Patents by Inventor Hari Kishore Ambal

Hari Kishore Ambal has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230066887
    Abstract: An optical temperature sensing system is disclosed which includes a fiber optic sensor as a primary temperature sensor for reading a temperature of a measured object or a measured environment. The temperature probe is coupled to a converter which generates using solid-state electronic components without software, a temperature output. A temperature sensing system is also disclosed that includes a temperature sensor for reading a temperature of a measured object, and a dual converter module comprising a first converter to provide a primary temperature sensor signal, and a second converter to generate a secondary temperature sensor signal from a signal provided by the first converter. An optical temperature sensor is also described, with a conversion module that generates an output that mimics the output of a thermistor or a thermocouple.
    Type: Application
    Filed: October 25, 2022
    Publication date: March 2, 2023
    Applicant: Photon Control Inc.
    Inventors: Yoshua ICHIHASHI, Michael FEAVER, Florin Constantin CIOATA, Hari Kishore AMBAL, Yi LIU, Alborz AMINI
  • Patent number: 8772682
    Abstract: Methods and apparatus for controlling the temperature of multi-zone heater in a process chamber are provided herein. In some embodiments, a method is provided to control a multi-zone heater disposed in a substrate support, wherein the multi-zone heater has a first zone and a second zone. In some embodiments, the method may include measuring a current drawn by the first zone at a first time; measuring a voltage drawn by the first zone at the first time; calculating the resistance of the first zone based upon the measured current and voltage drawn by the first zone at the first time; determining a temperature of the first zone based upon a predetermined relationship between the resistance and the temperature of the first zone; and adjusting the temperature of the first zone in response to the temperature determination.
    Type: Grant
    Filed: May 1, 2013
    Date of Patent: July 8, 2014
    Assignee: Applied Materials, Inc.
    Inventors: Hari Kishore Ambal, Uwe Paul Haller, Jianhua Zhou
  • Patent number: 8698889
    Abstract: A metrology system has an elongate stationary camera pixel array facing a workpiece transit path of a robot with an field of view corresponding to a workpiece diameter and extending transverse to the transit path portion, and a stationary elongate light emitting array generally parallel to the pixel array. An image control processor causes the camera to capture successive image frames while the robot is moving the workpiece through the transit path.
    Type: Grant
    Filed: February 17, 2010
    Date of Patent: April 15, 2014
    Assignee: Applied Materials, Inc.
    Inventors: Abraham Ravid, Todd Egan, Karen Lingel, Mitchell DiSanto, Hari Kishore Ambal, Edward Budiarto
  • Publication number: 20130270252
    Abstract: Methods and apparatus for controlling the temperature of multi-zone heater in a process chamber are provided herein. In some embodiments, a method is provided to control a multi-zone heater disposed in a substrate support, wherein the multi-zone heater has a first zone and a second zone. In some embodiments, the method may include measuring a current drawn by the first zone at a first time; measuring a voltage drawn by the first zone at the first time; calculating the resistance of the first zone based upon the measured current and voltage drawn by the first zone at the first time; determining a temperature of the first zone based upon a predetermined relationship between the resistance and the temperature of the first zone; and adjusting the temperature of the first zone in response to the temperature determination.
    Type: Application
    Filed: May 1, 2013
    Publication date: October 17, 2013
    Inventors: HARI KISHORE AMBAL, UWE PAUL HALLER, JIANHUA ZHOU
  • Patent number: 8552346
    Abstract: Methods and apparatus for controlling the temperature of multi-zone heater in a process chamber are provided herein. In some embodiments, a method is provided to control a multi-zone heater disposed in a substrate support, wherein the multi-zone heater has a first zone and a second zone. In some embodiments, the method may include measuring a current drawn by the first zone at a first time; measuring a voltage drawn by the first zone at the first time; calculating the resistance of the first zone based upon the measured current and voltage drawn by the first zone at the first time; determining a temperature of the first zone based upon a predetermined relationship between the resistance and the temperature of the first zone; and adjusting the temperature of the first zone in response to the temperature determination.
    Type: Grant
    Filed: May 20, 2011
    Date of Patent: October 8, 2013
    Assignee: Applied Materials, Inc.
    Inventors: Hari Kishore Ambal, Uwe Paul Haller, Jianhua Zhou
  • Publication number: 20120292305
    Abstract: Methods and apparatus for controlling the temperature of multi-zone heater in a process chamber are provided herein. In some embodiments, a method is provided to control a multi-zone heater disposed in a substrate support, wherein the multi-zone heater has a first zone and a second zone. In some embodiments, the method may include measuring a current drawn by the first zone at a first time; measuring a voltage drawn by the first zone at the first time; calculating the resistance of the first zone based upon the measured current and voltage drawn by the first zone at the first time; determining a temperature of the first zone based upon a predetermined relationship between the resistance and the temperature of the first zone; and adjusting the temperature of the first zone in response to the temperature determination.
    Type: Application
    Filed: May 20, 2011
    Publication date: November 22, 2012
    Applicant: APPLIED MATERIALS, INC.
    Inventors: HARI KISHORE AMBAL, UWE PAUL HALLER, JIANHUA ZHOU
  • Publication number: 20110199476
    Abstract: A metrology system has an elongate stationary camera pixel array facing a workpiece transit path of a robot with an field of view corresponding to a workpiece diameter and extending transverse to the transit path portion, and a stationary elongate light emitting array generally parallel to the pixel array. An image control processor causes the camera to capture successive image frames while the, robot is moving the workpiece through the transit path.
    Type: Application
    Filed: February 17, 2010
    Publication date: August 18, 2011
    Applicant: Applied Materials, Inc.
    Inventors: Abraham Ravid, Todd Egan, Karen Lingel, Mitchell DiSanto, Hari Kishore Ambal, Edward Budiarto