Abstract: An apparatus for purifying waste gases for an integrated semiconductor is provided, which includes a cover including a burner mounted thereon to generate a flame and a plurality of waste gas inlet pipes formed on a circumference of the burner to make waste gases flow therethrough; a reactor including upper and lower openings formed thereon so that the cover is detachably coupled to the upper opening, a converging member tapered to have a smaller diameter as going toward a lower portion thereof, and a transport pipe vertically arranged to communicate with an apex of the converging member, in which a water curtain is formed to prevent accumulation of by-products, to burn and discharge the inflow waste gases; and a cleaning portion integrally formed in the reactor to water-clean the burnt waste gases that are discharged into the reactor after passing through the transport pipe to collect particles. Since the burner, the reactor, and the scrubber are integrally formed in a body.

Abstract: An apparatus for purifying waste gases for an integrated semiconductor is provided, which includes a cover including a burner mounted thereon to generate a flame and a plurality of waste gas inlet pipes formed on a circumference of the burner to make waste gases flow therethrough; a reactor including upper and lower openings formed thereon so that the cover is detachably coupled to the upper opening, a converging member tapered to have a smaller diameter as going toward a lower portion thereof, and a transport pipe vertically arranged to communicate with an apex of the converging member, in which a water curtain is formed to prevent accumulation of by-products, to burn and discharge the inflow waste gases; and a cleaning portion integrally formed in the reactor to water-clean the burnt waste gases that are discharged into the reactor after passing through the transport pipe to collect particles. Since the burner, the reactor, and the scrubber are integrally formed in a body.