Patents by Inventor Hang Mook Park

Hang Mook Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma monitoring device
    Patent number: 10262841
    Abstract: A plasma monitoring device includes a fixing unit, a plasma measuring unit disposed to be in contact with the fixing unit, and measuring a luminous intensity of emitted light of a plasma to output a luminous intensity measurement value, a reference light source unit irradiating reference light having a uniform luminous intensity to the plasma measuring unit, and a control unit receiving the luminous intensity measurement value to calculate a luminous intensity value of the emitted light, controlling a voltage applied to the reference light source unit to uniformly control a luminous intensity of the reference light, comparing a luminous intensity of the reference light irradiated to the plasma measuring unit with a previously stored luminous intensity reference value to detect a correction factor, and applying the correction factor to a luminous intensity value of the emitted light to correct the luminous intensity measurement value.
    Type: Grant
    Filed: January 10, 2017
    Date of Patent: April 16, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Pyung Moon, Sung Ho Kang, Ki Chul Kim, Un Ki Kim, Yong Hun Lee, Jae Hee Lee, Yong Seok Song, Hang Mook Park, Je Hoon Oh
  • Plasma Monitoring Device
    Publication number: 20180012737
    Abstract: A plasma monitoring device includes a fixing unit, a plasma measuring unit disposed to be in contact with the fixing unit, and measuring a luminous intensity of emitted light of a plasma to output a luminous intensity measurement value, a reference light source unit irradiating reference light having a uniform luminous intensity to the plasma measuring unit, and a control unit receiving the luminous intensity measurement value to calculate a luminous intensity value of the emitted light, controlling a voltage applied to the reference light source unit to uniformly control a luminous intensity of the reference light, comparing a luminous intensity of the reference light irradiated to the plasma measuring unit with a previously stored luminous intensity reference value to detect a correction factor, and applying the correction factor to a luminous intensity value of the emitted light to correct the luminous intensity measurement value.
    Type: Application
    Filed: January 10, 2017
    Publication date: January 11, 2018
    Inventors: Pyung Moon, Sung Ho Kang, Ki Chul Kim, Un Ki Kim, Yong Hun Lee, Jae Hee Lee, Yong Seok Song, Hang Mook Park, Je Hoon Oh