Abstract: The present disclosure relates to a ceramic susceptor. The ceramic susceptor of the present disclosure may include a ceramic plate having a heating element disposed thereon and at least one hole. The heating element may include a plurality of concentric circular patterns, each of the concentric circular patterns may include arc portions extending in a circumferential direction and a transverse portion interconnecting the arc portions, and among the arc portions of the plurality of concentric circular patterns, each of the arc portions, which face each other across the hole, may include, in a portion thereof, a protrusion protruding toward the hole.

Abstract: The present disclosure relates to a ceramic susceptor. The ceramic susceptor of the present disclosure may include a ceramic plate having a heating element disposed thereon and at least one hole. The heating element may include a plurality of concentric circular patterns, each of the concentric circular patterns may include arc portions extending in a circumferential direction and a transverse portion interconnecting the arc portions, and among the arc portions of the plurality of concentric circular patterns, each of the arc portions, which face each other across the hole, may include, in a portion thereof, a protrusion protruding toward the hole.

Abstract: Disclosed is an electrostatic chuck with a cooling structure using a cooling gas. The electrostatic chuck comprises: an electrostatic chuck plate that includes a plurality of first cooling gas holes formed in a first region and a plurality of second cooling gas holes formed in a second region; and a base member that includes a first flow path pattern connected to the plurality of first cooling gas holes, a second flow path pattern connected to the plurality of second cooling gas holes, and an inlet moving pattern changing a position of an inlet of a cooling gas injected into the first flow path pattern.

Abstract: Disclosed is an electro static chuck. Disclosed is an electro static chuck which includes: a base substrate; and an electro static chuck plate fixed onto the base substrate and including a plurality of electrodes to which biases for chucking and dechucking are applied, in which the plurality of electrodes includes a spiral pattern extending from a start point of an edge of the electro static chuck plate toward an end point of a center and a rotational angle of the spiral pattern is 360°n (n is a real number of 1 to 2).

Abstract: Disclosed is an electro static chuck. Disclosed is an electro static chuck which includes: a base substrate; and an electro static chuck plate fixed onto the base substrate and including a plurality of electrodes to which biases for chucking and dechucking are applied, in which the plurality of electrodes includes a spiral pattern extending from a start point of an edge of the electro static chuck plate toward an end point of a center and a rotational angle of the spiral pattern is 360°n (n is a real number of 1 to 2).

Abstract: Disclosed is an electrostatic chuck with a cooling structure using a cooling gas. The electrostatic chuck comprises: an electrostatic chuck plate that includes a plurality of first cooling gas holes formed in a first region and a plurality of second cooling gas holes formed in a second region; and a base member that includes a first flow path pattern connected to the plurality of first cooling gas holes, a second flow path pattern connected to the plurality of second cooling gas holes, and an inlet moving pattern changing a position of an inlet of a cooling gas injected into the first flow path pattern.