Abstract: A method includes receiving a series of writes that each requests respective data to be stored at a database. For each respective write, the method includes storing the respective data in a first buffer associated with a first data streaming application and a second buffer associated with a second data streaming application. The method includes transmitting the respective data to the database. The method includes receiving, from the database, confirmation that the respective data of the respective write has been committed to the database. The confirmation includes an order indicator indicating an order the respective data of the respective write was committed to the database relative to other writes in the series of writes. In response to receiving the confirmation, the method includes sending the respective data from the first buffer to the first data streaming application and from the second buffer to the second data streaming application.

Abstract: A method includes receiving a series of writes that each requests respective data to be stored at a database. For each respective write, the method includes storing the respective data in a first buffer associated with a first data streaming application and a second buffer associated with a second data streaming application. The method includes transmitting the respective data to the database. The method includes receiving, from the database, confirmation that the respective data of the respective write has been committed to the database. The confirmation includes an order indicator indicating an order the respective data of the respective write was committed to the database relative to other writes in the series of writes. In response to receiving the confirmation, the method includes sending the respective data from the first buffer to the first data streaming application and from the second buffer to the second data streaming application.

Abstract: An apparatus to apply materials to a substrate disposed in a vacuum chamber is disclosed. A separate generator chamber containing an electron emitter is connected to the vacuum chamber by a process chamber so that a plasma of controllable cross-sectional shape and large area is formed and guided by magnets toward a target system. Positive ions may be accelerated against the target by applying an adjustable negative voltage.

Abstract: An arrangement or apparatus for exposing semiconductor wafers by means of a synchrotron radiation, wherein a mask and semiconductor wafer are movable in a common, perpendicular direction relative to the direction of the X-ray beam in order to sweep an exposure field. The optical devices are provided for observing adjustment marks on the mask and semiconductor wafer to create control signals for the adjustment of the mask and wafer relative to each other. The beam radiation is conducted in a tube having a rectangular slot-shaped radiation window, which is arranged immediately adjacent to the mask and the optical devices are provided next to the beam feed tube and aligned to a part of the exposure fields lying outside of the impingement area of the beam leaving the radiation window.

Abstract: The present invention relates to a laserinterferometric process, in particular, for use in etching thin layers, whereby a layer to be examined is radiated with a laser passing over a surface of the layer and the intensity of the reflected laser beam, which is composed of a beam reflected from the surface of the layer to be examined and one reflected from its lower interface is ascertained and evaluated by a data processing system from which the information concerning the layer to be examined is read out. The present invention also relates to an imaging laserinterferometer comprising a modulator, which deflects the laser beam, a detector for the reflected laser beam and a data processing systen, which analyzes the detector signals.

Abstract: A separating nozzle element composed of a separating body and two cover plates between which the body is interposed, the nozzle element being used for the separation of gaseous or vaporous mixtures, is produced by providing a layer of a material whose ability to be removed from the layer can be altered by irradiation, the thickness of the layer being approximately equal to the thickness of the separating body, irradiating the layer, starting at one surface, with radiation which has a penetration depth into the material of the layer which is less than the thickness of the layer, in a pattern corresponding to the cross section of the separating body structure, and removing from the layer material which is more easily removable as a result of the irradiation, to thereby permit the radiation to penetrate to greater distances from the one surface, while continuing the removal of material until the entire thickness of the layer has been subjected to radiation and removal, to form a mold of the separating body.