Abstract: A radiation-sensitive recording material, in particular for producing planographic printing plates, is disclosed. The material is composed of a layer support and a positive-working, radiation-sensitive layer having a rough surface containing at least one 1,2-quinonediazide as a radiation-sensitive compound, a polycondensate or polymer as a binder insoluble in water and soluble or swellable in aqueous-alkaline solutions, a dye and a filler. At a layer weight of 3 g/m.sup.2 or less, the radiation-sensitive layer comprises a silicic acid product having a mean grain size in the range from 3 to 5 .mu.m with an exclusion limit of 15 .mu.m as a filler in such a quantity that it exhibits a Bekk smoothness in the range from 20 to 100 seconds (determined according to DIN 53 107, Method A). The layer additionally comprises a surfactant having polysiloxane units.

Abstract: A radiation-sensitive mixture, a radiation-sensitive recording material produced from themixture, and a process for producing heat-resistant and chemical-resistant relief copies using the recording material are disclosed. The normally positive-working radiation-sensitive mixture contains(1) a water-insoluble polymeric binder which is soluble in aqueous alkaline solutions, and(2) a 1,2-quinone diazide and/or a combination ofa compound which forms strong acid when exposed to actinic radiation anda compound containing at least one acid-cleavable C--O--C bond.The polymeric binder has a molecular weight of between about 5,000 and 100,000 and a content of phenolic hydroxyl groups of about 1 to 15, preferably about 2 to 10, mmol/g of polymer. It has a content of --CH.sub.3-n X.sub.n units of at least 0.1, preferably about 0.5 to 2, mmol/g of polymer, X being halogen such as chlorine, bromine or iodine and n being 1, 2 or 3.

Abstract: The invention relates to a usually positive-working radiation-sensitive mixture which contains as essential components a binder which is insoluble in water and soluble in aqueous-alkaline solutions, a 1,2-quinone diazide and a compound which diminishes the developer solubility of the exposed regions by heat treatment, in which the compound which diminishes the developer solubility which is present is at least one urethane of the formula I: ##STR1## in which R.sub.1 is hydrogen or methyl,R.sub.2 is hydrogen, alkyl, substituted or unsubstituted aryl, or substituted or unsubstituted arylaminocarbonyl,R.sub.3 is substituted or unsubstituted arylene or arylenealkylene,Q is hydrogen, --CH.sub.4-p, or --CR.sub.5 R.sub.6 in which R.sub.5 and R.sub.6 can be identical or different and are selected from the group consisting of hydrogen, alkyl and aryl, carbonyl, oxygen, sulfur or sulfonyl,m is 1, 2 or 3,n is at least 1 and not more than 50, andis 1, 2 or 3.

Abstract: The present invention relates to a developer composition for radiation-sensitive positive-working and negative-working and reversible reprographic layers which apart from a radiation-sensitive compound or radiation-sensitive combination of compounds contain, as an essential constituent, a binder which is insoluble in water but soluble in aqueous-alkaline solutions, said developer composition being characterized in that it contains, as essential constituents,(a) O- carboxymethyl- or O,O'-biscarboxymethylethylene glycol or an appropriately substituted polyethylene glycol comprising 2 to about 500 ethylene glycol units,(b) at least one compound showing an alkaline reaction in water, selected from the group including alkali metal hydroxides, alkali metal silicates, alkali metal phosphates, alkali metal borates, ammonium hydroxides, ammonium silicates, ammonium phosphates and ammonium borates, and(c) water.

Abstract: A process for producing negative copies is disclosed in which a light-sensitive or radiation-sensitive recording material comprising a layer support and a normally positive-working light-sensitive or radiation-sensitive layer applied thereto is irradiated imagewise, thermally treated, irradiated overall and then developed with an alkaline developer. Thermal treatment is carried out with water or with an aqueous solution, at temperatures in the range from about 50.degree. to 100.degree. C., preferably from 60.degree. to 90.degree. C., within a period of time varying between about 1 second and 5 minutes, preferably between 5 seconds and 1 minute, overall irradiation is performed on the optionally still hot recording material and development is thereafter carried out within a period of time varying between about 10 seconds and 2 minutes, preferably between 15 seconds and 1 minute.

Abstract: The invention describes a photosensitive composition, a copying material prepared from this composition, and a process for the production of negative relief copies, in which a photosensitive composition or a photosensitive material, respectively, is used, that comprises a support and a photosensitive composition coated onto the support and comprising a photosensitive 1,2-quinonediazide or a photosensitive mixture, a binder that is soluble in aqueous-alkaline solutions and an s-triazine of the general formula I ##STR1## wherein R denotes akyl, allyl, alkoxy, alkoxycarbonyl, alkoxycarbonylakkenyl, each having from 1 to 4 carbon atoms in the alkyl or alkenyl group, aryloxy, halogen or a nitro group andn stands for 1 to 3.The material is exposed imagewise under a negative original, thereafter heated and, after cooling, exposed without an original or optionally under a positive original, then developed by means of an aqueous-alkaline developer and optionally baked.

Abstract: The invention describes a photosensitive composition, a copying material prepared from this composition, and a process for the production of negative relief copies, in which a photosensitive composition or a photosensitive material, respectively, is used, that comprises a support and a photosensitive composition coated onto the suppoort and comprising a photosensitive 1,2-quinonediazide or a photosensitive mixture, a binder that is soluble in aqueous-alkaline solutions and an s-triazine of the general formula I ##STR1## wherein R denotes akyl, allyl, alkoxy, alkoxycarbonyl, alkoxycarbonylakkenyl, each having from 1 to 4 carbon atoms in the alkyl or alkenyl group, aryloxy, halogen or a nitro group andn stands for 1 to 3. The material is exposed imagewise under a negative original, thereafter heated and, after cooling, exposed without an original or optionally under a positive original, then developed by means of an aqueous-alkaline developer and optionally baked.