Abstract: A method and an apparatus for coating substrates is described in which the layer to be applied is produced by the condensing particles of a plasma generated by a gas discharge which are incident on the substrates. Both an arc discharge vaporization coating process and a cathode sputtering coating process are effected in the same apparatus, and the arc discharge vaporization process is carried out before the cathode sputtering process.

Abstract: Method and device for coating cavities of objects such as the internal surface of tubes with the cathode arc deposition method. This method is used such that material from the cathode surface migrates and is deposited on the surface of said cavity. To this end the cathode is introduced into the cavity. The device for performing the above method comprises at least a cathode arc deposition device. The object to be coated can be connected as anode although it is also possible that a separate anode is provided in which case a voltage is applied to the object being negative with regard to the voltage applied to the cathode.

Abstract: A method and device are provided to prevent grooves from occurring on a cathode surface of a cathode arc discharge evaporating device by adding a second movement to a first rotational movement of a magnetic field generator within the device, which enables the arc spot to scan a substantial portion of the cathode surface.

Abstract: Cathode arc discharge evaporating device having a body of revolution as cathode. The target surface is arranged at the outside surface of the body of revolution. To control movement of the arc spot a magnetic field generating device is provided inside the body of revolution, which may be moveable with respect to the cathode.