Patents by Inventor Hadar Shalmoni

Hadar Shalmoni has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Symmetric target design in scatterometry overlay metrology
    Patent number: 10591406
    Abstract: Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.
    Type: Grant
    Filed: April 6, 2016
    Date of Patent: March 17, 2020
    Assignee: KLA-Tencor Corporation
    Inventors: Barak Bringoltz, Daniel Kandel, Yoel Feler, Noam Sapiens, Paykin Irina, Alexander Svizher, Meir Aloni, Guy Ben Dov, Hadar Shalmoni, Vladimir Levinski
  • Symmetric target design in scatterometry overlay metrology
    Patent number: 9739702
    Abstract: Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.
    Type: Grant
    Filed: January 22, 2014
    Date of Patent: August 22, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Barak Bringoltz, Daniel Kandel, Yoel Feler, Noam Sapiens, Irina Paykin, Alexander Svizher, Meir Aloni, Guy Ben Dov, Hadar Shalmoni, Vladimir Levinski
  • Phase characterization of targets
    Patent number: 9581430
    Abstract: Systems and methods are provided which derive target characteristics from interferometry images taken at multiple phase differences between target beams and reference beams yielding the interferometry images. The illumination of the target and the reference has a coherence length of less than 30 microns to enable scanning the phase through the coherence length of the illumination. The interferometry images are taken at the pupil plane and/or in the field plane to combine angular and spectroscopic scatterometry data that characterize and correct target topography and enhance the performance of metrology systems.
    Type: Grant
    Filed: October 18, 2013
    Date of Patent: February 28, 2017
    Assignee: KLA-Tencor Corporation
    Inventors: Amnon Manassen, Ohad Bachar, Daria Negri, Boris Golovanevsky, Barak Bringoltz, Daniel Kandel, Yoel Feler, Noam Sapiens, Paykin Irina, Alexander Svizher, Meir Aloni, Guy Ben Dov, Hadar Shalmoni, Vladimir Levinski
  • SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY
    Publication number: 20160216197
    Abstract: Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.
    Type: Application
    Filed: April 6, 2016
    Publication date: July 28, 2016
    Inventors: Barak Bringoltz, Daniel Kandel, Yoel Feler, Noam Sapiens, Paykin Irina, Alexander Svizher, Meir Aloni, Guy Ben Dov, Hadar Shalmoni, Vladimir Levinski
  • SYMMETRIC TARGET DESIGN IN SCATTEROMETRY OVERLAY METROLOGY
    Publication number: 20150204664
    Abstract: Metrology methods, systems and targets are provided, which implement a side by side paradigm. Adjacent cells with periodic structures are used to extract the overlay error, e.g., by introducing controllable phase shifts or image shifts which enable algorithmic computation of the overlay. The periodic structures are designed to exhibit a rotational symmetry to support the computation and reduce errors.
    Type: Application
    Filed: January 22, 2014
    Publication date: July 23, 2015
    Applicant: KLA-Tencor Corporation
    Inventors: Barak Bringoltz, Daniel Kandel, Yoel Feler, Noam Sapiens, Irina Paykin, Alexander Svizher, Meir Aloni, Guy BEN DOV, Hadar Shalmoni, Vladimir Levinski
  • PHASE CHARACTERIZATION OF TARGETS
    Publication number: 20140111791
    Abstract: Systems and methods are provided which derive target characteristics from interferometry images taken at multiple phase differences between target beams and reference beams yielding the interferometry images. The illumination of the target and the reference has a coherence length of less than 30 microns to enable scanning the phase through the coherence length of the illumination. The interferometry images are taken at the pupil plane and/or in the field plane to combine angular and spectroscopic scatterometry data that characterize and correct target topography and enhance the performance of metrology systems.
    Type: Application
    Filed: October 18, 2013
    Publication date: April 24, 2014
    Inventors: Amnon Manassen, Ohad Bachar, Daria Negri, Boris Golovanevsky, Barak Bringoltz, Daniel Kandel, Yoel Feler, Noam Sapiens, Paykin Irina, Alexander Svizher, Meir Aloni, Guy Ben Dov, Hadar Shalmoni, Vladimir Levinski