Abstract: A three-terminal bidirectional GaN FET with a single gate. The device is formed by integrating a single-gate bidirectional GaN FET in parallel with a bidirectional device formed of two back-to-back GaN FETs with a source that is connected to the field plate of the device and does not have a pin-out. Diodes or gate-shorted-to-source FETs are connected between the source without pin-out and the D/S and S/D power terminals of the device. In another embodiment, a single-gate bidirectional GaN FET is provided with diodes or gate-shorted-to-source FETs connected between the substrate and the power terminals of the device.

Abstract: An integrated circuit which includes a GaN FET and a metal-insulator-metal capacitor. The capacitor is fully integrated with a lateral GaN process flow, i.e., the same gate metal layer, field plate metal layer and dielectric layer of the GaN FET are also used to form the bottom plate, insulator and top plate of the capacitor. The top plate is contacted by a conductive via, which extends through the top plate. To increase the voltage breakdown capability of the capacitor of the integrated circuit, a portion of the gate metal layer is formed in the shape of a ring around the conductive via.