Abstract: According to one embodiment, a mass spectrometer includes a sample stage provided to hold a sample; an analysis unit disposed to face a sample placement surface of the sample table, and performing mass analysis; an ion beam source provided to irradiate an ion beam toward the sample placement surface; an assist energy source supplying assist energy to a target area between the sample placement surface and the analysis unit; and a laser light source irradiating the target area with laser light.

Abstract: According to one embodiment, an atom probe inspection device includes one or more processors configured to change a two-dimensional position of a detected ion, detect two-dimensional position information of the ion and a flying time of the ion, identify a type of an element of the ion, generate first information under a first condition and second information under a second condition, and generate a reconstruction image of the sample from the first information and the second information.

Abstract: According to one embodiment, an atom probe inspection device includes one or more processors configured to change a two-dimensional position of a detected ion, detect two-dimensional position information of the ion and a flying time of the ion, identify a type of an element of the ion, generate first information under a first condition and second information under a second condition, and generate a reconstruction image of the sample from the first information and the second information.

Abstract: A mass spectrometer includes a beam radiator radiating a beam to a sample. A laser radiator radiates laser light onto an irradiation surface of a surface of the sample irradiated with the beam or above the irradiation surface. The laser radiator splits the laser light into at least first light and second light. The laser radiator adjusts a polarization state, a length of an optical path, or a direction of the optical path of at least either the first light or the second light to condense the first light and the second light onto the irradiation surface or above the irradiation surface. A detector detects particles discharged from the sample.

Abstract: According to one embodiment, a mass spectrometer includes a sample stage provided to hold a sample; an analysis unit disposed to face a sample placement surface of the sample table, and performing mass analysis; an ion beam source provided to irradiate an ion beam toward the sample placement surface; an assist energy source supplying assist energy to a target area between the sample placement surface and the analysis unit; and a laser light source irradiating the target area with laser light.

Abstract: A scanning probe microscope that includes a probe, a positioning unit configured to position a probe on a measurement sample, an excitation unit configured to excite the measurement sample at a predetermined frequency, a resonance unit configured to output a frequency modulation signal by converting a change of a capacitance of the measurement sample, a lock-in amplifier configured to output a differential capacitance signal obtained by extracting a predetermined frequency component and a harmonic component of the predetermined frequency of the demodulated signal, a conversion unit configured to output data indicative of a relationship between a voltage applied to the measurement sample and the capacitance, a detecting unit that detects a voltage value corresponding to a feature point of the relationship data, and a main measurement control unit that measures electrical characteristics of the measurement sample subjected to a DC bias voltage substantially equal to the feature point voltage.

Abstract: A scanning probe microscope that includes a probe, a positioning unit configured to position a probe on a measurement sample, an excitation unit configured to excite the measurement sample at a predetermined frequency, a resonance unit configured to output a frequency modulation signal by converting a change of a capacitance of the measurement sample, a lock-in amplifier configured to output a differential capacitance signal obtained by extracting a predetermined frequency component and a harmonic component of the predetermined frequency of the demodulated signal, a conversion unit configured to output data indicative of a relationship between a voltage applied to the measurement sample and the capacitance, a detecting unit that detects a voltage value corresponding to a feature point of the relationship data, and a main measurement control unit that measures electrical characteristics of the measurement sample subjected to a DC bias voltage substantially equal to the feature point voltage.

Abstract: In accordance with an embodiment, an analytical apparatus includes a member, a voltage source connected to the member and a detecting section. The member has an inserting portion into which a sample holder supporting a sample is insertable and whose shape corresponds to a shape of the sample holder. The detecting section is configured to detect a substance to be emitted from the sample by field evaporation. The shape of the inserting portion in a cross section of a direction perpendicular to an inserting direction of the sample holder is a shape excluding a perfect circle.

Abstract: A mass spectrometer includes a beam radiator radiating a beam to a sample. A laser radiator radiates laser light onto an irradiation surface of a surface of the sample irradiated with the beam or above the irradiation surface. The laser radiator splits the laser light into at least first light and second light. The laser radiator adjusts a polarization state, a length of an optical path, or a direction of the optical path of at least either the first light or the second light to condense the first light and the second light onto the irradiation surface or above the irradiation surface. A detector detects particles discharged from the sample.

Abstract: In accordance with an embodiment, an analytical apparatus includes a member, a voltage source connected to the member and a detecting section. The member has an inserting portion into which a sample holder supporting a sample is insertable and whose shape corresponds to a shape of the sample holder. The detecting section is configured to detect a substance to be emitted from the sample by field evaporation. The shape of the inserting portion in a cross section of a direction perpendicular to an inserting direction of the sample holder is a shape excluding a perfect circle.

Abstract: A sputter neutral particle mass spectrometry apparatus includes a sample table holding a sample which is a mass spectrometry target, an ion beam irradiation device which irradiates an ion beam on the sample held by the sample table to generate neutral particles in an adjacent region of the sample, a light beam irradiation device which irradiates a light beam on the neutral particles positioned in the adjacent region to obtain photoexcited ions, a draw-out electrode which draws out the photoexcited ions, a mass spectrometer which draws in the drawn out photoexcited ions to perform mass analysis, and an optical element which is provided in a light path after the light beam passes the adjacent region, and changes a traveling direction of the light beam so that the light beam passes the adjacent region again.

Abstract: A material inspection apparatus according to the present embodiment includes a sample mount capable of mounting a sample. A detector detects an atom desorbed from the sample. A voltage generator applies a voltage to the sample. A laser generator irradiates a laser beam onto the sample. An arithmetic part processes a detection result of the detector. A storage part stores a detection prediction range of a certain element and an isotope of the certain element. A display displays the detection prediction range and an actual detection result of the detector in a comparable manner.

Abstract: According to an embodiment, a mass spectroscope has a chamber, a charged particle beam source, a laser beam source, a mass spectrograph, and an optical system. The chamber accommodates a sample. The charged particle beam source generates a charged particle beam and irradiates the sample with the charged particle beam, thereby discharging a neutral particle from the sample. The laser beam source irradiates the neutral particle with a laser beam. The mass spectrograph detects the neutral particle ionized by irradiation of the laser beam and analyzes a mass of the sample. The optical system controls a light path of the laser beam in such a manner that the laser beam enters a region into which the neutral particle is discharged.

Abstract: A sputter neutral particle mass spectrometry apparatus includes a sample table holding a sample which is a mass spectrometry target, an ion beam irradiation device which irradiates an ion beam on the sample held by the sample table to generate neutral particles in an adjacent region of the sample, a light beam irradiation device which irradiates a light beam on the neutral particles positioned in the adjacent region to obtain photoexcited ions, a draw-out electrode which draws out the photoexcited ions, a mass spectrometer which draws in the drawn out photoexcited ions to perform mass analysis, and an optical element which is provided in a light path after the light beam passes the adjacent region, and changes a traveling direction of the light beam so that the light beam passes the adjacent region again.

Abstract: A material inspection apparatus according to the present embodiment includes a sample mount capable of mounting a sample. A detector detects an atom desorbed from the sample. A voltage generator applies a voltage to the sample. A laser generator irradiates a laser beam onto the sample. An arithmetic part processes a detection result of the detector. A storage part stores a detection prediction range of a certain element and an isotope of the certain element. A display displays the detection prediction range and an actual detection result of the detector in a comparable manner.

Abstract: A material inspection apparatus according to the present embodiment includes a sample mount capable of mounting a sample. A detector detects an ion desorbed from the sample. A voltage generator applies a voltage to the sample. An optical system irradiates a laser beam onto the sample at a tilt angle with respect to a perpendicular direction to an end surface of a tip end of the sample. The tilt angle is equal to or smaller than a Brewster angle.

Abstract: In accordance with an embodiment, a sample analysis apparatus includes an electron beam source, first and second detection units, first and second signal processing units, an X-ray path calculation unit, an X-ray detection intensity calculation unit, and a data correction unit. The electron beam source generates and applies the electron beam to a sample composed of kinds of elements. The first detection unit detects a characteristic X-ray from the sample to output a first signal. The first signal processing unit processes the first signal to acquire EDX mapping data. The second detection unit detects an HAADF signal from the sample. The second signal processing unit processes the HAADF signal to calculate the mass of the elements. The X-ray path calculation unit calculates a path of the characteristic X-ray. The X-ray detection intensity calculation unit calculates X-ray detection intensity. The data correction unit corrects the EDX mapping data.

Abstract: In accordance with an embodiment, a sample structure analyzing method includes generating a beam and then applying the beam to a plurality of observation regions on a sample, and acquiring a plurality of diffraction images from the beam which has passed through the sample; and comparing the acquired diffraction images, and judging the difference between the observation regions from the comparison result, or identifying the grain boundary of crystal constituting the sample.

Abstract: In accordance with an embodiment, a sample analyzing apparatus includes a charged beam generating unit, a detecting unit, and an analyzing unit. The charged beam generating unit is configured to generate a charged beam and apply the charged beam to a sample. The detecting unit is configured to detect charged particles and then output a signal, the charged particles being generated from the sample by the application of the charged beam in a manner depending on a three-dimensional structure and material characteristics of the sample. The analyzing unit is configured to process the signal to analyze the sample.

Abstract: In one embodiment, an atom probe measuring apparatus includes an X-ray source configured to generate an X-ray. The apparatus further includes an optical system configured to irradiate a sample with the X-ray. The apparatus further includes a power supply configured to apply a voltage to the sample. The apparatus further includes a detector configured to detect ions evaporated from the sample by irradiating the sample with the X-ray with applying the voltage to the sample.