Patents by Inventor Gottlieb Stefan Oehrlein

Gottlieb Stefan Oehrlein has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus for hot wall reactive ion etching using a dielectric or metallic liner with temperature control to achieve process stability
    Patent number: 5798016
    Abstract: The present invention relates to a method and apparatus for etching semiconductor devices where the undesirable deposition of films on the internal surfaces of the apparatus are prevented during the etching process. The system for etching devices provides an etching chamber having a deposition resistant surface, a holder for holding the device to be etched, and a heater for heating the deposition resistant surface to a temperature between 100.degree. C. to 600.degree. C. to impede the formation of films on the walls of the chamber. The etching system may further include the deposition resistant surface surrounding the holder while not interfering with the plasma used to etch the substrate.
    Type: Grant
    Filed: March 8, 1994
    Date of Patent: August 25, 1998
    Assignee: International Business Machines Corporation
    Inventors: Gottlieb Stefan Oehrlein, David Vender, Ying Zhang, Marco Haverlag
  • Promotion of the adhesion of fluorocarbon films
    Patent number: 5788870
    Abstract: The adhesion between a polymeric fluorocarbon film and a substrate is improved by providing a non-volatile carbide-forming metallic layer intermediate the substrate and the polymeric fluorocarbon film, and exposing the substrate to ion-bombardment in a noble gas/polymerizing gas atmosphere prior to providing the fluorocarbon films.
    Type: Grant
    Filed: November 15, 1995
    Date of Patent: August 4, 1998
    Assignee: International Business Machines Corporation
    Inventors: Thao Ngoc Nguyen, Gottlieb Stefan Oehrlein, Zeev Avraham Weinberg