emitter and a collector, wherein a current flowing through the collector of said output transistor (Tout) constitutes an output current (Iout) of said current mirror and the collector of said output transistor (Tout) is connectable to an output circuit, a buffer transistor having a base, an emitter and a collector, wherein the emitter of the buffer transistor is connected to the base of the output transistor, a buffer current source for providing a fixed buffer current, wherein said buffer current source is connected to the collector of the buffer transistor, and a buffer base voltage control means having an input connected to the base of the output transistor and an output connected to the base of the buffer transistor, wherein the base voltage control means is adapted to controlling a voltage at the base of the buffer transistor in response to a current at the inpu

Abstract: The invention relates to a so-called punch-through diode comprising a stack of, for example, an n++, p−, p+, n++ region (1, 2, 3, 4). In the known diode, these regions (1, 2, 3, 4) are arranged on a substrate (11) in said order. The diode is provided with connection conductors (5, 6). Such a diode does not have a steep I-V characteristic and hence is less suitable as a TVSD (=Transient Voltage Suppression Device). Particularly at voltages below 5 volts, a punch-through diode could form an attractive alternative for use as a TVSD. A punch-through diode according to the invention has an inverted structure, which means that the regions (1, 2, 3, 4) are positioned in reverse order on the substrate (11) and thus, the first region (1) adjoins the surface, and the fourth region (4) adjoins the substrate (11). Such a diode has a very steep I-V characteristic, is very suitable as a TVSD and functions very well at an operating voltage below 5 volts.

Abstract: The invention relates to a so-called punch-through diode comprising a stack of, for example, an n++, p−, p+, n++ region (1, 2, 3, 4). In the known diode, these regions (1, 2, 3, 4) are arranged on a substrate (11) in said order. The diode is provided with connection conductors (5, 6). Such a diode does not have a steep I-V characteristic and hence is less suitable as a TVSD (=Transient Voltage Suppression Device). Particularly at voltages below 5 volts, a punch-through diode could form an attractive alternative for use as a TVSD.