Abstract: The invention provides novel compounds having the general formula (I) wherein RA, RB, RC, RC1 and W are as defined herein, compositions including the compounds and methods of using the compounds.

Abstract: The invention provides new heterocyclic compounds having the general formula (I) wherein R1 to R7, A, L1, and RA1 to RA3 are as described herein, compositions including the compounds, processes of manufacturing the compounds and methods of using the compounds.

Abstract: The invention provides new heterocyclic compounds having the general formulae (Ia) and (Ib) wherein A, B, and L are as described herein, compositions including the compounds, processes of manufacturing the compounds and methods of using the compounds.

Abstract: The invention provides new heterocyclic compounds having the general formula (I) wherein B, C, L, X, Y, RL and R3 to R5 are as described herein, compositions including the compounds, processes of manufacturing the compounds and methods of using the compounds.

Abstract: A two-channel semiconductor component has a doped semiconductor body formed from a group IV semiconductor material, a top-side top-gate electrode, and a bottom-side bottom-gate electrode. A source region has a greater extent in a depth direction in the silicon body than a drain region. A source isolation region is arranged between a source region and the top-gate electrode, and a drain isolation region is arranged between a drain region and the top-gate electrode, which isolation region extends in a depth direction as far as to the lower edge of a gate isolation layer of the top-gate electrode. In a first operating state a first conductive channel separated laterally from the source region by the source isolation region can be formed, as can a second conductive channel, which is decoupled from the first conductive channel by a barrier region of the semiconductor body extending in a depth direction between the conductive channels.

Abstract: The invention provides new heterocyclic compounds having the general formula (I) wherein A, B, L, X, R1, R2, R3 and R4 are as described herein, compositions including the compounds, processes of manufacturing the compounds and methods of using the compounds.

Abstract: The invention provides new heterocyclic compounds having the general formula (I) wherein A, L, X, m, n, R1 and R2 are as described herein, compositions including the compounds, processes of manufacturing the compounds, methods of using the compounds and methods of determining the monoacylglycerol lipase (MAGL) inhibitory activity of the compounds.

Abstract: The invention provides new heterocyclic compounds having the general formula (I) wherein A, L, Q, U, V, W, X, Z, m, n, and R1 to R4 are as described herein, compositions including the compounds, processes of manufacturing the compounds and methods of using the compounds.

Abstract: The invention provides new heterocyclic compounds having the general formula (Ic) wherein A, L, X, m, n and R20 to R23 are as described herein, compositions including the compounds, processes of manufacturing the compounds and methods of using the compounds.

Abstract: The invention provides new heterocyclic compounds having the general formula (I) wherein A, B, L, X, R1, R2, R3 and R4 are as described herein, compositions including the compounds, processes of manufacturing the compounds and methods of using the compounds.

Abstract: The invention provides new heterocyclic compounds having the general formula (I) wherein A, B, L1, X, m, n, and RI to R7 are as described herein, compositions including the compounds, processes of manufacturing the compounds and methods of using the compounds.

Abstract: The invention provides new heterocyclic compounds having the general formula (I) wherein A, L1, X, m, n and R1 to R4 are as described herein, compositions including the compounds, processes of manufacturing the compounds and methods of using the compounds.

Abstract: The invention provides new heterocyclic compounds having the general formulae (Ia) and (Ib) wherein A, B, and L are as described herein, compositions including the compounds, processes of manufacturing the compounds and methods of using the compounds.

Abstract: A two-channel semiconductor component has a doped semiconductor body formed from a group IV semiconductor material, a top-side top-gate electrode, and a bottom-side bottom-gate electrode. A source region has a greater extent in a depth direction in the silicon body than a drain region. A source isolation region is arranged between a source region and the top-gate electrode, and a drain isolation region is arranged between a drain region and the top-gate electrode, which isolation region extends in a depth direction as far as to the lower edge of a gate isolation layer of the top-gate electrode. In a first operating state a first conductive channel separated laterally from the source region by the source isolation region can be formed, as can a second conductive channel, which is decoupled from the first conductive channel by a barrier region of the semiconductor body extending in a depth direction between the conductive channels.

Abstract: The invention provides new heterocyclic compounds having the general formula (Ie) wherein R1, R1a and R7 are as described herein, compositions including the compounds, processes of manufacturing the compounds and methods of using the compounds.

Abstract: The invention provides new heterocyclic compounds having the general formula (IA) wherein A, L, X, Y, m, n, R1 and R2 are as described herein, compositions including the compounds, processes of manufacturing the compounds and methods of using the compounds.

Abstract: The invention provides novel compounds having the general formula (I) wherein RA, RB, RC, RC1 and W are as defined herein, compositions including the compounds and methods of using the compounds.

Abstract: The invention provides new heterocyclic compounds having the general formula (I) wherein A, L, X, m, n, R1, R2 and R3 are as described herein, pharmaceutically acceptable salts thereof, compositions including the compounds, processes of manufacturing the compounds and methods of using the compounds.

Abstract: The invention provides new heterocyclic compounds having the general formula wherein A, L, X, m, n, R1 and R2 are as described herein, compositions including the compounds, processes of manufacturing the compounds and methods of using the compounds.

Abstract: The invention provides new heterocyclic compounds having the general Formula (I), or a pharmaceutically acceptable salt thereof, wherein R1, R2, X, Y1 and Y2 are as described herein, compositions including the compounds, processes of manufacturing the compounds and methods of using the compounds.