Abstract: Photosensitive donor elements, assemblages, and associated processes are described for use in a laser-induced thermal transfer process, said elements comprising in the order listed a support; a photohardenable layer comprising a binder, at least one photohardenable component, and an initiator; optionally a barrier layer; optionally a coversheet; at least one ejection layer comprising a first polymer having a decomposition temperature T.sub.1 ; at least one top layer having an outer surface and comprising (i) a second polymer having a decomposition temperature T.sub.2 and (ii) an imageable component. For photomask fabrication applications, the imageable component is preferably black. Assemblages made with these donor elements are useful for fabrication of photomasks on various photohardenable materials, including flexographic printing plates and photoresists.

Abstract: Donor elements, assemblages, and associated processes are described for use in a laser-induced thermal transfer process, said elements comprising in the order listed (a) at least one flexible ejection layer comprising a first polymer having a decomposition temperature T.sub.1 and characteristic glass transition temperatures of T.sub.g.sup.0 and T.sub.g.sup.1 for unplasticized and plasticized polymer samples, respectively, wherein the tensile modulus of the flexible ejection layer(s) structure is less than or equal to 2.5 Gigapascals; (b) at least one heating layer; (c) at least one transfer layer comprising (i) a second polymer having a decomposition temperature T.sub.2, wherein T.sub.2 .gtoreq.(T.sub.1 +100.degree. C.