Patents by Inventor Guy V Holland
Guy V Holland has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180098881Abstract: System and method of photoaltering a region of an eye using a high resolution digital image of the eye. The system includes a laser assembly for outputting a pulsed laser beam, an imaging system for capturing a real-time high resolution digital image of the eye and displaying the digital image of the eye, a user interface receiving at least one laser parameter input, and a controller coupled to the laser assembly, imaging system, and user interface. The controller directs the laser assembly to output the pulsed laser beam to the region of the eye based on the laser parameter input.Type: ApplicationFiled: December 11, 2017Publication date: April 12, 2018Inventors: Keith Watanabe, Jesse Buck, Guy V. Holland, Michael Brownell, Valentina Doushkina
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Patent number: 9844463Abstract: System and method of photoaltering a region of an eye using a high resolution digital image of the eye. The system includes a laser assembly for outputting a pulsed laser beam, an imaging system for capturing a real-time high resolution digital image of the eye and displaying the digital image of the eye, a user interface receiving at least one laser parameter input, and a controller coupled to the laser assembly, imaging system, and user interface. The controller directs the laser assembly to output the pulsed laser beam to the region of the eye based on the laser parameter input.Type: GrantFiled: April 1, 2009Date of Patent: December 19, 2017Assignee: AMO Development, LLCInventors: Keith Watanabe, Jesse Buck, Guy V. Holland, Michael Brownell, Valentina Doushkina
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Patent number: 9226853Abstract: Methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.Type: GrantFiled: March 17, 2015Date of Patent: January 5, 2016Assignee: AMO Development, LLCInventors: Zsolt Bor, Ruben Zadoyan, Marcel Bouvier, Guy V Holland
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Patent number: 9138351Abstract: Systems and methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.Type: GrantFiled: March 17, 2015Date of Patent: September 22, 2015Assignee: AMO Development, LLCInventors: Ferenc Raksi, Ruben Zadoyan, Marcel Bouvier, Guy V. Holland
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Patent number: 9108270Abstract: System and method of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.Type: GrantFiled: January 2, 2008Date of Patent: August 18, 2015Assignee: AMO DEVELOPMENT, LLCInventors: Ferenc Raksi, Ruben Zadoyan, Marcel Bouvier, Guy V. Holland
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Patent number: 9101446Abstract: Systems and methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.Type: GrantFiled: March 11, 2013Date of Patent: August 11, 2015Assignee: IntraLase Corp.Inventors: Zsolt Bor, Ruben Zadoyan, Marcel Bouvier, Guy V Holland
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Publication number: 20150190283Abstract: Systems and methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.Type: ApplicationFiled: March 17, 2015Publication date: July 9, 2015Inventors: Ferenc Raksi, Ruben Zadoyan, Marcel Bouvier, Guy V. Holland
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Publication number: 20150190282Abstract: Methods of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.Type: ApplicationFiled: March 17, 2015Publication date: July 9, 2015Inventors: Zsolt Bor, Ruben Zadoyan, Marcel Bouvier, Guy V Holland
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Patent number: 8388609Abstract: System and method of photoaltering a material. The system includes a laser source operable to produce a primary pulsed beam, a holographic optical element configured to receive the primary pulsed beam and transmit a plurality of secondary beams, and a scanner operable to direct the secondary beams to the material. The secondary beams are based on the primary pulsed beam. The method includes phase shifting a pulsed laser beam to produce an input beam, holographically altering the input beam to produce a plurality of transmission beams, and scanning a portion of the material with the transmission beams.Type: GrantFiled: December 1, 2008Date of Patent: March 5, 2013Assignee: AMO Development, LLC.Inventors: Zsolt Bor, Guy V Holland
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Publication number: 20090247997Abstract: System and method of photoaltering a region of an eye using a high resolution digital image of the eye. The system includes a laser assembly for outputting a pulsed laser beam, an imaging system for capturing a real-time high resolution digital image of the eye and displaying the digital image of the eye, a user interface receiving at least one laser parameter input, and a controller coupled to the laser assembly, imaging system, and user interface. The controller directs the laser assembly to output the pulsed laser beam to the region of the eye based on the laser parameter input.Type: ApplicationFiled: April 1, 2009Publication date: October 1, 2009Applicant: AMO DEVELOPMENT, LLCInventors: Keith Watanabe, Jesse Buck, Guy V. Holland, Michael Brownell, Valentina Doushkina
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Publication number: 20090171329Abstract: System and method of photoaltering a region of a material using a pulsed laser beam. The method includes scanning the pulsed laser beam in a first portion of the region with a first pattern, scanning the pulsed laser beam in a second portion of the region with a second pattern, and separating a flap of the material at the region. The system includes a laser, a controller selecting at least first and second patterns, and a scanner operable in response to the controller. The first pattern has a first maximum acceleration associated with the second portion, and the second pattern has a second maximum acceleration associated with the second portion. The second maximum acceleration is less than the first maximum acceleration. The scanner scans the pulsed laser beam from the laser in the first portion with the first pattern and in the second portion with the second pattern.Type: ApplicationFiled: January 2, 2008Publication date: July 2, 2009Applicant: Advanced Medical Optics, Inc.Inventors: Ferenc Raksi, Ruben Zadoyan, Marcel Bouvier, Guy V. Holland
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Publication number: 20040070761Abstract: The present invention generally relates to a method and system for determining the position and alignment of a plane in relation to an intersecting axis and using that known position and alignment to allow for corrections to be made when using the plane as a reference plane. More particularly, the invention relates to a method and system for determining the angle of tilt of a planar surface in relation to a laser beam, and using the determined angle of tilt to calculate a correction factor to be applied to the laser beam. Briefly stated, the method and system ultimately calculates a correction factor, z-offset, that is applied when using the laser beam in a procedure.Type: ApplicationFiled: October 11, 2002Publication date: April 15, 2004Applicant: INTRALASE CORP.Inventors: Christopher Horvath, Ruben Zadoyan, Ferenc Raksi, Zsolt Bor, Guy V. Holland, Tibor Juhasz