Patents by Inventor Guy V Holland

Guy V Holland has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180098881
    Abstract: System and method of photoaltering a region of an eye using a high resolution digital image of the eye. The system includes a laser assembly for outputting a pulsed laser beam, an imaging system for capturing a real-time high resolution digital image of the eye and displaying the digital image of the eye, a user interface receiving at least one laser parameter input, and a controller coupled to the laser assembly, imaging system, and user interface. The controller directs the laser assembly to output the pulsed laser beam to the region of the eye based on the laser parameter input.
    Type: Application
    Filed: December 11, 2017
    Publication date: April 12, 2018
    Inventors: Keith Watanabe, Jesse Buck, Guy V. Holland, Michael Brownell, Valentina Doushkina
  • Patent number: 9844463
    Abstract: System and method of photoaltering a region of an eye using a high resolution digital image of the eye. The system includes a laser assembly for outputting a pulsed laser beam, an imaging system for capturing a real-time high resolution digital image of the eye and displaying the digital image of the eye, a user interface receiving at least one laser parameter input, and a controller coupled to the laser assembly, imaging system, and user interface. The controller directs the laser assembly to output the pulsed laser beam to the region of the eye based on the laser parameter input.
    Type: Grant
    Filed: April 1, 2009
    Date of Patent: December 19, 2017
    Assignee: AMO Development, LLC
    Inventors: Keith Watanabe, Jesse Buck, Guy V. Holland, Michael Brownell, Valentina Doushkina
  • Patent number: 9226853
    Abstract: Methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.
    Type: Grant
    Filed: March 17, 2015
    Date of Patent: January 5, 2016
    Assignee: AMO Development, LLC
    Inventors: Zsolt Bor, Ruben Zadoyan, Marcel Bouvier, Guy V Holland
  • Patent number: 9138351
    Abstract: Systems and methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.
    Type: Grant
    Filed: March 17, 2015
    Date of Patent: September 22, 2015
    Assignee: AMO Development, LLC
    Inventors: Ferenc Raksi, Ruben Zadoyan, Marcel Bouvier, Guy V. Holland
  • Patent number: 9108270
    Abstract: System and method of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.
    Type: Grant
    Filed: January 2, 2008
    Date of Patent: August 18, 2015
    Assignee: AMO DEVELOPMENT, LLC
    Inventors: Ferenc Raksi, Ruben Zadoyan, Marcel Bouvier, Guy V. Holland
  • Patent number: 9101446
    Abstract: Systems and methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.
    Type: Grant
    Filed: March 11, 2013
    Date of Patent: August 11, 2015
    Assignee: IntraLase Corp.
    Inventors: Zsolt Bor, Ruben Zadoyan, Marcel Bouvier, Guy V Holland
  • Publication number: 20150190283
    Abstract: Systems and methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.
    Type: Application
    Filed: March 17, 2015
    Publication date: July 9, 2015
    Inventors: Ferenc Raksi, Ruben Zadoyan, Marcel Bouvier, Guy V. Holland
  • Publication number: 20150190282
    Abstract: Methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.
    Type: Application
    Filed: March 17, 2015
    Publication date: July 9, 2015
    Inventors: Zsolt Bor, Ruben Zadoyan, Marcel Bouvier, Guy V Holland
  • Patent number: 8388609
    Abstract: System and method of photoaltering a material. The system includes a laser source operable to produce a primary pulsed beam, a holographic optical element configured to receive the primary pulsed beam and transmit a plurality of secondary beams, and a scanner operable to direct the secondary beams to the material. The secondary beams are based on the primary pulsed beam. The method includes phase shifting a pulsed laser beam to produce an input beam, holographically altering the input beam to produce a plurality of transmission beams, and scanning a portion of the material with the transmission beams.
    Type: Grant
    Filed: December 1, 2008
    Date of Patent: March 5, 2013
    Assignee: AMO Development, LLC.
    Inventors: Zsolt Bor, Guy V Holland
  • Publication number: 20090247997
    Abstract: System and method of photoaltering a region of an eye using a high resolution digital image of the eye. The system includes a laser assembly for outputting a pulsed laser beam, an imaging system for capturing a real-time high resolution digital image of the eye and displaying the digital image of the eye, a user interface receiving at least one laser parameter input, and a controller coupled to the laser assembly, imaging system, and user interface. The controller directs the laser assembly to output the pulsed laser beam to the region of the eye based on the laser parameter input.
    Type: Application
    Filed: April 1, 2009
    Publication date: October 1, 2009
    Applicant: AMO DEVELOPMENT, LLC
    Inventors: Keith Watanabe, Jesse Buck, Guy V. Holland, Michael Brownell, Valentina Doushkina
  • Publication number: 20090171329
    Abstract: System and method of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.
    Type: Application
    Filed: January 2, 2008
    Publication date: July 2, 2009
    Applicant: Advanced Medical Optics, Inc.
    Inventors: Ferenc Raksi, Ruben Zadoyan, Marcel Bouvier, Guy V. Holland
  • Publication number: 20040070761
    Abstract: The present invention generally relates to a method and system for determining the position and alignment of a plane in relation to an intersecting axis and using that known position and alignment to allow for corrections to be made when using the plane as a reference plane. More particularly, the invention relates to a method and system for determining the angle of tilt of a planar surface in relation to a laser beam, and using the determined angle of tilt to calculate a correction factor to be applied to the laser beam. Briefly stated, the method and system ultimately calculates a correction factor, z-offset, that is applied when using the laser beam in a procedure.
    Type: Application
    Filed: October 11, 2002
    Publication date: April 15, 2004
    Applicant: INTRALASE CORP.
    Inventors: Christopher Horvath, Ruben Zadoyan, Ferenc Raksi, Zsolt Bor, Guy V. Holland, Tibor Juhasz