Patents by Inventor Han-Kwang Nienhuys

Han-Kwang Nienhuys has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC APPARATUS AND COMPONENT
    Publication number: 20120300187
    Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, and a projection system configured to project a patterned radiation beam onto a target portion of the substrate. A surface of a component of the lithographic apparatus that is in a vacuum environment in use is provided with a repeating structure configured to increase the effective thermal accommodation coefficient of the surface.
    Type: Application
    Filed: May 23, 2012
    Publication date: November 29, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Han-Kwang NIENHUYS, Franciscus Johannes Joseph JANSSEN, Sven PEKELDER, Roger Wilhelmus Antonius Henricus SCHMITZ, Alexander Marinus Arnoldus HUIJBERTS, Paulus Albertus Maria GASSELING
  • LITHOGRAPHIC APPARATUS AND METHOD
    Publication number: 20120281193
    Abstract: A lithographic apparatus includes a projection system that includes a plurality of reflective optics. One of the reflective optics is provided with an opening which passes through the reflective optic. The opening is closed by a covering layer that is substantially transparent to EUV radiation. The covering layer prevents contamination from entering the projection system, while allowing patterned EUV radiation to pass from the projection system onto a substrate.
    Type: Application
    Filed: April 9, 2012
    Publication date: November 8, 2012
    Applicant: ASML Netherland B.V.
    Inventors: Erik Roelof Loopstra, Sven Pekelder, Han-Kwang Nienhuys
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120229783
    Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
    Type: Application
    Filed: March 1, 2012
    Publication date: September 13, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Han-Kwang Nienhuys, Martinus Agnes Willem Cuijpers, Nicolaas Ten Kate, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Oleksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Laurentius Johannes Adrianus Van Bokhoven, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120229782
    Abstract: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
    Type: Application
    Filed: February 29, 2012
    Publication date: September 13, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Han-Kwang Nienhuys, Martinus Anges Willem Cuijpers, Leon Martin Levasier, Jan Bernard Plechelmus Van Schoot, Yuri Johannes Gabriël Van De Vijver, Oleg Viacheslavovich Voznyi, Franciscus Johannes Joseph Janssen, Danny Maria Hubertus Philips, Marcio Alexandre Cano Miranda, Olesksiy Galaktionov, Manish Ranjan, Albert Pieter Rijpma, Kursat Bal, Roger Wilhelmus Antonius Henricus Schmitz, Alain Louis Claude Leroux
  • Lithographic Apparatus and Method
    Publication number: 20120002182
    Abstract: A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a substrate. The projection system being provided with an opening through which the patterned beam of radiation may pass. At least part of the opening comprises a sloped surface of a wall of the projection system and a sloped surface of a mirror of the projection system.
    Type: Application
    Filed: December 22, 2010
    Publication date: January 5, 2012
    Applicant: ASML Netherlands B.V.
    Inventors: Han-Kwang Nienhuys, Peter Gerardus Jonkers, Alexander Marinus Arnoldus Huijberts