Abstract: An operating device for a motor vehicle, having a touch-sensitive operating element with a frame element and a central region. The touch-sensitive operating interface has a predetermined operating region at each of at least two predetermined touch positions for activating an operating function assigned to the respective operating region. The operating element is arranged to be displaceable at least partially along a translation axis that intersects the operating interface. The operating device has only one detection element, which is arranged facing an inner side of the touch-sensitive operating element that faces away from the touch-sensitive operating interface, and which is arranged to detect a displacement of each operating region along the translation axis.

Abstract: An operating device for a motor vehicle, having a touch-sensitive operating element with a frame element and a central region. The touch-sensitive operating interface has a predetermined operating region at each of at least two predetermined touch positions for activating an operating function assigned to the respective operating region. The operating element is arranged to be displaceable at least partially along a translation axis that intersects the operating interface. The operating device has only one detection element, which is arranged facing an inner side of the touch-sensitive operating element that faces away from the touch-sensitive operating interface, and which is arranged to detect a displacement of each operating region along the translation axis.

Abstract: The invention relates a torsional vibration damper, comprising the following features: a primary part with two lateral discs (1, 2) which are connected to each other for conjoint rotation; a secondary part with a central disc (3) which is arranged between the lateral discs; a primary part and secondary part are rotationally connected to each other via springs (5); damping chambers which are filled with a damping medium and each have at least one throttle opening; guide elements (7.1) are provided for supporting and guiding the springs. The invention is characterized by the following features: each spring is assigned two guide elements which are both arranged at mutual axial distance and form the supporting surfaces against a movement of the spring in the radial and in the axial direction.

Abstract: A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes a first mirror (S1), a second mirror (S2), a third mirror (S3), a fourth mirror (S4), a fifth mirror (S5), a sixth mirror (S6), a seventh mirror (S7), and an eighth mirror (S8). The light path is provided via the eight mirrors, and in the light path exactly one intermediate image of the object field is provided.

Abstract: A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective includes eight mirrors. The light path is provided via the eight mirrors, and is free of obscuration.

Abstract: There is provided a microlithographic projector lens for EUV-lithography with a wavelegth in a range of 10–30 nm, an incident aperture diaphragm and an emergent aperture diaphragm for the transformation of an object field in an object plane into an image field in an image plane. The invention has a microlithographic projector lens that includes a first, second, third, fourth, fifth, sixth, seventh and eighth mirror, and a beam path from the object plane to the image plane that is free from obscuration.

Abstract: A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective comprises a first mirror (S1), a second mirror (S2), a third mirror (S3), a fourth mirror (S4), a fifth mirror (S5), a sixth mirror (S6), a seventh mirror (S7), and an eighth mirror (S8). The light path is provided via the eight mirrors, the light bundle includes light with a wavelength in the range of 10-30 nm, and the light path is free of shading.

Abstract: There is provided a microlithographic projector lens for EUV-lithography with a wavelegth in a range of 10-30 nm, an incident aperture diaphragm and an emergent aperture diaphragm for the transformation of an object field in an object plane into an image field in an image plane. The invention has a microlithographic projector lens that includes a first, second, third, fourth, fifth, sixth, seventh and eighth mirror, and a beam path from the object plane to the image plane that is free from obscuration.

Abstract: A projection objective provides a light path for a light bundle from an object field in an object plane to an image field in an image plane. The projection objective comprises a first mirror (S1), a second mirror (S2), a third mirror (S3), a fourth mirror (S4), a fifth mirror (S5), a sixth mirror (S6), a seventh mirror (S7), and an eighth mirror (S8). The light path is provided via the eight mirrors, the light bundle includes light with a wavelength in the range of 10-30 nm, and the light path is free of shading.