Patents by Inventor Gregory Dominic Spaziano

Gregory Dominic Spaziano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoacid generators for use in photoresist compositions
    Patent number: 6855476
    Abstract: A photoacid compound having the following general structure: R—O(CF2)nSO3X wherein n is an integer between about 1 to 4; R is selected from the group consisting of: substituted or unsubstituted C1-C12 linear or branched alkyl or alkenyl, substituted or unsubstituted araalkyl, substituted or unsubstituted aryl, substituted or unsubstituted bicycloalkyl, substituted or unsubstituted tricycloalkyl, hydrogen, alkyl sulfonic acid, substituted or unsubstituted perfluoroalkyl, the general structure F((CF2)pO)m(CF2)q— wherein p is between about 1 to 4, m is between about 0 to 3 and q is between about 1 to 4, and substituted or unsubstituted partially fluorinated alkyl, halofluoroalkyl, perfluoroalkylsulfonic, or glycidyl; and X is selected from the group consisting of: organic cations and covalently bonded organic radicals.
    Type: Grant
    Filed: April 5, 2002
    Date of Patent: February 15, 2005
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Lawrence Ferreira, Andrew J. Blakeney, Gregory Dominic Spaziano, Ognian Dimov, J. Thomas Kocab, John P. Hatfield
  • Photoacid generators for use in photoresist compositions
    Publication number: 20020197558
    Abstract: A photoacid compound having the following general structure:
    Type: Application
    Filed: April 5, 2002
    Publication date: December 26, 2002
    Applicant: ARCH SPECIALTY CHEMICALS, INC.
    Inventors: Lawrence Ferreira, Andrew J. Blakeney, Gregory Dominic Spaziano, Ognian Dimov, J. Thomas Kocab, John P. Hatfield