Patents by Inventor Hajime Ishizaka
Hajime Ishizaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7521574Abstract: Organohalosilanes are prepared by charging a reactor with a contact mass comprising metallic silicon and a catalyst and feeding an organohalide-containing gas to the reactor. The contact mass is prepared by premixing metallic silicon and a tin compound and heat treating the premix at 300-600° C. in an inert gas atmosphere.Type: GrantFiled: October 18, 2005Date of Patent: April 21, 2009Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Mikio Aramata, Hajime Ishizaka, Tetsuya Inukai, Kenji Saito
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Patent number: 7420075Abstract: Organohalosilanes are prepared by charging a reactor with a contact mass of metallic silicon and a catalyst and feeding an organohalide-containing gas to the reactor. Tin or a tin compound is used as the catalyst. Then organohalosilanes can be produced quite efficiently at a high reaction rate while maintaining a low T/D ratio and minimizing the deposition of by-products and carbon.Type: GrantFiled: August 16, 2004Date of Patent: September 2, 2008Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Mikio Aramata, Hajime Ishizaka, Tetsuya Inukai
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Patent number: 7279590Abstract: Organohalosilanes are prepared by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst. A contact mass composed of metallic silicon and copper catalyst contains an effective amount of a catalyst powder obtained by mechanical surface treatment of a powder mixture of tin powder and another metal, typically copper powder, on a ball mill, stamp mill, jet mill, mechanofusion device or the like.Type: GrantFiled: March 17, 2005Date of Patent: October 9, 2007Assignee: Shin-Estu Chemical Co., Ltd.Inventors: Tetsuya Inukai, Hajime Ishizaka, Mikio Aramata, Yukinori Satou
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Patent number: 7179933Abstract: Organohalosilanes are prepared by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst. A contact mass composed of the metallic silicon and the copper catalyst contains an effective amount of a catalyst alloy containing 0.2–8 wt % of tin and 4–20 wt % of phosphorus which is powdered by atomization.Type: GrantFiled: March 17, 2005Date of Patent: February 20, 2007Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tetsuya Inukai, Hajime Ishizaka, Mikio Aramata, Yukinori Satou
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Publication number: 20060084821Abstract: Organohalosilanes are prepared by charging a reactor with a contact mass comprising metallic silicon and a catalyst and feeding an organohalide-containing gas to the reactor. The contact mass is prepared by premixing metallic silicon and a tin compound and heat treating the premix at 300-600° C. in an inert gas atmosphere.Type: ApplicationFiled: October 18, 2005Publication date: April 20, 2006Inventors: Mikio Aramata, Hajime Ishizaka, Tetsuya Inukai, Kenji Saito
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Publication number: 20050209475Abstract: Organohalosilanes are prepared by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst. A contact mass composed of the metallic silicon and the copper catalyst contains an effective amount of a catalyst alloy containing 0.2-8 wt % of tin and 4-20 wt % of phosphorus which is powdered by atomization.Type: ApplicationFiled: March 17, 2005Publication date: September 22, 2005Inventors: Tetsuya Inukai, Hajime Ishizaka, Mikio Aramata, Yukinori Satou
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Publication number: 20050209474Abstract: Organohalosilanes are prepared by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst. A contact mass composed of metallic silicon and copper catalyst contains an effective amount of a catalyst powder obtained by mechanical surface treatment of a powder mixture of tin powder and another metal, typically copper powder, on a ball mill, stamp mill, jet mill, mechanofusion device or the like.Type: ApplicationFiled: March 17, 2005Publication date: September 22, 2005Inventors: Tetsuya Inukai, Hajime Ishizaka, Mikio Aramata, Yukinori Satou
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Patent number: 6894181Abstract: In an industrial process for preparing organohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains an effective amount of a phosphine chalcogenide compound. The invention drastically increases the silane formation rate and the utilization of silicon without lowering the selectivity of useful silane.Type: GrantFiled: April 23, 2003Date of Patent: May 17, 2005Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Tetsuya Inukai, Hajime Ishizaka
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Publication number: 20050043557Abstract: Organohalosilanes are prepared by charging a reactor with a contact mass of metallic silicon and a catalyst and feeding an organohalide-containing gas to the reactor. Tin or a tin compound is used as the catalyst. Then organohalosilanes can be produced quite efficiently at a high reaction rate while maintaining a low T/D ratio and minimizing the deposition of by-products and carbon.Type: ApplicationFiled: August 16, 2004Publication date: February 24, 2005Inventors: Mikio Aramata, Hajime Ishizaka, Tetsuya Inukai
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Patent number: 6768018Abstract: When oganohalosilanes are prepared by charging a reactor with a contact mass containing metallic silicon and a copper catalyst, and introducing an organohalide-containing gas feed into the reactor, the partial pressure of organohalide gas in the gas feed is manipulated so as to keep the temperature within the reactor substantially constant. The precise control of reactor internal temperature ensures that organohalosilanes with a higher useful silane content are produced in a safe and inexpensive manner and in high yields from the contact mass having perpetually changing reactivity.Type: GrantFiled: November 20, 2003Date of Patent: July 27, 2004Assignee: Shin Etsu Chemical Co., Ltd.Inventors: Masaaki Furuya, Hajime Ishizaka, Mikio Aramata
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Publication number: 20040102641Abstract: When oganohalosilanes are prepared by charging a reactor with a contact mass containing metallic silicon and a copper catalyst, and introducing an organohalide-containing gas feed into the reactor, the partial pressure of organohalide gas in the gas feed is manipulated so as to keep the temperature within the reactor substantially constant. The precise control of reactor internal temperature ensures that organohalosilanes with a higher useful silane content are produced in a safe and inexpensive manner and in high yields from the contact mass having perpetually changing reactivity.Type: ApplicationFiled: November 20, 2003Publication date: May 27, 2004Inventors: Masaaki Furuya, Hajime Ishizaka, Mikio Aramata
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Patent number: 6727376Abstract: In an industrial process for preparing organohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains an effective amount of a phosphonium compound having on the molecule at least one group of the formula: [R2R3R4P—]+Y− wherein R2, R3 and R4 each are a monovalent hydrocarbon group and Y is a halogen atom or acid group. The invention drastically increases the silane formation rate and the utilization of silicon without lowering the selectivity of useful silane.Type: GrantFiled: August 29, 2002Date of Patent: April 27, 2004Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Tetsuya Inukai, Hajime Ishizaka
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Publication number: 20030199705Abstract: In an industrial process for preparing organohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains an effective amount of a phosphine chalcogenide compound. The invention drastically increases the silane formation rate and the utilization of silicon without lowering the selectivity of useful silane.Type: ApplicationFiled: April 23, 2003Publication date: October 23, 2003Inventors: Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Tetsuya Inukai, Hajime Ishizaka
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Publication number: 20030055277Abstract: In an industrial process for preparing organohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains an effective amount of a phosphonium compound having on the molecule at least one group of the formula: [R2R3R4P—]+Y− wherein R2, R3 and R4 each are a monovalent hydrocarbon group and Y is a halogen atom or acid group. The invention drastically increases the silane formation rate and the utilization of silicon without lowering the selectivity of useful silane.Type: ApplicationFiled: August 29, 2002Publication date: March 20, 2003Inventors: Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Tetsuya Inukai, Hajime Ishizaka
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Patent number: 6506923Abstract: In a process for preparing oganohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains a minute, but effective amount of a catalytic metal powder which has been produced by an atomizing technique. The process is successful in drastically increasing a formation rate without lowering the selectivity of useful silane.Type: GrantFiled: February 14, 2002Date of Patent: January 14, 2003Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Tetsuya Inukai, Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Hajime Ishizaka
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Patent number: 6495006Abstract: The present invention has an object of providing a bipolar type ion exchange electrolytic cell which is capable of minimizing the anode-cathode distance by a movable system which has a low electric resistance and which is simple and inexpensive, thereby to substantially reduce the electrolysis voltage.Type: GrantFiled: August 25, 2000Date of Patent: December 17, 2002Assignee: Asahi Glass Company, LimitedInventors: Tatsuhito Kimura, Hajime Ishizaka, Kiyoshi Hachiya
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Publication number: 20020156310Abstract: In a process for preparing oganohalosilanes by reacting metallic silicon particles with an organohalide in the presence of a copper catalyst, a contact mass composed of the metallic silicon and the catalyst further contains a minute, but effective amount of a catalytic metal powder which has been produced by an atomizing technique. The process is successful in drastically increasing a formation rate without lowering the selectivity of useful silane.Type: ApplicationFiled: February 14, 2002Publication date: October 24, 2002Inventors: Tetsuya Inukai, Susumu Ueno, Toshio Shinohara, Mikio Aramata, Yoichi Tanifuji, Hajime Ishizaka
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Publication number: 20020082437Abstract: When oganohalosilanes are prepared by charging a reactor with a contact mass containing a metallic silicon powder, a copper catalyst and a co-catalyst, and introducing an organohalide-containing gas into the reactor to effect the direct reaction, the catalyst and/or co-catalyst used in the contact mass is obtained by mixing particles of the catalyst and/or co-catalyst with finely divided silica, and applying shear forces to the mixture for mutually rubbing the particles, thereby producing the catalyst and/or co-catalyst having finely divided silica fused to surfaces thereof. The invention is successful in producing organohalosilanes at a significantly improved formation rate without reducing the proportion of diorganodihalosilane.Type: ApplicationFiled: October 19, 2001Publication date: June 27, 2002Inventors: Hajime Ishizaka, Susumu Ueno, Toshio Shinohara, Yoichi Tanifuji, Tetsuya Inukai, Mikio Aramata
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Patent number: 6395917Abstract: When oganohalosilanes are prepared by charging a reactor with a contact mass containing a metallic silicon powder, a copper catalyst and a co-catalyst, and introducing an organohalide-containing gas into the reactor to effect the direct reaction, the catalyst and/or co-catalyst used in the contact mass is obtained by mixing particles of the catalyst and/or co-catalyst with finely divided silica, and applying shear forces to the mixture for mutually rubbing the particles, thereby producing the catalyst and/or co-catalyst having finely divided silica fused to surfaces thereof. The invention is successful in producing organohalosilanes at a significantly improved formation rate without reducing the proportion of diorganodihalosilane.Type: GrantFiled: October 19, 2001Date of Patent: May 28, 2002Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hajime Ishizaka, Susumu Ueno, Toshio Shinohara, Yoichi Tanifuji, Tetsuya Inukai, Mikio Aramata
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Patent number: 6288258Abstract: When oganohalosilanes are prepared by charging a reactor with a contact mass containing metallic silicon and a copper catalyst and introducing an organohalide-containing gas into the reactor to effect the direct reaction, 50-10,000 ppm of bronze phosphide is added to the contact mass. The invention is successful in efficiently producing organohalosilanes in a high STY and low T/D.Type: GrantFiled: October 24, 2000Date of Patent: September 11, 2001Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Mikio Aramata, Tatsuya Fujimoto, Ryuichi Saito, Masahiro Yuyama, Tetsuya Inukai, Hajime Ishizaka