Abstract: The present invention relates to methods and devices for extending a time period until changing a measuring tip of a scanning probe microscope. In particular, the invention relates to a method for hardening a measuring tip for a scanning probe microscope, comprising the step of: Processing the measuring tip with a beam of an energy beam source, the energy beam source being part of a scanning electron microscope.

Abstract: The present invention relates to a beet plant, seed, variety and hybrid. More specifically, the invention relates to a beet plant having a mutant allele designated ACSDMR001 which confers resistance to downy mildew infection. The invention also relates to crossing inbreds, varieties and hybrids containing the ACSDMR001 allele to produce novel types and varieties of beet plants having downy mildew resistance.

Abstract: The present invention relates to a beet plant, seed, variety and hybrid. More specifically, the invention relates to a beet plant having a mutant allele designated ACSDMR001 which confers resistance to downy mildew infection. The invention also relates to crossing inbreds, varieties and hybrids containing the ACSDMR001 allele to produce novel types and varieties of beet plants having downy mildew resistance.

Abstract: A beverage bottling plant for filling bottles with a liquid beverage filling material, a container filling plant container filling machine, and a filter apparatus for filtering a liquid beverage. The filter apparatus has a plurality of filter chambers and associated valves for controlling flow of filtered liquid out of the filter chambers to optimize filtration.

Abstract: Control system with at least one control unit, a server computer, a first document in a markup language and a second document in a markup language for loading through a client computer, whereby the first document contains at least one field and the second document contains data for directing the field to an address in a control unit.

Abstract: This invention relates to a mask blank for use in EUV lithography and a method for its production. The mask blank comprises a substrate with a front side and a rear side whereby a coating is applied to the front side for use as a mask in EUV lithography and the rear side of the substrate comprises an electrically conductive coating. The electrically conductive coating is particularly abrasion resistant and strongly adhesive according to DIN 58196-5 (German Industry Standard), DIN 58196-4 and DIN 58196-6 and characterised by a minimum electrical conductivity. The electrically conductive coating is applied by means of ion-beam-assisted sputtering. Since the electrically conductive coating on the rear side is so abrasion resistant and strongly adhesive, the mask blank may be gripped, held and handled by means of an electrostatic holding device (chuck) without any troublesome abrasion occurring.

Abstract: A beverage bottling plant for filling bottles with a liquid beverage filling material, a container filling plant container filling machine, and a filter apparatus for filtering a liquid beverage. The filter apparatus has a plurality of filter chambers which are each provided with an individual valve in the outlet for filtered liquid from a filter chamber to optimize filtration. The abstract of the disclosure is submitted herewith as required by 37 C.F.R. § 1.72(b). As stated in 37 C.F.R. § 1.72(b): A brief abstract of the technical disclosure in the specification must commence on a separate sheet, preferably following the claims, under the heading “Abstract of the Disclosure.” The purpose of the abstract is to enable the Patent and Trademark Office and the public generally to determine quickly from a cursory inspection the nature and gist of the technical disclosure. The abstract shall not be used for interpreting the scope of the claims.

Abstract: The present invention relates to a monitoring system for connection to an air conditioning system. The monitoring system includes a primary monitor for sensing the suction temperature and suction pressure of the air conditioning system along with the air conditioning unit temperature. In addition, the monitoring system includes a remote sensing device that is placed in the structure to monitor and transmit return air temperature and relative humidity to the primary monitor. The collected data is then used to calculate the superheat condition of the air conditioning system which is related to its efficiency.

Abstract: A beverage bottling plant for filling bottles with a liquid beverage filling material, a container filling plant container filling machine, and a filter apparatus for filtering a liquid beverage. The filter apparatus has a plurality of filter chambers which are each provided with an individual valve in the outlet for filtered liquid from a filter chamber to optimize filtration. The abstract of the disclosure is submitted herewith as required by 37 C.F.R. § 1.72(b). As stated in 37 C.F.R. § 1.72(b): A brief abstract of the technical disclosure in the specification must commence on a separate sheet, preferably following the claims, under the heading “Abstract of the Disclosure.” The purpose of the abstract is to enable the Patent and Trademark Office and the public generally to determine quickly from a cursory inspection the nature and gist of the technical disclosure. The abstract shall not be used for interpreting the scope of the claims.

Abstract: The present invention relates to a monitoring system for connection to an air conditioning system. The monitoring system includes a primary monitor for sensing the suction temperature and suction pressure of the air conditioning system along with the air conditioning unit temperature. In addition, the monitoring system includes a remote sensing device that is placed in the structure to monitor and transmit return air temperature and relative humidity to the primary monitor. The collected data is then used to calculate the superheat condition of the air conditioning system which is related to its efficiency.

Abstract: The present invention relates to mask blanks with anti reflective coatings comprising at least two sublayers. Such bilayer or multilayer anti reflective coatings are advantageous for binary and phase shift mask blanks for use in lithography for an exposure wavelength of 300 nm or less with improved anti reflection properties; and to EUVL mask blanks having improved inspection properties.

Abstract: An electrolysis device is provided. The electrolysis device includes an ionizer unit having first and second plate assemblies that each provide a different surface area that is contacted by water when the unit is in use. The plate assemblies may each provide a different surface area by providing a different number of plates. The plate assemblies are formed from integral pieces of material, to enhance the reliability of the device. The present invention further provides a control unit programmed to provide an output to the ionizer unit that varies in polarity over time.

Abstract: The present invention relates to embedded attenuated phase shift mask blanks for use in lithography for an exposure wavelength of 300 nm or less, and a method of fabricating such mask blanks by ion beam deposition. In particular, the mask blanks comprise a substrate and a thin film system wherein the thin film system comprises a transmission control sublayer comprising one or more metals or metal compounds selected from the group consisting of Mg, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Fe, Co, Ni, Zn, Ge, Sn, Pb, oxides, nitrides, borides and carbides thereof, and combinations of metals and compounds thereof; and a phase shift control sublayer comprising borides, carbides, oxides and/or nitrides of Ge, Si and/or Al or combinations thereof.

Abstract: An electrolysis device is provided. The electrolysis device includes an ionizer unit having first and second plate assemblies that each provide a different surface area that is contacted by water when the unit is in use. The plate assemblies may each provide a different surface area by providing a different number of plates. The plate assemblies are formed from integral pieces of material, to enhance the reliability of the device. The present invention further provides a control unit programmed to provide an output to the ionizer unit that varies in polarity over time.

Abstract: The invention relates to a method of producing a mask blank (1) for photolithographic applications, particularly in EUV lithography, comprising the steps of: providing a substrate (2) which has a front side (4) and a rear side (3); depositing an electrically conductive layer (5) on the rear side of the substrate; depositing a coating on the front side of the substrate, wherein the coating comprises at least a first layer (6) and a second layer (9); and structuring the coating (6, 9) for photolithographic applications; wherein a respective handling area (22; 22a-22c) is formed on the front side (4) at least at one predefined location, said handling area not being structured for photolithographic applications and being designed for the handling of the mask blank (1) by means of a mechanical clamp or handling device, and wherein the first layer (6) is exposed in the respective handling area (22; 22a-22c) so that, when the mask blank (1) is handled from the front side, the mechanical clamp or handling devi

Abstract: The present invention relates to a monitoring system for connection to an air conditioning system. The monitoring system includes a primary monitor for sensing the suction temperature and suction pressure of the air conditioning system along with the air conditioning unit temperature. In addition, the monitoring system includes a remote sensing device that is placed in the structure to monitor and transmit return air temperature and relative humidity to the primary monitor. The collected data is then used to calculate the superheat condition of the air conditioning system which is related to its efficiency.

Abstract: The present invention relates to attenuating phase shift mask blanks for use in lithography, a method of fabricating such a mask blank.

Abstract: The invention relates to a method for manufacturing of a mask blank for extreme ultraviolet (EUV) photolithography, comprising the steps of: providing a substrate having a front surface and a back surface; depositing a film comprising tantalum nitride (TaN) on said front surface of said substrate for absorbing EUV light used during a photolithographic process; and depositing a conductive coating on said back surface of said substrate. Preferably, ion beam sputtering is used for depositing the film comprising tantalum nitride (TaN) and/or the conductive coating on the back surface of the substrate. Preferably, Xenon is used as a sputter gas for ion beam sputtering. Another aspect of the present invention relates to a mask blank for extreme ultraviolet (EUV) photolithography.

Abstract: A mask blank and photomask for exposure light having a wavelength of 300 nm or is less described having an improved chemical durability in particular with respect to alkaline cleaning procedures. In particular, a mask blank and photomask comprise an additional ultra thin protection layer provided on a silicon and/or aluminum containing layer.

Abstract: The present invention relates to phase shift mask blanks for exposure wavelength of less than 300 nm, a process for their preparation, to phase shift masks manufactured by such phase shift mask blanks and a process for the preparation of said phase shift masks.