Patents by Inventor Hans Jansen
Hans Jansen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20190086820Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: ApplicationFiled: November 21, 2018Publication date: March 21, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus SENGERS, Sjoerd Nicolaas Lambertus DONDERS, Hans JANSEN, Arjen BOOGAARD
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Publication number: 20190086814Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.Type: ApplicationFiled: November 19, 2018Publication date: March 21, 2019Applicant: ASML Netherlands B.V.Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentinus Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
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Patent number: 10234768Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.Type: GrantFiled: May 3, 2018Date of Patent: March 19, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
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Patent number: 10175585Abstract: A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.Type: GrantFiled: August 29, 2014Date of Patent: January 8, 2019Assignee: ASML NETHERLANDS B.V.Inventors: Robert Douglas Watso, Youri Johannes Laurentius Maria Van Dommelen, Johannes Henricus Wilhelmus Jacobs, Hans Jansen, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Peter Paul Steijaert, Antonius Martinus Cornelis Petrus De Jong, Jimmy Matheus Wilhelmus Van De Winkel, Joao Paulo Da Paz Sena, Maurice Martinus Johannes Van Der Lee, Henricus Martinus Dorotheus Van Lier, Gheorghe Tanasa
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Publication number: 20180356735Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.Type: ApplicationFiled: May 4, 2018Publication date: December 13, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Jacobus Johannus Leonardus Hendricus VERSPAY, Hans JANSEN, Marco Koert STAVENGA
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Patent number: 10151984Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.Type: GrantFiled: October 30, 2015Date of Patent: December 11, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Laurentius Catrinus Jorritsma, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Maurice Martinus Johannes Van Der Lee, Gheorghe Tanasa, Lambertus Dominicus Noordam
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Patent number: 10146143Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: GrantFiled: October 26, 2017Date of Patent: December 4, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus Sengers, Sjoerd Nicolaas Lambertus Donders, Hans Jansen, Arjen Boogaard
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Publication number: 20180246418Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.Type: ApplicationFiled: May 3, 2018Publication date: August 30, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
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Publication number: 20180203364Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: ApplicationFiled: March 12, 2018Publication date: July 19, 2018Applicant: ASMLNETHERLANDS B.V.Inventors: Bob STREEFKERK, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sofia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
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Patent number: 9989861Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.Type: GrantFiled: November 27, 2017Date of Patent: June 5, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
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Publication number: 20180129143Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.Type: ApplicationFiled: January 4, 2018Publication date: May 10, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Christiaan Alexander HOOGENDAM, Antonius Theodorus Anna Maria DERKSEN, Sjoerd Nicolaas Lambertus DONDERS, Joeri LOF, Erik Roelof LOOPSTRA, Johannes Catharinus Hubertus MULKENS, Hans JANSEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Alexander STRAAIJER, Bob STREEFKERK
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Patent number: 9964861Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.Type: GrantFiled: October 23, 2017Date of Patent: May 8, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Jacobus Johannus Leonardus Hendricus Verspay, Hans Jansen, Marco Koert Stavenga
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Patent number: 9952515Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: GrantFiled: August 28, 2015Date of Patent: April 24, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
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Publication number: 20180081282Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.Type: ApplicationFiled: November 27, 2017Publication date: March 22, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus BASELMANS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Felix Godfried Peter PEETERS, Bob STREEFKERK, Franciscus Johannes Herman Maria TEUNISSEN, Helmar VAN SANTEN
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Publication number: 20180046095Abstract: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained.Type: ApplicationFiled: October 26, 2017Publication date: February 15, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Timotheus Franciscus SENGERS, Sjoerd Nicolaas Lambertus DONDERS, Hans JANSEN, Arjen BOOGAARD
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Publication number: 20180046090Abstract: In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.Type: ApplicationFiled: October 23, 2017Publication date: February 15, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Jacobus Johannus Leonardus Hendricus VERSPAY, Hans JANSEN, Marco Koert STAVENGA
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Patent number: 9885965Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.Type: GrantFiled: March 2, 2017Date of Patent: February 6, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Christiaan Alexander Hoogendam, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Joeri Lof, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Hans Jansen, Jacobus Johannus Leonardus Hendricus Verspay, Alexander Straaijer, Bob Streefkerk
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Publication number: 20180004100Abstract: An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.Type: ApplicationFiled: September 18, 2017Publication date: January 4, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Hans Jansen, Marco Koert Stavenga, Jacobus Johannus Leonardus Hendricus Verspay, Franciscus Johannes Joseph Janssen, Anthonie Kuijper
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Patent number: 9829799Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.Type: GrantFiled: February 13, 2017Date of Patent: November 28, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
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Publication number: 20170322499Abstract: A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions.Type: ApplicationFiled: July 27, 2017Publication date: November 9, 2017Applicant: ASML Netherlands B.V.Inventors: Michel RIEPEN, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jan Okke Nieuwenkamp, Jacob Brinkert, Henricus Jozef Castelijns, Nicolaas Ten Kate, Hendrikus Gijsbertus Schimmel, Hans Jansen, Dennis Jozef Maria Paulussen, Brian Vernon Virgo, Reinier Theodorus Martinus Jilisen, Ramin Badie, Albert Pieter Rijpma, Johannes Christiaan Leonardus Franken, Peter Van Putten, Gerrit Van Der Straaten