Patents by Inventor Harry Sewelll

Harry Sewelll has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for imprint pattern replication
    Patent number: 7331283
    Abstract: Provided is a method and system for imprinting a pattern formed on a surface of an imprint mask into a substrate. A method includes deforming at least one of the surface of the imprint mask and a surface of the substrate to produce a deformed surface having an arc therein. A clamping pressure is applied to bring the deformed surface into intimate contact with the other surface, the applied pressure substantially flattening the deformed surface. The applied clamping pressure is released to separate the two surfaces.
    Type: Grant
    Filed: December 16, 2004
    Date of Patent: February 19, 2008
    Assignee: ASML Holding N.V.
    Inventor: Harry Sewelll