Patents by Inventor Hai Woo Lee

Hai Woo Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9711371
    Abstract: An organic film can be etched while suppressing damage on an underlying layer. A method of etching the organic film includes etching the organic film within a processing vessel of a plasma processing apparatus which accommodates a processing target object. A processing gas containing a hydrogen gas and a nitrogen gas is supplied into the processing vessel, and plasma of the processing gas is generated. Further, a flow rate ratio of the hydrogen gas to a flow rate of the processing gas is set to be in a range from 35% to 75%, and a high frequency bias power for ion attraction to the processing target object is set to be in a range from 50 W to 135 W, in the etching of the organic film.
    Type: Grant
    Filed: October 29, 2015
    Date of Patent: July 18, 2017
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Akinori Kitamura, Kosuke Kariu, Toshihisa Ozu, Hai Woo Lee
  • Publication number: 20160126071
    Abstract: An organic film can be etched while suppressing damage on an underlying layer. A method of etching the organic film includes etching the organic film within a processing vessel of a plasma processing apparatus which accommodates a processing target object. A processing gas containing a hydrogen gas and a nitrogen gas is supplied into the processing vessel, and plasma of the processing gas is generated. Further, a flow rate ratio of the hydrogen gas to a flow rate of the processing gas is set to be in a range from 35% to 75%, and a high frequency bias power for ion attraction to the processing target object is set to be in a range from 50 W to 135 W, in the etching of the organic film.
    Type: Application
    Filed: October 29, 2015
    Publication date: May 5, 2016
    Inventors: Akinori Kitamura, Kosuke Kariu, Toshihisa Ozu, Hai Woo Lee