Abstract: An imaging optical unit comprises a plurality of minors for imaging an object field into an image field. The imaging optical unit has an image-side numerical aperture greater than 0.55. Each mirror is configured so that it can be measured by a testing optical unit having at least one DOE with a predetermined maximum diameter for test wavefront generation. For the complete measurement of all reflection surfaces of the minors, a maximum number of DOEs of the testing optical unit and/or a maximum number of DOE test positions of the at least one DOE of the testing optical unit comes into play, which is no more than five times the number of minors in the imaging optical unit. The result is an imaging optical unit in which a testing-optical measurement remains manageable even in the case of a design with an image-side numerical aperture which is relatively large.

Abstract: An imaging optical unit comprises a plurality of mirrors for imaging an object field in an object plane into an image field in an image plane. An image-side numerical aperture is greater than 0.55. A ratio between an object/image offset and a meridional transverse direction is at least 0.5. A ratio between a working distance between the object plane and a reflection portion, closest to the object plane, of one of the mirrors and the meridional transverse dimension is at least 0.05. The working distance is at least 270 mm. This can yield an imaging optical unit, the use of which is relatively manageable in a projection exposure apparatus, such as for EUV projection lithography.

Abstract: A diffractive optical element has a plurality of diffraction structures for a certain wavelength. These each have a width measured in the plane of the diffractive optical element and a height measured perpendicularly thereto. The widths and the heights of the diffraction structures vary over the area of the diffractive optical element. An optical arrangement comprising such a diffractive optical element has, in addition, a neutral filter. The efficiency of such a diffractive optical element and of such an arrangement can be optimized locally for usable light.

Abstract: A diffractive optical element has a plurality of diffraction structures for a certain wavelength. These each have a width measured in the plane of the diffractive optical element and a height measured perpendicularly thereto. The widths and the heights of the diffraction structures vary over the area of the diffractive optical element. An optical arrangement comprising such a diffractive optical element has, in addition, a neutral filter. The efficiency of such a diffractive optical element and of such an arrangement can be optimized locally for usable light.

Abstract: A microlithographic projection exposure apparatus contains an illumination system (12) for generating projection light (13) and a projection lens (20; 220; 320; 420; 520; 620; 720; 820; 920; 1020; 1120) with which a reticle (24) that is capable of being arranged in an object plane (22) of the projection lens can be imaged onto a light-sensitive layer (26) that is capable of being arranged in an image plane (28) of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L5; L205; L605; L705; L805; L905; L1005; L1105) of the projection lens on the image side is immersed in an immersion liquid (34; 334a; 434a; 534a). A terminating element (44; 244; 444; 544; 644; 744; 844; 944; 1044; 1144) that is transparent in respect of the projection light (13) is fastened between the final lens element on the image side and the light-sensitive layer.

Abstract: A diffractive optical element has a plurality of diffraction structures for a certain wavelength. These each have a width measured in the plane of the diffractive optical element and a height measured perpendicularly thereto. The widths and the heights of the diffraction structures vary over the area of the diffractive optical element. An optical arrangement comprising such a diffractive optical element has, in addition, a neutral filter. The efficiency of such a diffractive optical element and of such an arrangement can be optimized locally for usable light.

Abstract: A diffractive optical element has a plurality of diffraction structures for a certain wavelength. These each have a width measured in the plane of the diffractive optical element and a height measured perpendicularly thereto. The widths and the heights of the diffraction structures vary over the area of the diffractive optical element. An optical arrangement comprising such a diffractive optical element has, in addition, a neutral filter. The efficiency of such a diffractive optical element and of such an arrangement can be optimized locally for usable light.

Abstract: A device for temperature measurement uses an optical system to image the heat radiation emanating from a measurement spot on an object of measurement onto a detector. A sighting arrangement is also provided which has a diffractive optical system by which a light intensity distribution is produced which corresponds to the position and size of the measurement spot on the object of measurement.

Abstract: A diffractive optical element has a plurality of diffraction structures for a certain wavelength. These each have a width measured in the plane of the diffractive optical element and a height measured perpendicularly thereto. The widths and the heights of the diffraction structures vary over the area of the diffractive optical element. An optical arrangement comprising such a diffractive optical element has, in addition, a neutral filter. The efficiency of such a diffractive optical element and of such an arrangement can be optimized locally for usable light.

Abstract: A device for temperature measurement uses an optical system to image the heat radiation emanating from a measurement spot on an object of measurement onto a detector. A sighting arrangement is also provided which has a diffractive optical system by which a light intensity distribution is produced which corresponds to the position and size of the measurement spot on the object of measurement.

Abstract: The invention relates to a device for temperature measurement. The heat radiation emanating from a measurement spot on an object of measurement is imaged by an optical system onto a detector. A sighting arrangement is also provided which has a diffractive optical system by which a light intensity distribution is produced which corresponds to the position and size of the measurement spot on the object of measurement.

Abstract: A device for temperature measurement uses an optical system to image the heat radiation emanating from a measurement spot on an object of measurement onto a detector. A sighting arrangement is also provided which has a diffractive optical system by which a light intensity distribution is produced which corresponds to the position and size of the measurement spot on the object of measurement.