Patents by Inventor Hans-Joest Herzog

Hans-Joest Herzog has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for producing a spatially periodic semiconductor layer structure
    Patent number: 4843028
    Abstract: In a method for producing a spatially periodic semiconductor layer structure in the form of a superlattice composed of an alternating arrangement of strained semicondutor layers of at least two different semiconductor compositions forming at least one heterojunction, at least one of the semiconductor layers is provided with a doped layer which extends essentially parallel to the heterojunction and whose layer thickness is no greater than the thickness of the semiconductor layer in which it is produced.
    Type: Grant
    Filed: December 8, 1988
    Date of Patent: June 27, 1989
    Assignee: Icentia Patent-Verwaltungs-GmbH
    Inventors: Hans-Joest Herzog, Helmut Jorke, Horst Kibbel
  • Mask for X-ray lithography
    Patent number: 4647517
    Abstract: The invention relates to a mask for X-ray lithography, in particular, for the manufacture of VLSI semiconductor components, which is economical and reliable in its manufacture. The mask should transfer absorber structures down to the submicron range. Lateral mechanical distortions are avoided by a tension-compensated carrier membrane of simultaneously B and Ge doped silicon. This carrier membrane is also optically more transparent than known Si membranes doped only with B, which facilitates optical alignment of the mask.
    Type: Grant
    Filed: July 3, 1985
    Date of Patent: March 3, 1987
    Assignees: Licentia Patent-Verwaltungs-GmbH, Telefunken electronic GmbH
    Inventors: Jurgen Hersener, Hans-Joest Herzog, Karl Strohm