Patents by Inventor HARPREET SINGH JUNEJA

HARPREET SINGH JUNEJA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Epitaxial chamber with cross flow
    Patent number: 9127360
    Abstract: Methods and apparatus for processing a substrate are provided herein. In some embodiments, an apparatus for processing a substrate includes a process chamber having a substrate support disposed therein to support a processing surface of a substrate at a desired position within the process chamber; a first inlet port to provide a first process gas over the processing surface of the substrate in a first direction; a second inlet port to provide a second process gas over the processing surface of the substrate in a second direction different from the first direction, wherein an azimuthal angle measured between the first direction and the second direction with respect to a central axis of the substrate support is up to about 145 degrees; and an exhaust port disposed opposite the first inlet port to exhaust the first and second process gases from the process chamber.
    Type: Grant
    Filed: September 22, 2010
    Date of Patent: September 8, 2015
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Balasubramanian Ramachandran, Errol Antonio C. Sanchez, Nyi O. Myo, Kevin Joseph Bautista, Harpreet Singh Juneja, Zuoming Zhu
  • EPITAXIAL CHAMBER WITH CROSS FLOW
    Publication number: 20110174212
    Abstract: Methods and apparatus for processing a substrate are provided herein. In some embodiments, an apparatus for processing a substrate includes a process chamber having a substrate support disposed therein to support a processing surface of a substrate at a desired position within the process chamber; a first inlet port to provide a first process gas over the processing surface of the substrate in a first direction; a second inlet port to provide a second process gas over the processing surface of the substrate in a second direction different from the first direction, wherein an azimuthal angle measured between the first direction and the second direction with respect to a central axis of the substrate support is up to about 145 degrees; and an exhaust port disposed opposite the first inlet port to exhaust the first and second process gases from the process chamber.
    Type: Application
    Filed: September 22, 2010
    Publication date: July 21, 2011
    Applicant: APPLIED MATERIALS, INC.
    Inventors: BALASUBRAMANIAN RAMACHANDRAN, ERROL ANTONIO C. SANCHEZ, NYI O. MYO, KEVIN JOSEPH BAUTISTA, HARPREET SINGH JUNEJA, ZUOMING ZHU