Patents by Inventor Hamid F. Tavassoli

Hamid F. Tavassoli has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction
    Patent number: 8617351
    Abstract: A plasma reactor for processing a workpiece, includes a vacuum chamber defined by a sidewall and ceiling, and a workpiece support pedestal having a workpiece support surface in the chamber and facing the ceiling and including a cathode electrode. An RF power generator is coupled to the cathode electrode. Plasma distribution is controlled by an external annular inner electromagnet in a first plane overlying the workpiece support surface, an external annular outer electromagnet in a second plane overlying the workpiece support surface and having a greater diameter than the inner electromagnet, and an external annular bottom electromagnet in a third plane underlying the workpiece support surface. D.C. current supplies are connected to respective ones of the inner, outer and bottom electromagnets.
    Type: Grant
    Filed: January 28, 2005
    Date of Patent: December 31, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Daniel J. Hoffman, Roger A. Lindley, Michael C. Kutney, Martin J. Salinas, Hamid F. Tavassoli, Keiji Horioka, Douglas A. Buchberger, Jr.