Patents by Inventor Hajime Kiyokawa

Hajime Kiyokawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10797388
    Abstract: A vehicle-mounted antenna device includes an antenna, an electronic component, a coaxial cable and a shielding member. The electronic component is electrically isolated from the antenna. The electronic component has a coaxial connector including an inner terminal and an outer terminal. The coaxial cable has one end connected to the coaxial connector. The shielding member is grounded to a vehicle body being ground. The shielding member is configured to block at least part of noise generated from the electronic component from reaching the antenna. The coaxial cable includes an inner conductor connected to the inner terminal and an outer conductor connected to the outer terminal. The electronic component is electrically connected to the shielding member via only the outer terminal.
    Type: Grant
    Filed: October 10, 2017
    Date of Patent: October 6, 2020
    Assignee: HARADA INDUSTRY CO., LTD.
    Inventor: Hajime Kiyokawa
  • Publication number: 20190237866
    Abstract: A vehicle-mounted antenna device includes an antenna, an electronic component, a coaxial cable and a shielding member. The electronic component is electrically isolated from the antenna. The electronic component has a coaxial connector including an inner terminal and an outer terminal. The coaxial cable has one end connected to the coaxial connector. The shielding member is grounded to a vehicle body being ground. The shielding member is configured to block at least part of noise generated from the electronic component from reaching the antenna. The coaxial cable includes an inner conductor connected to the inner terminal and an outer conductor connected to the outer terminal. The electronic component is electrically connected to the shielding member via only the outer terminal.
    Type: Application
    Filed: October 10, 2017
    Publication date: August 1, 2019
    Inventor: Hajime KIYOKAWA
  • Patent number: 10030313
    Abstract: Provided are a plating apparatus and a container bath, which have a simpler structure than a conventional system and are capable of improving uniformity of a plating thickness. The plating apparatus includes a plating tank which stores a plating liquid, an anode member arranged inside the plating tank, a plating object arranged inside the plating tank to face the anode member, a cathode jig which contacts with the plating object, and a space formed between the anode member and the plating object to be a flow passage to which the plating liquid flows from the plating tank. The plating liquid flows into the space from above relative to the space, and is sucked by a pump from below relative to the space.
    Type: Grant
    Filed: April 16, 2015
    Date of Patent: July 24, 2018
    Assignees: YAMAMOTO-MS., Co. Ltd., KIYOKAWA Plating Industry Co., Ltd.
    Inventors: Wataru Yamamoto, Fumio Harada, Hajime Kiyokawa
  • Patent number: 9756736
    Abstract: A process for efficiently producing a wiring board in which an insulating substrate 1 having a through hole 2 is used, which includes forming a seed layer 3 on one surface of the insulating substrate 1, covering the surface of the insulating substrate 1 on which the seed layer 3 is formed with a masking film 4, arranging the insulating substrate 1 and a positive electrode 5 so that the surface of the insulating substrate 1 opposite to the surface of the insulating substrate 1 on which the seed layer 3 of the insulating substrate 1 is formed is faced to the positive electrode 5, carrying out electroplating to form a metal layer 8 in the through hole 2, and then removing the masking film 4.
    Type: Grant
    Filed: December 3, 2015
    Date of Patent: September 5, 2017
    Assignee: KIYOKAWA PLATING INDUSTRY CO., LTD
    Inventors: Shojiro Honda, Yosuke Haruki, Hajime Kiyokawa
  • Publication number: 20160353584
    Abstract: A process for efficiently producing a wiring board in which an insulating substrate 1 having a through hole 2 is used, which includes forming a seed layer 3 on one surface of the insulating substrate 1, covering the surface of the insulating substrate 1 on which the seed layer 3 is formed with a masking film 4, arranging the insulating substrate 1 and a positive electrode 5 so that the surface of the insulating substrate 1 opposite to the surface of the insulating substrate 1 on which the seed layer 3 of the insulating substrate 1 is formed is faced to the positive electrode 5, carrying out electroplating to form a metal layer 8 in the through hole 2, and then removing the masking film 4.
    Type: Application
    Filed: December 3, 2015
    Publication date: December 1, 2016
    Applicant: KIYOKAWA PLATING INDUSTRY CO., LTD.
    Inventors: Shojiro Honda, Yosuke Haruki, Hajime Kiyokawa
  • Publication number: 20160305032
    Abstract: Provided are a plating apparatus and a container bath, which have a simpler structure than a conventional system and are capable of improving uniformity of a plating thickness. The plating apparatus includes a plating tank which stores a plating liquid, a cathode member arranged inside the plating tank, a plating object arranged inside the plating tank to face the cathode member, an anode jig which contacts with the plating object, and a space formed between the cathode member and the plating object to be a flow passage to which the plating liquid flows from the plating tank. The plating liquid flows into the space from above relative to the space, and is sucked by a pump from below relative to the space.
    Type: Application
    Filed: April 16, 2015
    Publication date: October 20, 2016
    Applicants: Yamamoto-MS., Co. LTD., Kiyokawa Plating Industry Co., Ltd.
    Inventors: Wataru YAMAMOTO, Fumio HARADA, Hajime KIYOKAWA
  • Patent number: 7338686
    Abstract: The present invention provides a low-cost method for producing conductive particles in a short period of time by simplifying pretreatment in electroless plating. The method for producing conductive particles includes the steps of: introducing a solution composed mainly of palladium chloride and hydrochloric acid into an electroless plating bath containing particles of an organic material or an inorganic material while stirring the bath; and simultaneously applying an electroless plating to the surface of the particles and allowing the palladium catalyst to be carried on the surface of the particles to give conductive particles having an electroless plate coating.
    Type: Grant
    Filed: April 13, 2004
    Date of Patent: March 4, 2008
    Assignee: Kiyokawa Plating Industry Co., Ltd.
    Inventors: Hajime Kiyokawa, Kiyoto Fukuoka
  • Publication number: 20060141336
    Abstract: An electrode having a thermoplastic resin having gas permiability and a metal (3b) supported in a three-dimensional matrix form; an electrolyte composite having an electrolyte membrane (1) and a pair of electrodes (3), the electrodes (3) comprising a porous thermoplastic resin having gas permiability and a metal (3b) supported in a three-dimensional matrix form; a method of manufacturing an electrode (3) comprising plating a metal coating on surfaces of numerous particles (3a) of a thermoplastic resin, and pressurizing the particles; and a method of manufacturing an electrolyte composite having an electrolyte membrane (1), and a pair of electrodes (3), comprising manufacturing the electrodes (3) by plating a metal coating on surfaces of numerous particles (3a) of a thermoplastic resin and pressurizing the particles, and joining the electrolyte membrane (1) through the catalyst to one surface of each electrode and joining the electrolyte membranes, or joining the electrodes (3) through the catalysts (2) to opp
    Type: Application
    Filed: October 21, 2003
    Publication date: June 29, 2006
    Inventors: Masayuki Takashima, Susumu Yonezawa, Yuichi Matsumura, Hajime Kiyokawa, Mamoru Shimakawa, Toshihide Tsukatani, Koji Fujita
  • Publication number: 20040208992
    Abstract: The present invention provides a low-cost method for producing conductive particles in a short period of time by simplifying pretreatment in electroless plating. The method for producing conductive particles includes the steps of: introducing a solution composed mainly of palladium chloride and hydrochloric acid into an electroless plating bath containing particles of an organic material or an inorganic material while stirring the bath; and simultaneously applying an electroless plating to the surface of the particles and allowing the palladium catalyst to be carried on the surface of the particles to give conductive particles having an electroless plate coating.
    Type: Application
    Filed: April 13, 2004
    Publication date: October 21, 2004
    Applicant: KIYOKAWA PLATING INDUSTRY CO., LTD.
    Inventors: Hajime Kiyokawa, Kiyoto Fukuoka
  • Publication number: 20020164096
    Abstract: A problem of the invention resides in that in a hydrodynamic bearing apparatus for rotatably supporting a rotor by a hydrodynamic bearing, wear of the apparatus caused by sliding contact of dynamic pressure bearing faces in starting and stopping thereof is prevented to thereby promote durability, working of a dynamic pressure generating groove is facilitated and the bearing faces are prevented from being adsorbed to each other.
    Type: Application
    Filed: July 3, 2002
    Publication date: November 7, 2002
    Applicant: SEIKO INSTRUMENTS INC.
    Inventors: Tsuyoshi Kashiwada, Katsushige Konno, Kaoru Kaneko, Tadashi Kiyokawa, Hajime Kiyokawa
  • Patent number: 6447167
    Abstract: In a hydrodynamic bearing apparatus for rotatably supporting a rotor by a hydrodynamic bearing, wear of the apparatus caused by sliding contact of dynamic pressure bearing faces in starting and stopping thereof is prevented to thereby promote durability, working of a dynamic pressure generating groove is facilitated and the bearing faces are prevented from being adsorbed to each other. By providing a low friction metal layer having water repellency at dynamic pressure bearing portions of a hydrodynamic bearing apparatus, friction can be reduced, wear or dust formation can effectively be restrained and the bearing faces can be prevented from being adsorbed to each other by dew condensation.
    Type: Grant
    Filed: November 7, 2000
    Date of Patent: September 10, 2002
    Assignees: Seiko Instruments Inc., Kiyokawa Plating Industry Co., Ltd.
    Inventors: Tsuyoshi Kashiwada, Katsushige Konno, Kaoru Kaneko, Tadashi Kiyokawa, Hajime Kiyokawa
  • Patent number: 6306339
    Abstract: A hydrogen storage material is disclosed with no collapse due to pulverization of hydrogen storage alloy particles by repeated hydrogen absorption and desorption thereby permitting repeated use while manifesting excellent electric and thermal conductivities. Pressure molding of hydrogen storage alloy particles, each being covered with a plated metal film having microgranules of a thermoplastic resin, at a temperature higher than a glass transition temperature or a melting point of and below a thermal decomposition temperature of the thermoplastic resin can produce a porous hydrogen storage material of hydrogen storage alloy particles being bonded to each other via the thermoplastic resin. The hydrogen storage material can become firm and strong because the plated metal films covering the hydrogen storage alloy particles are clasped with each other complexly.
    Type: Grant
    Filed: October 10, 2000
    Date of Patent: October 23, 2001
    Assignee: Kiyokawa Plating Industries, Co., Ltd.
    Inventors: Tadashi Kiyokawa, Hajime Kiyokawa, Masayuki Takashima
  • Patent number: 6143052
    Abstract: A hydrogen storage material is disclosed with no collapse due to pulverization of hydrogen storage alloy particles by repeated hydrogen absorption and desorption thereby permitting repeated use while manifesting excellent electric and thermal conductivities. Pressure molding of hydrogen storage alloy particles, each being covered with a plated metal film having microgranules of a thermoplastic resin, at a temperature higher than a glass transition temperature or a melting point of and below a thermal decomposition temperature of the thermoplastic resin can produce a porous hydrogen storage material of hydrogen storage alloy particles being bonded to each other via the thermoplastic resin. The hydrogen storage material can become firm and strong because the plated metal films covering the hydrogen storage alloy particles are clasped with each other complexly.
    Type: Grant
    Filed: June 29, 1998
    Date of Patent: November 7, 2000
    Assignee: Kiyokawa Plating Industries, Co., Ltd.
    Inventors: Tadashi Kiyokawa, Hajime Kiyokawa, Masayuki Takashima
  • Patent number: 5874168
    Abstract: There is provided a fluorocarbon compound-hydrogen storage alloy composite which has a sufficient water-repellent property and can efficiently absorb a hydrogen gas. The composite comprises hydrogen storage alloy particles which have a plated metal film covering at least a part of the particles, the plated metal film containing at least one fine particle of a fluorocarbon compound. Examples of the metal used for plating include Ni, Cu, Co, Ni-P, Ni-W, Ni-W-P, Ni-B, Ni-W-B, Cu-Ni, Cu-P, Co-P, Co-B, and Co-W. Polytetrafluoroethylene is preferably used for the fluorocarbon compound. The fluorocarbon compound hydrogen storage alloy composite is prepared by electrolytically plating the hydrogen storage alloy particles in a pyrophosphate bath with fine particles of a fluorocarbon compound dispersed therein.
    Type: Grant
    Filed: August 1, 1996
    Date of Patent: February 23, 1999
    Assignee: Kiyokawa Plating Industries, Co., Ltd.
    Inventors: Hajime Kiyokawa, Masayuki Takashima, Susumu Yonezawa
  • Patent number: 5560812
    Abstract: A method for producing a metal film resistor including at least an insulating substrate, a resistor film of copper-nickel alloy formed on the surface of the insulating substrate, and a pair of terminals which are in contact with the resistor film is provided. The method includes a step of depositing the copper-nickel alloy by electroplating from an aqueous pyrophosphate bath containing a copper salt and a nickel salt at a bath temperature of 20.degree.-40.degree. C. and a pH of 6-8.
    Type: Grant
    Filed: December 15, 1994
    Date of Patent: October 1, 1996
    Assignee: Kiyokawa Plating Industries Co., Ltd.
    Inventor: Hajime Kiyokawa