Patents by Inventor Halvor Kamrud

Halvor Kamrud has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6676916
    Abstract: To avoid problems associated with the formation of unwanted cracks and spalls during the growth of a polycrystalline silicon rod, a flaw is induced in a filament on which silicon will be deposited to produce a rod. The flaw causes the grown rod to have a cleavage plane such that the rod will break in a controlled manner at a desired location. The flaw can be placed at a location selected such that breakage at the cleavage plane will produce long rods and thereby improve the yield of the rod growing process. Such a flaw will also have the effect of minimizing useable rod length losses due to spalling.
    Type: Grant
    Filed: November 8, 2002
    Date of Patent: January 13, 2004
    Assignee: Advanced Silicon Materials LLC
    Inventors: David W. Keck, Edward W. Osborne, Halvor Kamrud
  • Publication number: 20030104202
    Abstract: To avoid problems associated with the formation of unwanted cracks and spalls during the growth of a polycrystalline silicon rod, a flaw is induced in a filament on which silicon will bc deposited to produce a rod. The flaw causes the grown rod to have a cleavage plane such that the rod will break in a controlled manner at a desired location. The flaw can be placed at a location selected such that breakage at the cleavage plane will produce long rods and thereby improve the yield of the rod growing process Such a flaw will also have the effect of minimizing useable rod length losses due to spalling.
    Type: Application
    Filed: November 8, 2002
    Publication date: June 5, 2003
    Applicant: Advanced Silicon Materials LLC
    Inventors: David W. Keck, Edward W. Osborne, Halvor Kamrud