Patents by Inventor Gregory Piatt

Gregory Piatt has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11482968
    Abstract: The present disclosure provides systems and methods for improved bifacial solar modeling. A method may comprise measuring an albedo of a surface on which an array of bifacial solar modules is disposed and setting an albedo parameter of a bifacial gain model. The method may further comprise measuring a backside irradiance of the array and setting a backside irradiance parameter. The method may further comprise setting a shed transparency parameter using the measured backside irradiance and a geometric model of the array. The method may further comprise setting a rear shading parameter using a shading model of the array. The method may further comprise computing an expected bifacial gain of the array. The method may further comprise determining an actual bifacial gain of the array. The method may further comprise setting a rear mismatch parameter to minimize a loss function of the expected bifacial gain and the actual bifacial gain.
    Type: Grant
    Filed: June 10, 2021
    Date of Patent: October 25, 2022
    Assignee: 8ME NOVA, LLC
    Inventors: Clayton Gregory Piatt, Tirumalai Tejas
  • Publication number: 20220311380
    Abstract: The present disclosure provides systems and methods for improved bifacial solar modeling. A method may comprise measuring an albedo of a surface on which an array of bifacial solar modules is disposed and setting an albedo parameter of a bifacial gain model. The method may further comprise measuring a backside irradiance of the array and setting a backside irradiance parameter. The method may further comprise setting a shed transparency parameter using the measured backside irradiance and a geometric model of the array. The method may further comprise setting a rear shading parameter using a shading model of the array. The method may further comprise computing an expected bifacial gain of the array. The method may further comprise determining an actual bifacial gain of the array. The method may further comprise setting a rear mismatch parameter to minimize a loss function of the expected bifacial gain and the actual bifacial gain.
    Type: Application
    Filed: June 10, 2021
    Publication date: September 29, 2022
    Inventors: Clayton Gregory Piatt, Tirumalai Tejas
  • Patent number: 11063556
    Abstract: The present disclosure provides systems and methods for improved bifacial solar modeling. A method may comprise measuring an albedo of a surface on which an array of bifacial solar modules is disposed and setting an albedo parameter of a bifacial gain model. The method may further comprise measuring a backside irradiance of the array and setting a backside irradiance parameter. The method may further comprise setting a shed transparency parameter using the measured backside irradiance and a geometric model of the array. The method may further comprise setting a rear shading parameter using a shading model of the array. The method may further comprise computing an expected bifacial gain of the array. The method may further comprise determining an actual bifacial gain of the array. The method may further comprise setting a rear mismatch parameter to minimize a loss function of the expected bifacial gain and the actual bifacial gain.
    Type: Grant
    Filed: March 24, 2021
    Date of Patent: July 13, 2021
    Assignee: 8me Nova, LLC
    Inventors: Clayton Gregory Piatt, Tirumalai Tejas
  • Publication number: 20060086608
    Abstract: A contact ring for use in electroplating of a substrate material is constructed such that fluid (e.g., electrolyte) is allowed to flow radially away from the axis of a toroidal support ring, thus preventing the trapping of fluids between the substrate and the toroidal support ring. The contact ring is constructed with a series of openings arranged about the circumference of the ring and wherein an electrical contact is placed in the path of each opening so any fluid passing through the opening also passes around the associated electrical contact. Further, the electrical contacts are also placed such that a substrate (e.g., a semiconductor wafer) can be placed inside the support ring so as to electrically contact the electrical contacts. The toroidal support ring has an aerodynamically streamlined cross-section at the openings, such that fluid flows through the openings with reduced aerodynamic drag.
    Type: Application
    Filed: October 25, 2004
    Publication date: April 27, 2006
    Inventors: Byung-Sung Kwak, Gregory Piatt, Hiroshi Mizuno
  • Publication number: 20060076036
    Abstract: An apparatus for cleaning a substrate. A cleaning chamber contacts the substrate with a cleaning solution. The cleaning solution thereby removes contaminants from the substrate and additionally leaches material from the substrate. A gettering chamber receives the cleaning solution, and includes a surface for chemically attracting the leached material and precipitating the leached material at least in part out of the cleaning solution. By removing the leached copper from the cleaning solution In this manner, the various embodiments of the present invention reduce the amount of copper that is available for plating out of the solvent, and therefore reduces the number and size of nodules that can form on the substrate. Thus, the need for other expensive approaches, like chemical replacement or less effective cleaning solvents, is obviated.
    Type: Application
    Filed: October 12, 2004
    Publication date: April 13, 2006
    Inventors: Bruce Whitefield, Gregory Piatt, Michael Gatov