Abstract: An electrostatic discharge (ESD) protection circuit is provided. The ESD circuit includes a first transistor, a second transistor, and a silicon-controlled rectifier (SCR) circuit. The first transistor includes a first current electrode coupled at a first node, and a second current electrode and a control electrode coupled at a first voltage supply node. The second transistor includes a first current electrode, a second current electrode, and a control electrode. The control electrode of the second transistor is coupled at a body electrode of the first transistor. The SCR circuit includes an anode electrode coupled at the first node, a cathode electrode coupled at the first voltage supply node, and a trigger input coupled at the first current electrode of the second transistor.

Abstract: An integrated circuit includes a first semiconductor device with an N type region biased by a first terminal and a second semiconductor device with a second region. An N type guard region is located laterally between the N type region of the first semiconductor device and the second region. A P type region is isolated in the N type guard region and is biased by a second terminal. The N type guard region is either electrically coupled to the second terminal through a resistor circuit or is characterized as floating.

Abstract: An integrated circuit includes two N wells from two different devices in close proximity to each other with each N well biased by two different terminals. The N wells are at least partially surrounded by P type regions that are biased by a terminal. The integrated circuit includes conductivity reduction features that increase the resistivity of current paths to a P type regions of one device on a side closest the other device. The integrated circuit includes two conductive tie biasing structures each located directly over an N type region of the substrate and directly over a P type region of the substrate. The two conductive tie biasing structures are not electrically connected to each other and are not electrically coupled to each other by a conductive biasing structure.

Abstract: Embodiments of a method, a circuit and a system are disclosed. In an embodiment, a discharge protection circuit is disclosed. The discharge protection circuit includes a switch having a capacitive coupling between a gate and a drain of the switch, wherein the capacitive coupling facilitates a capacitively coupled current. The discharge protection circuit further includes a gate network including at least the gate of the switch, a gate control element and a resistor connected to the gate and the gate control element. In addition, the discharge protection circuit includes an electrostatic discharge rail that connects to a diode that is coupled to the gate and the resistor, wherein the capacitive coupling facilitates sinking of at least a part of an electrostatic discharge current via the gate network.

Abstract: As disclosed herein, an integrated circuit substrate includes a first region coupled to a signal terminal and includes a guard region coupled via a diode circuit to a supply voltage terminal of the integrated circuit. The first region and the guard region are both of a first conductivity type. A cathode of the diode circuit is connected to the guard region and an anode of the diode circuit is connected to the supply voltage terminal. The first region and the guard region are separated by at least by a second region of the substrate that is of a second conductivity type opposite the first conductivity type.

Abstract: One example discloses a voltage limiting device, including: a first I/O port; a second I/O port; a voltage limiter, coupled to the first and second I/O ports, and configured to shunt a voltage received on the first and/or second I/O ports having an absolute value greater than a voltage limit; wherein the voltage limiter includes a first portion and a second portion; wherein the first portion includes a first current shunt coupled between the first I/O port and a mid-net, and a second current shunt coupled between the second I/O port and the mid-net; and wherein the second portion includes a third current shunt having one end coupled to the mid-net and another end coupled to a ground.

Abstract: One example discloses a voltage limiting device, including: a first I/O port; a second I/O port; a voltage limiter, coupled to the first and second I/O ports, and configured to shunt a voltage received on the first and/or second I/O ports having an absolute value greater than a voltage limit; wherein the voltage limiter includes a first portion and a second portion; wherein the first portion includes a first current shunt coupled between the first I/O port and a mid-net, and a second current shunt coupled between the second I/O port and the mid-net; and wherein the second portion includes a third current shunt having one end coupled to the mid-net and another end coupled to a ground.

Abstract: Embodiments of a method, a circuit and a system are disclosed. In an embodiment, a discharge protection circuit is disclosed. The discharge protection circuit includes a switch having a capacitive coupling between a gate and a drain of the switch, wherein the capacitive coupling facilitates a capacitively coupled current. The discharge protection circuit further includes a gate network including at least the gate of the switch, a gate control element and a resistor connected to the gate and the gate control element. In addition, the discharge protection circuit includes an electrostatic discharge rail that connects to a diode that is coupled to the gate and the resistor, wherein the capacitive coupling facilitates sinking of at least a part of an electrostatic discharge current via the gate network.

Abstract: An electrostatic discharge power rail clamp circuit and an integrated circuit including the same. The power rail clamp circuit includes a first power rail, a second power rail and a first node. The circuit further includes an n-channel field effect transistor having a source and drain located in an isolated p-well in a semiconductor substrate. The drain is connected to the first power rail. The source and isolated p-well are connected to the first node. The circuit also includes a capacitor connected between the first node and the second power rail. The circuit further includes a resistor connected between the first power rail and the first node. The circuit also includes an inverter for controlling the gate of the field effect transistor, wherein the inverter has an input connected to the first node. The circuit further a silicon controlled rectifier connected between the first node and the second power rail.

Abstract: A silicon controlled rectifier, an electrostatic discharge (ESD) protection circuit including the silicon controlled rectifier and an integrated circuit including the silicon controlled rectifier or ESD protection circuit. The silicon controlled rectifier includes a first region having a first conductivity type and a second region having a second conductivity type located adjacent the first region in a semiconductor substrate. A junction is formed at a boundary between the first region and the second region. Contact regions of the first conductivity type and the second conductivity type located in each of the first region and the second region. A further contact region of the second conductivity type is located in the second region, in between the contact region of the first conductivity type and the junction. The further contact region and the contact region of the second conductivity type in the second region are connected together for biasing the second region.

Abstract: An electrostatic discharge protection device including a silicon controlled rectifier. In one example, the silicon controlled rectifier includes a first n-type region located in a semiconductor substrate. The silicon controlled rectifier also includes a first p-type region located adjacent the first n-type region in the semiconductor substrate. The silicon controlled rectifier further includes an n-type contact region and a p-type contact region located in the first n-type region. The silicon controlled rectifier also includes an n-type contact region and a p-type contact region located in the first p-type region. The silicon controlled rectifier further includes a blocking region having a higher resistivity than the first p-type region. The blocking region is located between the n-type contact region and the p-type contact region in the first p-type region for reducing a trigger voltage of the silicon controlled rectifier.

Abstract: An electrostatic discharge protection device including a silicon controlled rectifier. In one example, the silicon controlled rectifier includes a first n-type region located in a semiconductor substrate. The silicon controlled rectifier also includes a first p-type region located adjacent the first n-type region in the semiconductor substrate. The silicon controlled rectifier further includes an n-type contact region and a p-type contact region located in the first n-type region. The silicon controlled rectifier also includes an n-type contact region and a p-type contact region located in the first p-type region. The silicon controlled rectifier further includes a blocking region having a higher resistivity than the first p-type region. The blocking region is located between the n-type contact region and the p-type contact region in the first p-type region for reducing a trigger voltage of the silicon controlled rectifier.

Abstract: A silicon controlled rectifier, an electrostatic discharge (ESD) protection circuit including the silicon controlled rectifier and an integrated circuit including the silicon controlled rectifier or ESD protection circuit. The silicon controlled rectifier includes a first region having a first conductivity type and a second region having a second conductivity type located adjacent the first region in a semiconductor substrate. A junction is formed at a boundary between the first region and the second region. Contact regions of the first conductivity type and the second conductivity type located in each of the first region and the second region. A further contact region of the second conductivity type is located in the second region, in between the contact region of the first conductivity type and the junction. The further contact region and the contact region of the second conductivity type in the second region are connected together for biasing the second region.

Abstract: An electrostatic discharge power rail clamp circuit and an integrated circuit including the same. The power rail clamp circuit includes a first power rail, a second power rail and a first node. The circuit further includes an n-channel field effect transistor having a source and drain located in an isolated p-well in a semiconductor substrate. The drain is connected to the first power rail. The source and isolated p-well are connected to the first node. The circuit also includes a capacitor connected between the first node and the second power rail. The circuit further includes a resistor connected between the first power rail and the first node. The circuit also includes an inverter for controlling the gate of the field effect transistor, wherein the inverter has an input connected to the first node. The circuit further a silicon controlled rectifier connected between the first node and the second power rail.