Abstract: In a radiation source for the generation of short-wavelength radiation, it is the object of the invention to effectively increase the protection of the collimator optics by a buffer gas without substantially reducing the radiation transmission. A vacuum chamber which encloses a radiation-emitting plasma and is outfitted with at least one feed line and one outlet line for a buffer gas in order to ensure protection against debris for at least one optical element which directs the radiation to a radiation outlet opening in the vacuum chamber has chamber areas with particle deceleration of varying magnitude by the buffer gas. The particle deceleration is greater at least in a first chamber area in which the optical element is arranged than in any other chamber area.

Abstract: The invention is directed to an arrangement for generating a pulsed laser beam with high average output, in particular for generating a hot plasma which emits extreme ultraviolet (EUV) radiation. It is the object of the invention to find a novel possibility for generating a laser beam with a high repetition rate and average output which allows the repetition frequency and, therefore, the output of the laser system to be increased by connecting together a plurality of individual lasers having limited repetition rate without degradation of the beam quality on the target compared to that of an individual laser.

Abstract: The object of an arrangement and a method for the generation of extreme ultraviolet radiation is to construct the radiation source with an increased lifetime of the electrodes for using various emitters, wherein deposits inside the discharge chamber are reduced considerably when using metal emitters. The starting material is supplied as a continuous series of individual volumes which are introduced successively by directed injection and are pre-ionized by a pulsed energy beam. At least the electrode that is thermally loaded to a comparatively greater degree is constructed as a rotating electrode.

Abstract: An arrangement for the generation of radiation by a gas discharge has the object of achieving a considerable reduction in the inductance of the discharge circuit for the gas discharge while simultaneously increasing the lifetime of the electrode system. Also, the use of different emitters is ensured. A rotary electrode arrangement accommodated in the discharge chamber contains electrodes which are rigidly connected to one another at a distance from one another and are mounted so as to be rotatable around a common axis. Capacitor elements of a high-voltage power supply for generating high-voltage pulses for the two electrodes are arranged in a free space formed by the mutual distance. The electrodes are electrically connected to the capacitor elements and to a voltage source for charging the capacitor elements.

Abstract: The invention is directed to a method and an arrangement for plasma-based generation of soft x-radiation, particularly for the generation of extreme ultraviolet (EUV) radiation. The object of the invention, to find a novel possibility for providing a target for a plasma-based radiation source which permits a reduction in the heating and erosion of the nozzle and therefore permits an improved temperature control at the injection device, is met according to the invention in that a closure device is arranged between the target nozzle and the interaction region which interrupts an opening for temporarily passing the target flow by mechanically moving elements, wherein at least a portion of the target flow that is provided in a reproducible manner is separated in order to interact with the energy beam only during those time intervals in which an optical transmission from the interaction region to the target nozzle is prevented by the closure device.

Abstract: A short-wavelength radiation is generated which is stable over time from a plasma generated by energy input into a target jet, in which intensity variations due to altered coupling of excitation radiation into the target jet are minimized. Measuring devices are provided for successive detection over time of deviations of at least one of the directions of the target jet or the energy beam from an intersection point of the two directions that is provided as an interaction point. The measuring devices have output signals which are suitable as regulating variables for the orientation of the directions on the interaction point, and actuating elements are provided for adjusting and tracking at least one of the directions of either the target jet or the energy beam depending on the output signal of the measuring devices in the manner of a control loop.

Abstract: The object of a plasma radiation source is to ensure a more effective protection against debris and, in particular, to counteract secondary sputtering. A target flow that is provided by a target generator by means of a target nozzle and a plasma that is generated by a pulsed excitation beam are enclosed within a vacuum chamber by a gas flow directed transverse to the optical axis.

Abstract: In a radiation source for the generation of short-wavelength radiation, it is the object of the invention to effectively increase the protection of the collimator optics by a buffer gas without substantially reducing the radiation transmission. A vacuum chamber which encloses a radiation-emitting plasma and is outfitted with at least one feed line and one outlet line for a buffer gas in order to ensure protection against debris for at least one optical element which directs the radiation to a radiation outlet opening in the vacuum chamber has chamber areas with particle deceleration of varying magnitude by the buffer gas. The particle deceleration is greater at least in a first chamber area in which the optical element is arranged than in any other chamber area.

Abstract: The invention is directed to an arrangement for generating a pulsed laser beam with high average output, in particular for generating a hot plasma which emits extreme ultraviolet (EUV) radiation. It is the object of the invention to find a novel possibility for generating a laser beam with a high repetition rate and average output which allows the repetition frequency and, therefore, the output of the laser system to be increased by connecting together a plurality of individual lasers having limited repetition rate without degradation of the beam quality on the target compared to that of an individual laser.

Abstract: The invention is directed to an arrangement for providing a reproducible target flow for the energy beam-induced generation of short-wavelength radiation. It is the object of the invention to find a novel possibility for providing a reproducibly supplied target flow for the generation of a plasma that emits short-wavelength radiation which ensures a high directional stability of the target flow over a large number of individual plasma generation process for any target materials under given process conditions. According to the invention, this object is met in that a nozzle protection device is provided in the interaction chamber between the target nozzle and the interaction point for the generation of the plasma, and the nozzle protection device contains a gas pressure chamber which has an aperture along the target path for unobstructed passage of the target flow and which is filled with a buffer gas that is maintained at a pressure of some 10 mbar.

Abstract: The invention is directed to an arrangement for generating intensive radiation based on a plasma, particularly short-wavelength radiation from soft x-ray radiation to extreme ultraviolet (EUV) radiation. The object of the invention is to find a novel possibility for generating radiation generated from plasma in which the individual pulse energy coupled into the plasma and, therefore, the usable radiation output are appreciably increased while retaining the advantages of mass-limited targets. According to the invention, this object is met in that the target generator has a multiple-channel nozzle with a plurality of separate orifices, wherein the orifices generate a plurality of target jets, the excitation radiation for generating plasma being directed simultaneously portion by portion to the target jets.

Abstract: The invention is directed to an arrangement for providing target material for the generation of short-wavelength electromagnetic radiation, in particular EUV radiation. It is the object of the invention to find a novel possibility for providing target material for the generation of short-wavelength radiation based on an energy beam induced plasma which makes it possible to supply a reproducible successive flow of mass-limited targets in the interaction chamber in such a way that only the amount of target material needed for efficient generation of radiation achieves plasma generation. This object is met, according to the invention, in that the target generator opens into a selection chamber which precedes the interaction chamber and which has, along the target path, an outlet opening into the interaction chamber and in which a target selector is arranged.

Abstract: The invention is directed to an arrangement for metering target material for the generation of short-wavelength electromagnetic radiation from an energy beam induced plasma, in particular X radiation and EUV radiation. The object of the invention is to find a novel possibility for metering target material for the generation of short-wavelength electromagnetic radiation from an energy beam induced plasma which makes it possible to provide reproducibly supplied mass-limited targets in such a way that only the amount of target material for plasma generation that can be effectively converted to radiating plasma in the desired wavelength region arrives in the interaction chamber and, therefore, debris generation and the gas burden in the interaction chamber are minimized.

Abstract: The invention is directed to an apparatus for generating soft x-radiation, particularly EUV radiation, by laser-induced plasma. The object of the invention, to find a novel possibility for generating EUV radiation by means of a laser-induced plasma by which a temporally stable radiation emission in the desired wavelength region is ensured when interacting with the target without active regulation of the laser beam, is met according to the invention in that at least one laser is directed to the target, wherein the laser has at least one defined plane with a highly stable spatial distribution of the power density of the laser, and this defined plane is imaged on the target by an optical imaging system so as to be reduced so that the optical image of the defined plane is active for the plasma generation instead of the laser focus. The invention is applied in exposure machines for semiconductor lithography for spatially stable generation of radiation.

Abstract: The invention is directed to a method and an arrangement for the plasma-based generation of intensive short-wavelength radiation, particularly EUV radiation.

Abstract: In order to provide a positioning device for the exact positioning of a first optical component relative to a second optical component, with which optical components may be positioned relative to one another in an exact and permanent manner and which allows, in addition, relatively simple adjustment, it is suggested that the positioning device comprise a first fixing element and at least one second fixing element which are guided relative to one another by a guide means such that they can be moved towards one another essentially only in a clamping direction and that the positioning device have at least one support element arranged between them, the position of which relative to the fixing elements can be adjusted in at least one direction transversely to the clamping direction and can be fixed between the fixing elements by way of clamping and that the optical components be held on different ones of the elements adjustable relative to one another.

Abstract: The invention is directed to a method and an arrangement for plasma-based generation of soft x-radiation, particularly for the generation of extreme ultraviolet (EUV) radiation. The object of the invention, to find a novel possibility for providing a target for a plasma-based radiation source which permits a reduction in the heating and erosion of the nozzle and therefore permits an improved temperature control at the injection device, is met according to the invention in that a closure device is arranged between the target nozzle and the interaction region which interrupts an opening for temporarily passing the target flow by mechanically moving elements, wherein at least a portion of the target flow that is provided in a reproducible manner is separated in order to interact with the energy beam only during those time intervals in which an optical transmission from the interaction region to the target nozzle is prevented by the closure device.

Abstract: The invention is directed to an arrangement for stabilizing the radiation emission of a plasma, particularly for generating extreme ultraviolet (EUV) radiation.

Abstract: The invention is directed to an arrangement for generating intensive radiation based on a plasma, particularly short-wavelength radiation from soft x-ray radiation to extreme ultraviolet (EUV) radiation. The object of the invention is to find a novel possibility for generating radiation generated from plasma in which the individual pulse energy coupled into the plasma and, therefore, the usable radiation output are appreciably increased while retaining the advantages of mass-limited targets. According to the invention, this object is met in that the target generator has a multiple-channel nozzle with a plurality of separate orifices, wherein the orifices generate a plurality of target jets, the excitation radiation for generating plasma being directed simultaneously portion by portion to the target jets.

Abstract: In order to provide a positioning device for the exact positioning of a first optical component relative to a second optical component, with which optical components may be positioned relative to one another in an exact and permanent manner and which allows, in addition, relatively simple adjustment, it is suggested that the positioning device comprise a first fixing element and at least one second fixing element which are guided relative to one another by a guide means such that they can be moved towards one another essentially only in a clamping direction and that the positioning device have at least one support element arranged between them, the position of which relative to the fixing elements can be adjusted in at least one direction transversely to the clamping direction and can be fixed between the fixing elements by way of clamping and that the optical components be held on different ones of the elements adjustable relative to one another.