Patents by Inventor Harry David Cox
Harry David Cox has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8338286Abstract: A method for reducing stress on under ball metallurgy (UBM) is disclosed. A collar is disposed around the ball to provide support, and prevent solder interaction in the undercut areas of the UBM. In one embodiment, the collar is comprised of photosensitive polyimide.Type: GrantFiled: October 5, 2010Date of Patent: December 25, 2012Assignee: International Business Machines CorporationInventors: Eric David Perfecto, Harry David Cox, Timothy Harrison Daubenspeck, David L. Questad, Brian Richard Sundlof
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Publication number: 20120083114Abstract: A method for reducing stress on under ball metallurgy (UBM) is disclosed. A collar is disposed around the ball to provide support, and prevent solder interaction in the undercut areas of the UBM. In one embodiment, the collar is comprised of photosensitive polyimide.Type: ApplicationFiled: October 5, 2010Publication date: April 5, 2012Applicant: International Business Machines CorporationInventors: ERIC DANIEL PERFECTO, Harry David Cox, Timothy Harrison Daubenspeck, David L. Questad, Brian Richard Sundlof
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Patent number: 7472650Abstract: A structure. The structure includes a layered configuration including a copper layer, a first layer, and a second layer. The first and second layers are disposed on opposite sides of the copper layer and are in direct mechanical contact with the copper layer. The first and second layers each include a same alloy of nickel and a metal consisting of cobalt, iron, copper, manganese, or molybdenum. A first region in the first layer extends completely through the first layer. A second region in the second layer extends completely through the second layer. A third region in the first layer extends completely through the first layer. The third region does not extend into any portion of the second layer. The first, second region, and third regions each include a photoresist or an opening such that photoresist or opening extends completely through the first, second, and first layer, respectively.Type: GrantFiled: October 1, 2007Date of Patent: January 6, 2009Assignee: International Business Machines CorporationInventors: Harry David Cox, Hsichang Liu, Nike Oluwakemi Medahunsi, Krystyna Waleria Semkow
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Patent number: 7287468Abstract: A structure and associated methods of formation. The structure includes a layered configuration comprising a copper layer, a first layer, and a second layer. The copper layer consists essentially of copper. The first and second layers are disposed on opposite sides of the copper layer and are in direct mechanical contact with the copper layer. The first and second layers each consist essentially of a same alloy of nickel and cobalt having a weight percent concentration of cobalt in a range of 3% to 21%. A through hole in the layered configuration extends completely through the first layer, the copper layer, and the second layer, wherein a first opening in the layered configuration extends completely through the first layer and does not extend into any portion of the second layer.Type: GrantFiled: May 31, 2005Date of Patent: October 30, 2007Assignee: International Business Machines CorporationInventors: Harry David Cox, Hsichang Liu, Nike Oluwakemi Medahunsi, Krystyna Waleria Semkow
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Patent number: 6662718Abstract: A screening mask having a stress-relieving area including an inner functional area having a pattern which is replicated on an underlying substrate, the inner functional area pattern having an one open area through which a paste is extruded and at least one tab, and an outer nonfunctional area distinct from the inner functional area, the outer nonfunctional area having a stress-relieving area adjacent to an edge of the screening mask that protects the at least one tab in the inner functional area from breaking.Type: GrantFiled: June 29, 2001Date of Patent: December 16, 2003Assignee: International Business Machines CorporationInventors: Evelyn Barrington, Jeffrey A. Brody, Harry David Cox, Lorraine Di Piero-Simmonds, John J. Garant, Dinesh Gupta, Edward J. Hassdenteufel, III, Hsichang Liu, Paul G. McLaughlin, Ahmed S. Shah, Charles Timothy Ryan, Richard C. Steger, John A. Trumpetto
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Publication number: 20030004076Abstract: A screening mask having a stress-relieving area including an inner functional area having a pattern which is replicated on an underlying substrate, the inner functional area pattern having an one open area through which a paste is extruded and at least one tab, and an outer nonfunctional area distinct from the inner functional area, the outer nonfunctional area having a stress-relieving area adjacent to an edge of the screening mask that protects the at least one tab in the inner functional area from breaking.Type: ApplicationFiled: June 29, 2001Publication date: January 2, 2003Applicant: International Business Machines CorporationInventors: Evelyn Barrington, Jeffrey A. Brody, Harry David Cox, Lorraine Di Piero-Simmonds, John J. Garant, Dinesh Gupta, Edward J. Hassdenteufel, Hsichang Liu, Paul G. McLaughlin, Ahmed S. Shah, Charles Timothy Ryan, Richard C. Steger, John A. Trumpetto
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Patent number: 5807610Abstract: A mask for printing a pattern on a substrate comprises a sheet preferably of metal having a printing pattern thereon comprising through mask openings in the sheet. The through mask openings are interconnected by tabs or bridges which have a structure which provides a bending moment in a portion of the tab when a force is applied to the mask to force material to be deposited on the substrate through the mask openings. A preferred tab structure has a step shape and at least one through opening in the tab. The step shape and through mask opening both provide bending moments in the tab and the through opening also provides enhanced patterning definition because the deposition material flows both under the tab and through the through tab opening. The masks have a longer operating life than conventional masks and enhanced operating characteristics.Type: GrantFiled: April 1, 1997Date of Patent: September 15, 1998Assignee: International Business Machines CorporationInventors: Harry David Cox, Connie Fassett Littell, Richard Michael Shroedl, John Amodio Trumpetto, Michael Stephen Vanca
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Patent number: 5669972Abstract: A mask for printing a pattern on a substrate comprises a sheet preferably of metal having a printing pattern thereon comprising through mask openings in the sheet. The through mask openings are interconnected by tabs or bridges which have a structure which provides a bending moment in a portion of the tab when a force is applied to the mask to force material to be deposited on the substrate through the mask openings. A preferred tab structure has a step shape and at least one through opening in the tab. The step shape and through mask opening both provide bending moments in the tab and the through opening also provides enhanced patterning definition because the deposition material flows both under the tab and through the through tab opening. The masks have a longer operating life than conventional masks and enhanced operating characteristics.Type: GrantFiled: April 27, 1995Date of Patent: September 23, 1997Assignee: International Business Machines CorporationInventors: Harry David Cox, Connie Fassett Littell, Richard Michael Shroedl, John Amodio Trumpetto, Michael Stephen Vanca