Patents by Inventor Haiqiang Jia

Haiqiang Jia has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20170012076
    Abstract: The present application relates to a photodetector based on interband transition in quantum wells. The photodetector may include a first semiconductor layer having a first conduction type; a second semiconductor layer having a second conduction type different from the first conduction type; and a photon absorption layer arranged between the first semiconductor layer and the second semiconductor layer, the photon absorption layer including at least one quantum well layer and barrier layers arranged on both sides of each quantum well layer. The present application utilizes the modulating effect of a semiconductor PN junction on a photoelectric conversion process associated with quantum wells to significantly increase a current output of the photodetector based on the quantum well material.
    Type: Application
    Filed: March 2, 2016
    Publication date: January 12, 2017
    Inventors: Hong Chen, Lu Wang, Haiqiang Jia, Ziguang Ma, Yang Jiang, Wenxin Wang
  • Patent number: 8043872
    Abstract: A method of manufacturing epitaxial material used for GaN based LED with low polarization effect, which includes steps of growing n-type InGaAlN layer composed of GaN buffer layer (2) and n-type GaN layer (3), low polarizing active layer composed of InGaAlN multi-quantum well structure polarized regulating and controlling layer (4) and InGaAlN multi-quantum well structure light emitting layer (5) and p-type InGaAlN layer (6) on sapphire or SiC substrate (1) in turn. The method adds InGaAlN multi-quantum well structure polarized regulating and controlling layer, thus reduces polarization effect of quantum well active region.
    Type: Grant
    Filed: August 15, 2007
    Date of Patent: October 25, 2011
    Assignee: Institute of Physics, Chinese Academy of Sciences
    Inventors: Hong Chen, Haiqiang Jia, Liwei Guo, Wenxin Wang, Junming Zhou
  • Publication number: 20090236586
    Abstract: A method of manufacturing epitaxial material used for GaN based LED with low polarization effect, which includes steps of growing n-type InGaAlN layer composed of GaN buffer layer (2) and n-type GaN layer (3), low polarizing active layer composed of InGaAlN multi-quantum well structure polarized regulating and controlling layer (4) and InGaAlN multi-quantum well structure light emitting layer (5) and p-type InGaAlN layer (6) on sapphire or SiC substrate (1) in turn. The method adds InGaAlN multi-quantum well structure polarized regulating and controlling layer, thus reduces polarization effect of quantum well active region.
    Type: Application
    Filed: August 15, 2007
    Publication date: September 24, 2009
    Applicant: Institute of Physics, Chinese Academy of Science
    Inventors: Hong Chen, Haiqiang Jia, Liwei Guo, Wenxin Wang, Junming Zhou