Abstract: A system and method for extracting the parasitic contact/via capacitance in an integrated circuit are provided. Parasitic extraction using this system can lead to an improved accuracy on contact/via parasitic capacitance extraction by taking into account of the actual contact/via shape and size variation. The common feature of the various embodiments includes the step of generating a technology file, in which the contact/via capacitance in the capacitance table is derived from an effective contact/via width table. Each element of the effective contact/via width table is calibrated to have a parasitic capacitance matching to that of an actual contact/via configuration occurring in an IC.

Abstract: A method involves providing a circuit pattern, generating a density report for the circuit pattern that identifies a feasible area for dummy insertion, simulating a planarization process with the density report and identifying a hot spot on the circuit pattern, inserting a virtual dummy pattern in the feasible area and adjusting the density report accordingly, and thereafter simulating the planarization process with the adjusted density until the hot spot is eliminated.

Abstract: A method for converting a circuit design into a semiconductor device includes the following steps. A first set of deign information is provided for representing the circuit design. Priority design information, which represents a priority portion of the circuit design, is extracted from the first set of design information. The priority design information is processed for generating a second set of design information. The semiconductor device is fabricated based on the first and second sets of design information. The second set of design information contains enhanced fabrication conditions as opposed to those of the first set of design information for optimizing the conversion of the circuit design into the semiconductor device.

Abstract: A method and system for verifying an integrated circuit design are provided. The method includes identifying cell tags embedded in a proposed integrated circuit design file, comparing cells identified as having a tag embedded therein to a cell library containing verified cell data to determine differences between the identified tagged cells and corresponding verified cell data from the cell library, and revising the proposed integrated circuit design to correct differences between the proposed integrated circuit design file and the verified cell data.

Abstract: A method for forming masks for manufacturing a circuit includes providing a design of the circuit, wherein the circuit comprises a device; performing a first logic operation to determine a first region for forming a first feature of the device; and performing a second logic operation to expand the first feature to a second region greater than the first region. The pattern of the second region may be used to form the masks.

Abstract: This invention discloses a method for automatically generating an integrated circuit (IC) layout, the method comprises determining a first cell height, creating a plurality of standard cells all having the first cell height, and generating the IC layout from the plurality of standard cells by placing and routing thereof.

Abstract: A method and system for extracting the parasitic capacitance in an IC and generating a technology file for at least one or more IC design tools are provided. Parasitic extraction using the preferred method can significantly reduce field solver computational intensity and save technology file preparation cycle time. The network-based technology file generation system enables circuit designers to obtain a desired technology file in a timely manner. The common feature of the various embodiments includes identifying common conductive feature patterns for a given technology generation. Capacitance models created from the identified patterns are used to assemble the required technology files for IC design projects using different technology node and different process flows.

Abstract: A system and method for extracting the parasitic contact/via capacitance in an integrated circuit are provided. Parasitic extraction using this system can lead to an improved accuracy on contact/via parasitic capacitance extraction by taking into account of the actual contact/via shape and size variation. The common feature of the various embodiments includes the step of generating a technology file, in which the contact/via capacitance in the capacitance table is derived from an effective contact/via width table. Each element of the effective contact/via width table is calibrated to have a parasitic capacitance matching to that of an actual contact/via configuration occurring in an IC.

Abstract: A method for defining a layout of 3-D devices, such as a finFET, is provided. The method includes determining an area required by a desired 3-D device and designing a circuit using planar devices having an equivalent area. The planar device corresponding to the desired 3-D device is used to layout a circuit design, thereby allowing circuit and layout designers to work at a higher level without the need to specify each individual fin or 3-D structure. Thereafter, the planar design may be converted to a 3-D design by replacing planar active areas with 3-D devices occupying an equivalent area.

Abstract: A method and system for verifying an integrated circuit design are provided. The method includes identifying cell tags embedded in a proposed integrated circuit design file, comparing cells identified as having a tag embedded therein to a cell library containing verified cell data to determine differences between the identified tagged cells and corresponding verified cell data from the cell library, and revising the proposed integrated circuit design to correct differences between the proposed integrated circuit design file and the verified cell data.

Abstract: An automated system and method for sanity checking an integrated circuit cell layout. The method generally includes searching the cell layout for a sub-area containing a predefined identifier, determining a reference cell layout corresponding to the predefined identifier, verifying the cell layout by comparing the cell layout to the reference cell layout to determine if a cell is of concern, and reporting the cell of concern to a user.

Abstract: A method involves providing a circuit pattern, generating a density report for the circuit pattern that identifies a feasible area for dummy insertion, simulating a planarization process with the density report and identifying a hot spot on the circuit pattern, inserting a virtual dummy pattern in the feasible area and adjusting the density report accordingly, and thereafter simulating the planarization process with the adjusted density until the hot spot is eliminated.

Abstract: An encryption and decryption interface for integrated circuit (IC) design with design-for-manufacturing (DFM). The interface includes a decryption module embedded in an IC design tool; an encrypted DFM data provided to an IC designer authorized for utilizing the encrypted DFM data; and a private key provided to the IC designer for decrypting the encrypted DFM data in the IC design tool.

Abstract: An integrated circuit (IC) design method includes providing IC design layout data; simulating a chemical mechanical polishing (CMP) process to a material layer based on the IC design layout, to generate various geometrical parameters; extracting resistance and capacitance based on the various geometrical parameters from the simulating of the CMP process; and performing circuit timing analysis based on the extracted resistance and capacitance.