Patents by Inventor H.C. Starck, Inc.

H.C. Starck, Inc. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140102880
    Abstract: The invention relates to sputter targets and methods for depositing a layer from a sputter target. The method preferably includes the steps of: placing a sputter target in a vacuum chamber; placing a substrate having a substrate surface in the vacuum chamber; reducing the pressure in the vacuum chamber to about 100 Torr or less; removing atoms from the surface of the sputter target while the sputter target is in the vacuum chamber (e.g., using a magnetic field and/or an electric field). The deposited layer preferably is a molybdenum containing alloy including about 50 atomic percent or more molybdenum, 0.5 to 45 atomic percent of a second metal element selected from the group consisting of niobium and vanadium; and 0.5 to 45 atomic percent of a third metal element selected from the group consisting of tantalum, chromium, vanadium, niobium, and titanium.
    Type: Application
    Filed: April 4, 2013
    Publication date: April 17, 2014
    Applicant: H.C. STARCK, INC.
    Inventor: H.C. STARCK, INC.
  • Publication number: 20130224422
    Abstract: The invention relates to sputter targets and methods for depositing a layer from a sputter target. The method preferably includes the steps of: placing a sputter target in a vacuum chamber; placing a substrate having a substrate surface in the vacuum chamber; reducing the pressure in the vacuum chamber to about 100 Torr or less; removing atoms from the surface of the sputter target white the sputter target is in the vacuum chamber (e.g., using a magnetic field and/or an electric field). The deposited layer preferably includes a molybdenum containing alloy including about 50 atomic percent or more molybdenum, 0.1 to 45 atomic percent titanium; and 0.1 to 40 atomic percent of a third metal element that is tantalum or chromium.
    Type: Application
    Filed: April 5, 2013
    Publication date: August 29, 2013
    Inventor: H.C. STARCK, INC.
  • Publication number: 20130082033
    Abstract: In various embodiments, joined sputtering targets are formed at least in part by spray deposition of the sputtering material and/or welding.
    Type: Application
    Filed: September 27, 2012
    Publication date: April 4, 2013
    Applicant: H.C. STARCK, INC.
    Inventor: H.C. Starck, Inc.
  • Publication number: 20130081748
    Abstract: In various embodiments, joined sputtering targets are formed at least in part by spray deposition of the sputtering material and/or welding.
    Type: Application
    Filed: September 27, 2012
    Publication date: April 4, 2013
    Applicant: H.C. Starck, Inc.
    Inventor: H.C. Starck, Inc.
  • Publication number: 20130081749
    Abstract: In various embodiments, joined sputtering targets are formed at least in part by spray deposition of the sputtering material and/or welding.
    Type: Application
    Filed: September 27, 2012
    Publication date: April 4, 2013
    Applicant: H.C. STARCK, INC.
    Inventor: H. C. Starck, Inc.
  • Publication number: 20130081943
    Abstract: In various embodiments, joined sputtering targets are formed at least in part by spray deposition of the sputtering material and/or welding.
    Type: Application
    Filed: September 27, 2012
    Publication date: April 4, 2013
    Applicant: H.C. Starck, Inc.
    Inventor: H.C. Starck, Inc.
  • Publication number: 20130081944
    Abstract: In various embodiments, joined sputtering targets are formed at least in part by spray deposition of the sputtering material and/or welding.
    Type: Application
    Filed: September 27, 2012
    Publication date: April 4, 2013
    Applicant: H.C. STARCK, INC.
    Inventor: H.C. Starck, Inc.