Abstract: An apparatus wherein a beam of substantially coherent light passes through a window in a chamber and then through the chamber in a direction substantially parallel, and contiguous, to substrates in the chamber. The beam ionizes gases in a mixture in the chamber. The ionized gases combine to form a substance which becomes deposited on the substrate(s) as a layer or which etches a previously deposited layer on the substrate. As the beam moves through the chamber, it loses energy.

Abstract: A beam of substantially coherent light passes through a window in an enclosure in a direction substantially parallel, but contiguous, to a substrate in the enclosure to produce a deposition of a substance on the substrate. The beam may have a width corresponding substantially to the width of the substrate or it may be relatively narrow and swept across the substrate. The beam is relatively narrow in a direction substantially perpendicular to the substrate. Differences in the beam strength at individual positions along the substrate may be compensated by reflecting the beam, after passing the substrate, to travel in a reverse direction along the substrate or by directing the beam slightly downwardly along the substrate during movement along the substrate. A second substrate may be substantially parallel to, but slightly spaced from, the first substrate, so that the light beam passes between the substrates to obtain a deposition of the substance on both substrates.

Abstract: This invention relates to apparatus and methods for laser induced vapor deposition upon a substrate. The invention includes apparatus isolated from the deposition chamber for preheating the substrate before deposition. A bellows arrangement permits adjustment of the heat applied to the substrate.