Patents by Inventor Hajime Kuwahara
Hajime Kuwahara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240114908Abstract: An object of the present invention is to provide a 2,6-dioxo-3,6-dihydropyrimidine compound that has excellent bactericidal and antimicrobial activity, has excellent safety, and can be industrially favorably synthesized, and an agricultural and horticultural fungicide, a nematicide, and an antifungal agent for use in medicine/animals that contain the compound as an active ingredient.Type: ApplicationFiled: October 26, 2020Publication date: April 11, 2024Applicant: Nippon Soda Co., Ltd.Inventors: Takaaki TERANISHI, Raito KUWAHARA, Yohei MUNEI, Hajime SHIMOMURA, Tatsuhiro KAWASAKI, Takuma ISHIHARA, Jun IWATA, Tomoyuki SAIGA, Chihiro NISHINO
-
Patent number: 11939977Abstract: A scroll compressor comprising a fixed scroll (15); an orbiting scroll (16) supported in a manner allowing for orbiting motion; a discharge port through which a fluid compressed by the two scrolls (15, 16) is discharged; an end plate step portion (16E) provided on an end plate of the orbiting scroll (16) formed so that a height of the end plate is higher on a center portion side in the direction of a spiral wrap and lower on an outer end side; and a wrap step portion (15E) provided on a wall portion of the fixed scroll (15) that corresponds to the end plate step portion (16E) so that a height of the wall portion is lower on the center portion side of the spiral and higher on the outer end side; wherein the orbiting scroll (16) is treated for surface hardening and the fixed scroll (15) is not treated for surface hardening.Type: GrantFiled: January 27, 2021Date of Patent: March 26, 2024Assignee: MITSUBISHI HEAVY INDUSTRIES THERMAL SYSTEMS, LTD.Inventors: Hajime Sato, Makoto Takeuchi, Genta Yoshikawa, Kazuhide Watanabe, Katsuhiro Fujita, Takayuki Hagita, Takayuki Kuwahara
-
Publication number: 20150179971Abstract: The organic electroluminescent element includes: a substrate; a first electrode on a surface of the substrate; a second electrode opposite the first electrode; and a functional layer that is between the first electrode and the second electrode and includes at least a light emission layer. In this organic electroluminescent element, the first electrode is a metal electrode and also is a light-reflective electrode, the second electrode is a light-transmissive electrode, and thus light is allowed to emerge outside from the second electrode. The light emission layer is of a polymer material and has an in-plane direction and a thickness direction. A refractive index in the in-plane direction of the light emission layer is greater than a refractive index in the thickness direction of the light emission layer.Type: ApplicationFiled: November 16, 2012Publication date: June 25, 2015Inventors: Masahito Yamana, Masahiro Nakamura, Takeyuki Yamaki, Hajime Kuwahara, Akio Kaiho
-
Patent number: 6893720Abstract: An object such as an automobile part, an image forming apparatus part, a bicycle part, other machine parts, a sport article or its part, a toy or its part, or a rain article or its part has a portion to be in contact with a contact object. The contact portion is made of at least one kind of material selected from a group including polymer material such as resin or rubber as well as glass, and the contact portion has a surface entirely or partially coated with a carbon film (typically, a DLC film) having a wear resistance as well as at least one of a lubricity, a water repellency and a gas barrier property. The carbon film is formed on the object with a good adhesion.Type: GrantFiled: June 8, 2000Date of Patent: May 17, 2005Assignee: Nissin Electric Co., Ltd.Inventors: Takahiro Nakahigashi, Akira Doi, Yoshihiro Izumi, Hajime Kuwahara
-
Patent number: 6564744Abstract: The present invention provides a plasma CVD method for forming a plasma from a deposition material gas by application of an electric power, and thereby forming a film on a deposition target object in the plasma, wherein the formation of the plasma from the material gas is performed by applying an RF power and a DC power, and the DC power is applied to an electrode carrying the deposition target object. The present invention also provides a plasma CVD apparatus for forming a plasma from a deposition material gas by applying an electric power from the power applying means, and thereby forming a film on a deposition target object by exposing the deposition target object to the plasma, wherein the power applying means includes RF power applying means and DC power applying means, and the DC power applying means applies an electric power to the electrode carrying the deposition target object.Type: GrantFiled: October 18, 2001Date of Patent: May 20, 2003Assignee: Nissin Electric Co., Ltd.Inventors: Takahiro Nakahigashi, Akira Doi, Yoshihiro Izumi, Hajime Kuwahara
-
Patent number: 6465057Abstract: The present invention provides a plasma CVD method for forming a plasma from a deposition material gas by application of an electric power, and thereby forming a film on a deposition target object in the plasma, wherein the formation of the plasma from the material gas is performed by applying an RF power and a DC power, and the DC power is applied to an electrode carrying the deposition target object. The present invention also provides a plasma CVD apparatus for forming a plasma from a deposition material gas by applying an electric power from the power applying means, and thereby forming a film on a deposition target object by exposing the deposition target object to the plasma, wherein the power applying means includes RF power applying means and DC power applying means, and the DC power applying means applies an electric power to the electrode carrying the deposition target object.Type: GrantFiled: July 10, 1997Date of Patent: October 15, 2002Assignee: Nissin Electric Co., Ltd.Inventors: Takahiro Nakahigashi, Akira Doi, Yoshihiro Izumi, Hajime Kuwahara
-
Patent number: 6399879Abstract: An electromagnetic shield plate comprising a geometric pattern having a line width of 10 &mgr;m to 80 &mgr;m and a line interval of 50 to 250 mesh on a surface of a transparent substrate, provides good visibility and excellent electromagnetic shielding, and is easy to manufacture and permits the fabrication of a large-size plate in a simple manner.Type: GrantFiled: October 27, 1999Date of Patent: June 4, 2002Assignee: Sumitomo Chemical Company, LimitedInventors: Kayoko Ueda, Hajime Kuwahara, Toshiya Inoue, Masakazu Shirakawa
-
Patent number: 6383694Abstract: A method of manufacturing a color filter for a reflective liquid crystal display is disclosed. The method comprises the following steps: 1) coating a layer of positive photoresist on a reflective layer or reflective substrate, and exposing the photoresist layer to a light via a mask having a fine pixel pattern so as to form at least three exposed regions of different exposed energy in the photoresist layer, 2) Removing one of the existing exposed regions having a largest exposed dose by the use of an alkaline developer solution so as to expose the surface of the electrically conductive reflective substrate corresponding to the removed region; and electrodepositing a color paint on the exposed surface of the reflective substrate to form a color filter layer of one selected color, 3) repeating step 2) to remove the other exposed regions in the photoresist layer and proceeding with an electrodeposition process with another color paint until a color filter layer of all desired colors is completed.Type: GrantFiled: August 25, 2000Date of Patent: May 7, 2002Assignee: Sumitomo Chemical Company LimitedInventors: Yaw-Ting Wu, Chun-Hsiang Wen, Shu-Huei Cheng, Ming-Hsiang Chan, Jun-Ichi Yasukawa, Hajime Kuwahara
-
Publication number: 20020039626Abstract: The present invention provides a plasma CVD method for forming a plasma from a deposition material gas by application of an electric power, and thereby forming a film on a deposition target object in the plasma, wherein the formation of the plasma from the material gas is performed by applying an RF power and a DC power, and the DC power is applied to an electrode carrying the deposition target object. The present invention also provides a plasma CVD apparatus for forming a plasma from a deposition material gas by applying an electric power from the power applying means, and thereby forming a film on a deposition target object by exposing the deposition target object to the plasma, wherein the power applying means includes RF power applying means and DC power applying means, and the DC power applying means applies an electric power to the electrode carrying the deposition target object.Type: ApplicationFiled: October 18, 2001Publication date: April 4, 2002Applicant: Nissin Electric Co., Ltd.Inventors: Takahiro Nakahigashi, Akira Doi, Yoshihiro Izumi, Hajime Kuwahara
-
Patent number: 6335535Abstract: A method for implanting negative hydrogen ions includes the following steps. Plasma containing hydrogen is generated. Negative hydrogen ions are generated in the plasma. An electric field is formed between the plasma and a substrate. Negative hydrogen ions from the plasma is accelerated by using the electric field so as to implant negative hydrogen ions into a predetermined depth of a substrate.Type: GrantFiled: June 25, 1999Date of Patent: January 1, 2002Assignee: Nissin Electric Co., LTDInventors: Koji Miyake, Tsukasa Hayashi, Hajime Kuwahara
-
Patent number: 6271498Abstract: A vaporizing apparatus has a vaporizing container into which a liquid raw material is introduced and which is made of metal, a heater for heating the vaporizing container to vaporize liquid introduced into the vaporizing container and a metal nozzle (an electrode) disposed in the vaporizing container in such a manner that the nozzle is electrically insulated from the vaporizing container. Moreover, the vaporizing apparatus has a cleaning-solution supply apparatus for supplying, to the inside portion of the vaporizing container, a cleaning solution for solving residues generated in the vaporizing container and a plasma generating power source for supplying high-frequency electric power to a position between the nozzle and the vaporizing container to generate plasma in the vaporizing container by using the vaporized cleaning solution.Type: GrantFiled: June 22, 1998Date of Patent: August 7, 2001Assignee: Nissin Electric Co., LTDInventors: Koji Miyake, Hajime Kuwahara, Tsukasa Hayashi
-
Patent number: 6208401Abstract: The invention discloses a liquid crystal panel which is characterized in that each color filter is compartmentalized by the black matrix and the spacers are positioned on the region confined by the black matrix and the spacer bottom connects the first conductive film. The invention also discloses a process for producing liquid crystal panel, which is characterized in that the color filters and spacers are produced by coating a four-level photoresist and by a first exposure step which is masked by a four-level photoresist; the red region, green region and blue region are produced by development and electro-deposition; and the spacers are produced by a second exposure step which is masked by a spacer reticle, a development step which emerges the first conductive film within a region confined by the black matrix, and a step of electrodeposition coating compositions on the emerged region of the first conductive film.Type: GrantFiled: July 19, 1999Date of Patent: March 27, 2001Assignees: Industrial Technology Research Institute, Sumitomo Chemical Company, LimitedInventors: Chun-Hsiang Wen, Shu-Huei Cheng, Hua-Chi Cheng, Yaw-Ting Wu, Ming-Hsiang Chan, Jun-Ichi Yasukawa, Hajime Kuwahara
-
Patent number: 6165376Abstract: A work is supported by a work support electrode arranged in a vacuum container, a treatment gas corresponding to intended treatment of the work is supplied into the container, and a vacuum is produced in the container. Plasma is formed from the gas by applying an amplitude-modulated high-frequency power to an electrode electrically insulated from the work support electrode, said amplitude-modulated high-frequency power being prepared by effecting amplitude modulation on a basic high-frequency power having a predetermined frequency in a range from 10 MHz to 200 MHz with a modulation frequency in a range from 1/1000 to 1/10 of said predetermined frequency. A positive pulse voltage is applied to the work support electrode to effect the treatment on the surface of the work supported by the work support electrode.Type: GrantFiled: January 5, 1998Date of Patent: December 26, 2000Assignee: Nissin Electric Co., Ltd.Inventors: Koji Miyake, Takahiro Nakahigashi, Hajime Kuwahara
-
Patent number: 6136386Abstract: An object such as an automobile part, an image forming apparatus part, a bicycle part, other machine parts, a sport article or its part, a toy or its part, or a rain article or its part has a portion to be in contact with a contact object. The contact portion is made of at least one kind of material selected from a group including polymer material such as resin or rubber as well as glass, and the contact portion has a surface entirely or partially coated with a carbon film (typically, a DLC film) having a wear resistance as well as at least one of a lubricity, a water repellency and a gas barrier property. The carbon film is formed on the object with a good adhesion.Type: GrantFiled: June 27, 1997Date of Patent: October 24, 2000Assignee: Nissin Electric Co., Ltd.Inventors: Takahiro Nakahigashi, Akira Doi, Yoshihiro Izumi, Hajime Kuwahara
-
Patent number: 6110625Abstract: The invention relates to a method for manufacturing color filters utilizing a color electrodeposition coating which contains an anionic electrodeposition resin having a low acid value.Type: GrantFiled: February 10, 1999Date of Patent: August 29, 2000Assignees: Industrial Technology Research Institute, Sumitomo Chemical Company, Ltd.Inventors: Chun-Hsiang Wen, Shu-Huei Cheng, Hua-Chi Cheng, Yaw-Ting Wu, Ming-Shiang Jan, Pao-Ju Hsieh, Jun-Ichi Yasukawa, Hajime Kuwahara
-
Patent number: 5935391Abstract: A rod-like electrode is disposed in a vacuum container, a ring-like electrode is disposed around the rod-like electrode, a tube to be processed is disposed such that the tube is substantially continuous to the ring-like electrode, an interior of the vacuum container is set to a predetermined degree of vacuum for deposition, a gas is introduced into a space between the electrodes, an electric power for forming plasma from the gas is applied while applying a magnetic field, and the plasma produced thereby is supplied into the tube. If the deposition material gas is used, the film is formed on the inner peripheral surface of the tube. If the plasma source gas for sputtering is used, a sputtering voltage is applied to a sputtering target disposed inside the tube, so that the film is formed on the inner peripheral surface of the tube by sputtering the target with ions in the plasma.Type: GrantFiled: January 31, 1995Date of Patent: August 10, 1999Assignee: Nissin Electric Co., Ltd.Inventors: Takahiro Nakahigashi, Hajime Kuwahara, Hiroshi Fujiyama
-
Patent number: 5710608Abstract: In a method and an apparatus of orientation treatment of an orientation film according to the present invention, the surface of a orientation film formed on a substrate for orientating liquid-crystal molecules is rubbed in a predetermined direction. Thereafter ion beams are radiated onto the orientation film in a vacuum in a direction different from the rubbing direction, that is, in the direction obliquely above the orientation film surface. In the method, these steps can be reversed.Type: GrantFiled: December 27, 1995Date of Patent: January 20, 1998Assignee: Nissin Electric Co., Ltd.Inventors: Masahiro Nakabayashi, Norio Asagi, Hajime Kuwahara, Taizou Ehara
-
Patent number: 5651825Abstract: A plasma material gas is introduced into a plasma producing chamber, and, if necessary, a processing gas is introduced into a processing chamber communicated with the plasma producing chamber. In the plasma producing chamber, a microwave is radiated to a sintered body of metal oxide forming a plasma source, so that plasma is generated from the plasma material gas. Ions generated thereby are accelerated and introduced into the processing chamber. Predetermined processing is performed on a work directly by the ions, or is performed in a plasma generated by the ions from the processing gas.Type: GrantFiled: March 1, 1995Date of Patent: July 29, 1997Assignee: Nissin Electric Co., Ltd.Inventors: Takahiro Nakahigashi, Hajime Kuwahara
-
Patent number: 5562952Abstract: In a plasma-CVD method and apparatus, plasma is formed from a film material gas in a process chamber and, in the plasma, a film is deposited on a substrate disposed in the process chamber. Formation of the plasma from the material gas is performed by application of an rf-power prepared by effecting an amplitude modulation on a basic rf-power having a frequency in a range from 10 MHz to 200 MHz. A modulation frequency of the amplitude modulation is in a range from 1/1000 to 1/10 of the frequency of the basic rf-power. Alternatively, the rf-power is prepared by effecting on the basic rf-power a first amplitude modulation at a frequency in a range from 1/1000 to 1/10 of the frequency of the basic rf-power, and additionally effecting a second amplitude modulation on the modulated rf-power. A modulation frequency of the second amplitude modulation is in a range from 1/100 to 100 times the modulation frequency of the first amplitude modulation.Type: GrantFiled: April 4, 1995Date of Patent: October 8, 1996Assignee: Nissin Electric Co., Ltd.Inventors: Takahiro Nakahigashi, Hiroshi Murakami, Satoshi Otani, Takao Tabata, Hiroshi Maeda, Hiroya Kirimura, Hajime Kuwahara
-
Patent number: 5556474Abstract: In a plasma processing apparatus, wherein a power application electrode for generating plasma and an electrode opposed thereto are disposed in a process chamber which can be exhausted to attain a predetermined vacuum pressure, an electric power is applied to the power application electrode to generate the plasma from a process gas introduced between the electrodes, and intended plasma processing is effected on a substrate mounted on one of the electrodes in the plasma, the apparatus includes a particle discharge duct which surrounds a periphery and a rear side of the power application electrode and has an opening at a position neighboring to the periphery of the power application electrode, and an exhaust device connected to the duct at a position corresponding to a central portion of the rear side of the power application electrode.Type: GrantFiled: December 13, 1994Date of Patent: September 17, 1996Assignee: Nissin Electric Co., Ltd.Inventors: Satoshi Otani, Hiroya Kirimura, Hajime Kuwahara, Takao Tabata, Takahiro Nakahigashi, Hiroshi Murakami